Patents by Inventor Ryan T. Walsh

Ryan T. Walsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11696837
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: July 11, 2023
    Assignee: DEPUY SYNTHES PRODUCTS, INC.
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
  • Publication number: 20200121469
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
  • Patent number: 10543102
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Grant
    Filed: August 14, 2015
    Date of Patent: January 28, 2020
    Assignee: DePuy Synthes Products, Inc.
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
  • Patent number: 10512548
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: December 24, 2019
    Assignee: DePuy Synthes Products, Inc.
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
  • Patent number: 10137003
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: November 27, 2018
    Assignee: DePuy Synthes Products, Inc.
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
  • Publication number: 20170333201
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Application
    Filed: July 21, 2017
    Publication date: November 23, 2017
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Marcus Hunziker, David Koch
  • Patent number: 9744049
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: August 29, 2017
    Assignee: DePuy Synthes Products, Inc.
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
  • Publication number: 20160128845
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Application
    Filed: January 15, 2016
    Publication date: May 12, 2016
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
  • Publication number: 20150342750
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Application
    Filed: August 14, 2015
    Publication date: December 3, 2015
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
  • Publication number: 20150164653
    Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.
    Type: Application
    Filed: March 2, 2015
    Publication date: June 18, 2015
    Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
  • Publication number: 20140148905
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Application
    Filed: January 29, 2014
    Publication date: May 29, 2014
    Applicant: DePuy Synthes Products, LLC
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
  • Publication number: 20140100663
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Application
    Filed: December 10, 2013
    Publication date: April 10, 2014
    Applicant: Depuy Synthes Products, LLC
    Inventors: Dominique MESSERLI, Ryan T. Walsh, Brandon L. RANDALL, David E. EVANS, Jacqueline MYER, David KOCH, Markus HUNZIKER
  • Publication number: 20100305704
    Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
    Type: Application
    Filed: February 27, 2007
    Publication date: December 2, 2010
    Applicant: SYNTHES GMBH
    Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker