Patents by Inventor Ryo Matsuhashi

Ryo Matsuhashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955367
    Abstract: A film deposition apparatus reduces hillock formation while yielding uniform film thickness distribution. A film deposition apparatus of a present embodiment includes: a chamber; a rotary table that circulates and carries a workpiece W along a circumferential transfer path L; multiple targets that contain a film deposition material, and that are provided in positions at different radial distances from a center of rotation of the rotary table; a shield member that forms a film deposition chamber surrounding a region where the film deposition material scatters, and that has an opening on the side facing the circulated and carried workpiece; and a plasma generator that includes a sputter gas introduction unit for introducing a sputter gas into the film deposition chamber, and a power supply unit for applying power to the target, and that generates plasma in the sputter gas G1 in the film deposition chamber.
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: April 9, 2024
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Shohei Tanabe, Koji Yoshimura, Ryo Matsuhashi
  • Publication number: 20220084871
    Abstract: A film deposition apparatus reduces hillock formation while yielding uniform film thickness distribution. A film deposition apparatus of a present embodiment includes: a chamber; a rotary table that circulates and carries a workpiece W along a circumferential transfer path L; multiple targets that contain a film deposition material, and that are provided in positions at different radial distances from a center of rotation of the rotary table; a shield member that forms a film deposition chamber surrounding a region where the film deposition material scatters, and that has an opening on the side facing the circulated and carried workpiece; and a plasma generator that includes a sputter gas introduction unit for introducing a sputter gas into the film deposition chamber, and a power supply unit for applying power to the target, and that generates plasma in the sputter gas G1 in the film deposition chamber.
    Type: Application
    Filed: September 14, 2021
    Publication date: March 17, 2022
    Inventors: Shohei TANABE, Koji YOSHIMURA, Ryo MATSUHASHI
  • Patent number: 10685815
    Abstract: The present invention provides a plasma processing apparatus which reduces damage from plasma generated in a discharge vessel and lengthens the replacement cycle of the discharge vessel. A plasma processing apparatus 1 is provided with a processing chamber 2 partitioning a processing space, a discharge vessel 3 whose one end opens facing inside the processing chamber 2 and the other end is closed, an antenna 4 which is disposed around the discharge vessel 3 and generates an induced electric field to generate plasma in the discharge vessel 3 under reduced pressure, and an electromagnet 9 which is arranged around the discharge vessel 3 and forms a divergent magnetic field in the discharge vessel 3. The discharge vessel 3 has at its closed end portion a protrusion 15 projecting toward the processing chamber 2.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 16, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventors: Ryo Matsuhashi, Hiroshi Akasaka, Yoshimitsu Kodaira, Atsushi Sekiguchi, Naoko Matsui
  • Patent number: 9365914
    Abstract: A nitrogen-rich two-phase stainless steel that has corrosion resistance equal to that of standard type of two-phase stainless steel and is not susceptible to corrosion in a welding heat-affected part, wherein the austenite phase area ratio is 40-70%, the PI value expressed by formula (1) is 30-38, the NI value expressed by formula (2) is 100-140, and the ?pre expressed by formula (3) is 1350-1450. (1) PI=Cr+3.3Mo+16N (2) NI=(Cr+Mo)/N.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: June 14, 2016
    Assignee: NIPPON STEEL & SUMIKIN STAINLESS STEEL CORPORATION
    Inventors: Yusuke Oikawa, Shinji Tsuge, Hiroshige Inoue, Ryo Matsuhashi
  • Patent number: 9212412
    Abstract: The present invention provides a lean duplex stainless steel able to suppress the drop in corrosion resistance and toughness of a weld heat affected zone comprising, by mass %, C: 0.06% or less, Si: 0.1 to 1.5%, Mn: 2.0 to 4.0%, P: 0.05% or less, S: 0.005% or less, Cr: 19.0 to 23.0%, Ni: 1.0 to 4.0%, Mo: 1.0% or less, Cu: 0.1 to 3.0%, V: 0.05 to 0.5%, Al: 0.003 to 0.050%, O: 0.007% or less, N: 0.10 to 0.25%, and Ti: 0.05% or less, having a balance of Fe and unavoidable impurities. An Md30 value is 80 or less, an Ni-bal is ?7.1 to 4, an austenite phase area percentage is 40 to 70%, and a 2×Ni+Cu is 3.5 or more: Md30=551?462×(C+N)?9.2×Si?8.1×Mn?29×(Ni+Cu)?13.7×Cr?18.5×Mo?68×Nb; Ni-bal=(Ni+0.5Mn+0.5Cu+30C+30N)?1.1(Cr+1.5Si+Mo+W)+8.2 and N(%)?0.37+0.03×(Ni-bal).
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: December 15, 2015
    Assignee: NIPPON STEEL & SUMIKIN STAINLESS STEEL CORPORATION
    Inventors: Yuusuke Oikawa, Hiroshi Urashima, Shinji Tsuge, Hiroshige Inoue, Ryo Matsuhashi
  • Patent number: 8710405
    Abstract: A welding wire for austenitic stainless steel welding contains, in percent by mass, C: 0.005 through 0.05%, Si: 0.1 through 1.0%, Mn: 1.0 through 3.5%, Cr: 25.0 through 28.0%, Ni: 16.0 through 23.9%, Mo: 1.6 through 3.0%, Cu: 0.1 through 0.5%, Al: 0.001 through 0.02%, and N: more than 0.30 through 0.50%, limiting O to 0.03% or less, P to 0.03% or less, and S to 0.005% or less, and having a ratio of a Cr equivalent to Ni equivalent (Cr equivalent/Ni equivalent) within a range between 0.85 and 1.2 and a PI value of 35 or more, the remainder being iron and unavoidable impurities.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: April 29, 2014
    Assignee: Nippon Steel & Sumikin Stainless Steel Corporation
    Inventors: Hiroshige Inoue, Ryuichi Honma, Manabu Mizumoto, Yuusuke Oikawa, Ryo Matsuhashi, Shinji Tsuge, Shigeo Fukumoto
  • Publication number: 20130343948
    Abstract: A nitrogen-rich two-phase stainless steel that has corrosion resistance equal to that of standard type of two-phase stainless steel and is not susceptible to corrosion in a welding heat-affected part, wherein the austenite phase area ratio is 40-70%, the PI value expressed by formula (1) is 30-38, the NI value expressed by formula (2) is 100-140, and the ?pre expressed by formula (3) is 1350-1450. (1) PI=Cr+3.
    Type: Application
    Filed: March 9, 2012
    Publication date: December 26, 2013
    Inventors: Yusuke Oikawa, Shinji Tsuge, Hiroshige Inoue, Ryo Matsuhashi
  • Patent number: 8506729
    Abstract: An austenitic stainless steel hot-rolled steel material can be provided which has sea-water resistance and strength superior to conventional steel. Low-temperature toughness can be maintained, which is preferable in a structural member of speedy craft. The steel material can include an austenitic stainless steel hot-rolled steel material which excels in the properties of corrosion resistance, proof stress, and low-temperature toughness. In such austenitic stainless steel hot-rolling steel material, e.g., PI [=Cr+3.3(Mo+0.5W)+16N] ranges from 35 to 40, ? cal [=2.9 (Cr+0.3Si+Mo+0.5W)?2.6 (Ni+0.3Mn+0.25Cu+35C+20N)?18] ranges from ?6 to +2, and a 0.2% proof stress at room temperature is not less than 550 MPa, Charpy impact value measured using a V-notch test piece at ?40° C. is not less than 100 J/cm2, and the pitting potential measured in a deaerated aqueous solution of 10% NaCl at 50° C. (Vc?100) is not less than 500 mV (as it relates to saturated Ag/AgCl).
    Type: Grant
    Filed: January 13, 2012
    Date of Patent: August 13, 2013
    Assignee: Nippon Steel & Sumikin Stainless Steel Corporation
    Inventors: Yuusuke Oikawa, Shinji Tsuge, Shigeo Fukumoto, Kazuhiro Suetsugu, Ryo Matsuhashi, Hiroshige Inoue
  • Publication number: 20120145671
    Abstract: The present invention provides a plasma processing apparatus which reduces damage from plasma generated in a discharge vessel and lengthen the replacement cycle of the discharge vessel. A plasma processing apparatus 1 is provided with a processing chamber 2 partitioning a processing space, a discharge vessel 3 whose one end opens facing inside the processing chamber 2 and the other end is closed, an antenna 4 which is disposed around the discharge vessel 3 and generates an induced electric field to generate plasma in the discharge vessel 3 under reduced pressure, and an electromagnet 9 which is arranged around the discharge vessel 3 and forms a divergent magnetic field in the discharge vessel 3. The discharge vessel 3 has at is closed end portion a protrusion 15 projecting toward the processing chamber 2.
    Type: Application
    Filed: August 25, 2010
    Publication date: June 14, 2012
    Applicant: CANON ANELVA CORPORATION
    Inventors: Ryo Matsuhashi, Hiroshi Akasaka, Yoshimitsu Kodaira, Atsushi Sekiguchi, Naoko Matsui
  • Publication number: 20120111457
    Abstract: An austenitic stainless steel hot-rolled steel material can be provided which has seawater resistance and strength superior to conventional steel. Low-temperature toughness can be maintained, which is preferable in a structural member of speedy craft. The steel material can include an austenitic stainless steel hot-rolled steel material which excels in the properties of corrosion resistance, proof stress, and low-temperature toughness. In such austenitic stainless steel hot-rolling steel material, e.g., PI [=Cr+3.3(Mo+0.5W)+16N] ranges from 35 to 40, ? cal [=2.9 (Cr+0.3Si +Mo+0.5W)?2.6 (Ni+0.3Mn+0.25Cu+35C+20N)?18] ranges from ?6 to +2, and a 0.2% proof stress at room temperature is not less than 550 MPa, Charpy impact value measured using a V-notch test piece at ?40° C. is not less than 100 J/cm2, and the pitting potential measured in a deaerated aqueous solution of 10% NaCl at 50° C. (Vc'100) is not less than 500 mV (as it relates to saturated Ag/AgCl).
    Type: Application
    Filed: January 13, 2012
    Publication date: May 10, 2012
    Applicant: Nippon Steel Corporation
    Inventors: Yuusuke Oikawa, Shinji Tsuge, Shigeo Fukumoto, Kazuhiro Suetsugu, Ryo Matsuhashi, Hiroshige Inoue
  • Patent number: 8105447
    Abstract: An austenitic stainless steel hot-rolled steel material can be provided which has sea-water resistance and strength superior to conventional steel. Low-temperature toughness can be maintained, which is preferable in a structural member of speedy craft. The steel material can include an austenitic stainless steel hot-rolled steel material which excels in the properties of corrosion resistance, proof stress, and low-temperature toughness. In such austenitic stainless steel hot-rolling steel material, e.g., PI [=Cr+3.3(Mo+0.5W)+16N] ranges from 35 to 40, ? cal [=2.9(Cr+0.3Si+Mo+0.5W)?2.6(Ni+0.3Mn+0.25Cu+35C+20N)?18] ranges from ?6 to +2, and a 0.2% proof stress at room temperature is not less than 550 MPa, Charpy impact value measured using a V-notch test piece at ?40° C. is not less than 100 J/cm2, and the pitting potential measured in a deaerated aqueous solution of 10% NaCl at 50° C. (Vc?100) is not less than 500 mV (as it relates to saturated Ag/AgCl).
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: January 31, 2012
    Assignee: Nippon Steel & Sumikin Stainless Steel Corporation
    Inventors: Yuusuke Oikawa, Shinji Tsuge, Shigeo Fukumoto, Kazuhiro Suetsugu, Ryo Matsuhashi, Hiroshige Inoue
  • Publication number: 20110097234
    Abstract: The present invention provides a lean duplex stainless steel able to suppress the drop in corrosion resistance and toughness of a weld heat affected zone and is characterized by containing, by mass %, C: 0.06% or less, Si: 0.1 to 1.5%, Mn: 2.0 to 4.0%, P: 0.05% or less, S: 0.005% or less, Cr: 19.0 to 23.0%, Ni: 1.0 to 4.0%, Mo: 1.0% or less, Cu: 0.1 to 3.0%, V: 0.05 to 0.5%, Al: 0.003 to 0.050%, 0: 0.007% or less, N: 0.10 to 0.25%, and Ti: 0.05% or less, having a balance of Fe and unavoidable impurities, having an Md30 value expressed by formula (1) of 80 or less, having an Ni-bal expressed by formula (2) of ?8 to ?4, having a relationship between the Ni-bal and the N content satisfying formula (3), having an austenite phase area percentage of 40 to 70%, and having a 2×Ni+Cu of 3.5 or more: Md30=551?462×(C+N)?9.2×Si?8.1×Mn?29×(Ni+Cu)?13.7×Cr?18.5×Mo?68×Nb ??(1) Ni-bal=(Ni+0.5Mn+0.5Cu+30C+30N)?1.1(Cr+1.5Si+Mo+W)+8.2 ??(2) N(%)?0.37+0.
    Type: Application
    Filed: March 26, 2009
    Publication date: April 28, 2011
    Inventors: Yuusuke Oikawa, Hiroshi Urashima, Shinji Tsuge, Hiroshige Inoue, Ryo Matsuhashi
  • Publication number: 20100230011
    Abstract: An austenitic stainless steel hot-rolled steel material can be provided which has sea-water resistance and strength superior to conventional steel. Low-temperature toughness can be maintained, which is preferable in a structural member of speedy craft. The steel material can include an austenitic stainless steel hot-rolled steel material which excels in the properties of corrosion resistance, proof stress, and low-temperature toughness. In such austenitic stainless steel hot-rolling steel material, e.g., PI [=Cr+3.3(Mo+0.5W)+16N] ranges from 35 to 40, ? cal [=2.9(Cr+0.3Si+Mo+0.5W)?2.6(Ni+0.3Mn+0.25Cu+35C+20N)?18] ranges from ?6 to +2, and a 0.2% proof stress at room temperature is not less than 550 MPa, Charpy impact value measured using a V-notch test piece at ?40° C. is not less than 100 J/cm2, and the pitting potential measured in a deaerated aqueous solution of 10% NaCl at 50° C. (Vc'100) is not less than 500 mV (as it relates to saturated Ag/AgCl).
    Type: Application
    Filed: February 23, 2009
    Publication date: September 16, 2010
    Applicant: Nippon Steel & Sumikin Stainless Steel Corporation
    Inventors: Yuusuke Oikawa, Shinji Tsuge, Shigeo Fukumoto, Kazuhiro Suetsugu, Ryo Matsuhashi, Hiroshige Inoue
  • Publication number: 20060243719
    Abstract: A welding wire for austenitic stainless steel welding contains, in percent by mass, C: 0.005 through 0.05%, Si: 0.1 through 1.0%, Mn: 1.0 through 3.5%, Cr: 25.0 through 28.0%, Ni: 16.0 through 23.9%, Mo: 1.6 through 3.0%, Cu: 0.1 through 0.5%, Al: 0.001 through 0.02%, and N: more than 0.30 through 0.50%, limiting 0 to 0.03% or less, P to 0.03% or less, and S to 0.005% or less, and having a ratio of a Cr equivalent to Ni equivalent (Cr equivalent/Ni equivalent) within a range between 0.85 and 1.2 and a PI value of 35 or more, the remainder being iron and unavoidable impurities.
    Type: Application
    Filed: April 13, 2006
    Publication date: November 2, 2006
    Inventors: Hiroshige Inoue, Ryuichi Honma, Manabu Mizumoto, Yuusuke Oikawa, Ryo Matsuhashi, Shinji Tsuge, Shigeo Fukumoto
  • Publication number: 20060243356
    Abstract: An austenitic stainless steel hot-rolled steel material can be provided which has sea-water resistance and strength superior to conventional steel. Low-temperature toughness can be maintained, which is preferable in a structural member of speedy craft. The steel material can include an austenitic stainless steel hot-rolled steel material which excels in the properties of corrosion resistance, proof stress, and low-temperature toughness. In such austenitic stainless steel hot-rolling steel material, e.g., PI[=Cr+3.3(Mo+0.5W)+16N] ranges from 35 to 40, ? cal [=2.9 (Cr+0.3Si+Mo+0.5W)?2.6 (Ni+0.3Mn+0.25Cu+35C+20N)?18] ranges from ?6 to +2, and a 0.2% proof stress at room temperature is not less than 550 MPa, Charpy impact value measured using a V-notch test piece at ?40° C. is not less than 100 J/cm2, and the pitting potential measured in a deaerated aqueous solution of 10% NaCl at 50° C. (Vc?100) is not less than 500 mV (as it relates to saturated Ag/AgCl).
    Type: Application
    Filed: January 30, 2006
    Publication date: November 2, 2006
    Inventors: Yuusuke Oikawa, Shinji Tsuge, Shigeo Fukumoto, Kazuhiro Suetsugu, Ryo Matsuhashi, Hiroshige Inoue
  • Publication number: 20060152001
    Abstract: A specified metal member included among the components of a valve, coupling or like fluid handling part for use in piping and fluid control devices is made of an alloy comprising, in % by weight, 0.001 to 0.01% of C, up to 5% of Si, up to 2% of Mn, up to 0.03% of P, up to 100 ppm of S, up to 50 ppm of O, 18 to 25% of Cr, 15 to 25% of Ni, 4.5 to 7.0% of Mo, 0.5 to 3.0% of Cu, 0.1 to 0.3% of N, and the balance substantially Fe and other inevitable impurities, the alloy having a CRI (crevice corrosion resistance index) value in the range of 40?CRI?55, as determined from the expression CRI=[Cr]+4×[Mo]+30×[N] wherein the amount of alloy components present in combination in the alloy to ensure crevice corrosion resistance are expressed in % by weight.
    Type: Application
    Filed: July 9, 2003
    Publication date: July 13, 2006
    Inventors: Ryo Matsuhashi, Kazuhiro Suetsugu, Hideyuki Miyagawa, Toshio Kita, Kyota Sogabe, Kazuhiro Yoshikawa, Akihiro Morimoto, Jyunji Sato, Kunihiko Daido, Hisatoshi Akamoto, Yoshiki Kimura
  • Publication number: 20060102868
    Abstract: A specified metal member (e.g., a bolt) 5 included among a plurality of components 2, 3, 4, 5, 6 of a fluid handling part and having a surface exposed on an exterior of the fluid handling part is made of an alloy comprising, in % by weight, 0.001 to 0.01% of C, up to 5% of Si, up to 2% of Mn, up to 0.03% of P, up to 100 ppm of S, up to 50 ppm of O, 18 to 25% of Cr, 15 to 25% of Ni, 4.5 to 7.0% of Mo, 0.5 to 3.0% of Cu, 0.1 to 0.3% of N, and the balance substantially Fe and other inevitable impurities.
    Type: Application
    Filed: July 9, 2003
    Publication date: May 18, 2006
    Inventors: Ryo Matsuhashi, Kazuhiro Suetsugu, Hideyuki Miyagawa, Toshio Kita, Kyota Sogabe, Kazuhiro Yoshikawa, Akihiro Morimoto, Jyunji Sato, Kunihiko Daido, Masahiko Sogao, Yoshiaki Chikaike
  • Publication number: 20060102867
    Abstract: A fluid control device 1 comprises a metal body 2 having a fluid inlet channel 2a, a fluid outlet channel 2b and a communication channel 2c for holding the two channels in communication, and a metal slide member 3 vertically movable in a vertical passage 11 including the communication channel 2c for closing or opening the communication channel 2c with an end portion thereof. At least the end portion 3a of the slide member 3 is made of an alloy comprising, in % by weight, 0.001 to 0.01% of C, up to 5% of Si, up to 2% of Mn, up to 0.03% of P, up to 100 ppm of S, up to 50 ppm of O, 18 to 25% of Cr, 15 to 25% of Ni, 4.5 to 7.0% of Mo, 0.5 to 3.0% of Cu, 0.1 to 0.3% of N, and the balance substantially Fe and other inevitable impurities.
    Type: Application
    Filed: July 9, 2003
    Publication date: May 18, 2006
    Inventors: Ryo Matsuhashi, Kazuhiro Suetsugu, Hideyuki Miyagawa, Toshio Kita, Kyota Sogabe, Kazuhiro Yoshikawa, Akihiro Morimoto, Jyunji Sato, Kunihiko Daido, Hirokatsu Maeda
  • Publication number: 20060091672
    Abstract: A pipe coupling 30 comprises a tubular body 31 for a pipe 32 to be inserted in through the rear end thereof, a front ring 33 and a back ring 34 to be fitted around the pipe 32 projecting from the rear end of the body 31, and a cap nut 35 for tightening up the front and back rings 33, 34 to fix the pipe 32 to the body 31. The back ring 34 is made of an alloy comprising, in % by weight, 0.001 to 0.01% of C, up to 5% of Si, up to 2% of Mn, up to 0.03% of P, up to 100 ppm of S, up to 50 ppm of O, 18 to 25% of Cr, 15 to 25% of Ni, 4.5 to 7.0% of Mo, 0.5 to 3.0% of Cu, 0.1 to 0.3% of N, and the balance substantially Fe and other inevitable impurities.
    Type: Application
    Filed: July 9, 2003
    Publication date: May 4, 2006
    Inventors: Ryo Matsuhashi, Kazuhiro Suetsugu, Hideyuki Miyagawa, Toshio Kita, Kyota Sogabe, Kazuhiro Yoshikawa, Akihiro Morimoto, Jyunji Sato, Kunihiko Shimomura, Yoshinori Shimomura, Takayasu Nakahama
  • Publication number: 20060073705
    Abstract: A method for dividing a semiconductor wafer along a plurality of streets, the semiconductor wafer having a face on which a plurality of rectangular regions are defined by the streets arranged in a lattice pattern, and a semiconductor device is formed in each of the rectangular regions. This method comprises a protective member coating step of coating the face of the semiconductor wafer with a protective member, a resist film coating step of coating the back of the semiconductor wafer, except sites corresponding to the streets, with a resist film, and a plasma etching step of applying plasma etching to the back of the semiconductor wafer to divide the semiconductor wafer along the streets.
    Type: Application
    Filed: September 29, 2005
    Publication date: April 6, 2006
    Inventors: Kazuhisa Arai, Shinichi Fujisawa, Ryo Matsuhashi, Takashi Ono, Toshihiro Funanaka, Jun Hachiya, Akihito Kawai