Patents by Inventor Ryan Farel

Ryan Farel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9921128
    Abstract: Methods and apparatuses for measurement of residual stresses are provided. For example, a method includes indenting a first portion of a sample having residual stress and generating a residual stress reference zone at a second portion of the sample. Indenting and generating a residual stress reference zone may be performed in situ (e.g., on the same instrument platform, etc.). The present disclosure also provides a method for generating a residual stress reference, the method including providing a first sample having a residual stress and reducing the residual stress in at least a portion of the sample, wherein reducing the residual stress includes raster scanning wear, or exposure to laser energy, ion beam energy, electron beam microscopy, scanning probe microscopy, scanning electron microscopy, heat energy, vibration energy; and exposing the sample to ultrasonic energy.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: March 20, 2018
    Assignee: EXPONENTIAL BUSINESS AND TECHNOLOGIES COMPANY
    Inventors: Dehua Yang, Ryan Farel
  • Publication number: 20160282246
    Abstract: Methods and apparatuses for measurement of residual stresses are provided. For example, a method includes indenting a first portion of a sample having residual stress and generating a residual stress reference zone at a second portion of the sample. Indenting and generating a residual stress reference zone may be performed in situ (e.g., on the same instrument platform, etc.). The present disclosure also provides a method for generating a residual stress reference, the method including providing a first sample having a residual stress and reducing the residual stress in at least a portion of the sample, wherein reducing the residual stress includes raster scanning wear, or exposure to laser energy, ion beam energy, electron beam microscopy, scanning probe microscopy, scanning electron microscopy, heat energy, vibration energy; and exposing the sample to ultrasonic energy.
    Type: Application
    Filed: March 27, 2015
    Publication date: September 29, 2016
    Applicant: EXPONENTIAL BUSINESS AND TECHNOLOGIES COMPANY
    Inventors: Dehua Yang, Ryan Farel