Patents by Inventor Ryan James Davidson

Ryan James Davidson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ION BEAM SPUTTERING APPARATUS AND METHOD
    Publication number: 20250183003
    Abstract: An aspect of the invention provides an ion beam sputtering apparatus comprising an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles, the target body being located relative to the ion source so that the ion beam hits the at least one target surface to sputter particles from the target body towards a surface of an object to be modified. The target body is shaped so that the particles sputtered towards a surface to be modified are generally sputtered from the sputtering target in radially extending sputter directions relative to the beam axis, the sputter directions being one of (i) directions extending towards the beam axis and (ii) directions extending away from the beam axis.
    Type: Application
    Filed: January 31, 2025
    Publication date: June 5, 2025
    Inventors: Richard John Futter Futter, Ryan James Davidson, Jerome Leveneur, John Vedamuthu Kennedy
  • Ion beam sputtering apparatus and method
    Patent number: 12243715
    Abstract: An aspect of the invention provides an ion beam sputtering apparatus comprising an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles, the target body being located relative to the ion source so that the ion beam hits the at least one target surface to sputter particles from the target body towards a surface of an object to be modified. The target body is shaped so that the particles sputtered towards a surface to be modified are generally sputtered from the sputtering target in radially extending sputter directions relative to the beam axis, the sputter directions being one of (i) directions extending towards the beam axis and (ii) directions extending away from the beam axis.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: March 4, 2025
    Assignee: Institute of Geological and Nuclear Sciences Limited
    Inventors: Richard John Futter, Ryan James Davidson, Jerome Leveneur, John Vedamuthu Kennedy
  • ION BEAM SPUTTERING APPARATUS AND METHOD
    Publication number: 20210104380
    Abstract: An aspect of the invention provides an ion beam sputtering apparatus comprising an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles, the target body being located relative to the ion source so that the ion beam hits the at least one target surface to sputter particles from the target body towards a surface of an object to be modified. The target body is shaped so that the particles sputtered towards a surface to be modified are generally sputtered from the sputtering target in radially extending sputter directions relative to the beam axis, the sputter directions being one of (i) directions extending towards the beam axis and (ii) directions extending away from the beam axis.
    Type: Application
    Filed: December 21, 2018
    Publication date: April 8, 2021
    Inventors: Richard John Futter, Ryan James Davidson, Jerome Leveneur, John Vedamuthu Kennedy