Patents by Inventor Ryan T. Walsh
Ryan T. Walsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11696837Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: GrantFiled: December 18, 2019Date of Patent: July 11, 2023Assignee: DEPUY SYNTHES PRODUCTS, INC.Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
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Publication number: 20200121469Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: ApplicationFiled: December 18, 2019Publication date: April 23, 2020Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
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Patent number: 10543102Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: GrantFiled: August 14, 2015Date of Patent: January 28, 2020Assignee: DePuy Synthes Products, Inc.Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
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Patent number: 10512548Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: GrantFiled: January 15, 2016Date of Patent: December 24, 2019Assignee: DePuy Synthes Products, Inc.Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
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Patent number: 10137003Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: GrantFiled: July 21, 2017Date of Patent: November 27, 2018Assignee: DePuy Synthes Products, Inc.Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
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Publication number: 20170333201Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: ApplicationFiled: July 21, 2017Publication date: November 23, 2017Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Marcus Hunziker, David Koch
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Patent number: 9744049Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: GrantFiled: March 2, 2015Date of Patent: August 29, 2017Assignee: DePuy Synthes Products, Inc.Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
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Publication number: 20160128845Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: ApplicationFiled: January 15, 2016Publication date: May 12, 2016Inventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
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Publication number: 20150342750Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: ApplicationFiled: August 14, 2015Publication date: December 3, 2015Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
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Publication number: 20150164653Abstract: The present invention is directed to a low profile intervertebral implant for implantation in an intervertebral disc space in-between adjacent vertebral bodies. The intervertebral implant includes a plate preferably coupled to a spacer. The plate is preferably formed from a first material and the spacer is preferably formed from a second material, the first material being different from the second material. The plate is preferably sized and configured so that the plate does not extend beyond the perimeter of the spacer. In this manner, the plate preferably does not increase the height profile of the spacer and the plate may be implanted within the intervertebral disc space in conjunction with the spacer.Type: ApplicationFiled: March 2, 2015Publication date: June 18, 2015Inventors: Thomas Kueenzi, Ryan T. Walsh, Thomas Pepe, Markus Hunziker, David Koch
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Publication number: 20140148905Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: ApplicationFiled: January 29, 2014Publication date: May 29, 2014Applicant: DePuy Synthes Products, LLCInventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker
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Publication number: 20140100663Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: ApplicationFiled: December 10, 2013Publication date: April 10, 2014Applicant: Depuy Synthes Products, LLCInventors: Dominique MESSERLI, Ryan T. Walsh, Brandon L. RANDALL, David E. EVANS, Jacqueline MYER, David KOCH, Markus HUNZIKER
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Publication number: 20100305704Abstract: An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.Type: ApplicationFiled: February 27, 2007Publication date: December 2, 2010Applicant: SYNTHES GMBHInventors: Dominique Messerli, Ryan T. Walsh, Brandon L. Randall, David E. Evans, Jacqueline Myer, David Koch, Markus Hunziker