Patents by Inventor Ryo SHIRANITA

Ryo SHIRANITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SPUTTERING TARGET MATERIAL AND OXIDE SEMICONDUCTOR
    Publication number: 20230307549
    Abstract: A sputtering target material comprises an oxide including elemental indium (In), elemental zinc (Zn), and an additive element (X). The additive element (X) is one or more elements selected from tantalum (Ta), strontium (Sr), and niobium (Nb). In the sputtering target material, the atomic ratios between the elements satisfy the formulae (1) to (3) below. The sputtering target material has a relative density of 95% or more. 0.4 ? In+X / In+Zn+X ? 0.8 ­­­(1) 0.2 ? Zn / In+Zn+X ? 0.
    Type: Application
    Filed: August 2, 2021
    Publication date: September 28, 2023
    Inventors: Kyosuke TERAMURA, Ryo SHIRANITA, Shigeki TOKUCHI