Patents by Inventor Ryan Tsai

Ryan Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LOCAL PURGE WITHIN METROLOGY AND INSPECTION SYSTEMS
    Publication number: 20200011786
    Abstract: A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted. The purge gas distribution manifold includes a bottom surface having one or more apertures through which purge gas is expelled. The bottom surface is held in close proximity to the top surface of the substrate and the apertures may be distributed over the bottom surface of the purge gas distribution manifold so that purge gas is uniformly distributed over the entirety of the top surface of the substrate at all measurement positions of the substrate with respect to the optical metrology or inspection head.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Inventors: Paul A. DOYLE, Ryan TSAI, Morgan A. CROUCH
  • Local purge within metrology and inspection systems
    Patent number: 10451542
    Abstract: A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted. The purge gas distribution manifold includes a bottom surface having one or more apertures through which purge gas is expelled. The bottom surface is held in close proximity to the top surface of the substrate and the apertures may be distributed over the bottom surface of the purge gas distribution manifold so that purge gas is uniformly distributed over the entirety of the top surface of the substrate at all measurement positions of the substrate with respect to the optical metrology or inspection head.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: October 22, 2019
    Assignee: Nanometrics Incorporated
    Inventors: Paul A. Doyle, Ryan Tsai, Morgan A. Crouch
  • LOCAL PURGE WITHIN METROLOGY AND INSPECTION SYSTEMS
    Publication number: 20190170634
    Abstract: A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted. The purge gas distribution manifold includes a bottom surface having one or more apertures through which purge gas is expelled. The bottom surface is held in close proximity to the top surface of the substrate and the apertures may be distributed over the bottom surface of the purge gas distribution manifold so that purge gas is uniformly distributed over the entirety of the top surface of the substrate at all measurement positions of the substrate with respect to the optical metrology or inspection head.
    Type: Application
    Filed: May 31, 2018
    Publication date: June 6, 2019
    Inventors: Paul A. DOYLE, Ryan Tsai, Morgan A. Crouch