Patents by Inventor Ryan Holler

Ryan Holler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition of phosphosilicate glass film
    Patent number: 7320944
    Abstract: A method of forming a phosphosilicate glass, includes flowing a pre-deposition gas comprising an inert gas into a deposition chamber containing a substrate, where the temperature of the substrate is at a pre-deposition temperature of at least 400° C; continuously increasing the temperature of gas in the chamber to a deposition temperature and simultaneously continuously increasing a flow rate of phosphine and silane until a phosphine:silane deposition ratio is achieved; and depositing the phosphosilicate glass on the substrate at the deposition temperature and at the phosphine:silane deposition ratio.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: January 22, 2008
    Assignee: Cypress Semiconductor Corporation
    Inventors: Michal Efrati Fastow, Ryan Holler