Patents by Inventor Ryo Takai

Ryo Takai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10481509
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 19, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Publication number: 20190278185
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 12, 2019
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Patent number: 10197926
    Abstract: The present invention provides an exposure apparatus exposing a substrate through a projection optical system, the apparatus comprising a stage configured to hold the substrate, a detection unit configured to emit detection light in a first direction and detect a position of the stage, a blowing unit configured to blow out a gas, and a guide unit including a first portion and a second portion, wherein the first portion is configured to guide the gas to a first space between the projection optical system and the substrate, such that a gas flow along the substrate is formed in the first space, and wherein the second portion is configured to guide the gas to a second space where the detection light passes through, such that a gas flow in a second direction is formed in the second space.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: February 5, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Ryo Takai
  • Patent number: 9804510
    Abstract: Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: October 31, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Zenichi Hamaya, Ryo Takai, Shinichiro Hirai, Takeshi Rokukawa, Takashi Miura
  • Publication number: 20170184983
    Abstract: The present invention provides an exposure apparatus exposing a substrate through a projection optical system, the apparatus comprising a stage configured to hold the substrate, a detection unit configured to emit detection light in a first direction and detect a position of the stage, a blowing unit configured to blow out a gas, and a guide unit including a first portion and a second portion, wherein the first portion is configured to guide the gas to a first space between the projection optical system and the substrate, such that a gas flow along the substrate is formed in the first space, and wherein the second portion is configured to guide the gas to a second space where the detection light passes through, such that a gas flow in a second direction is formed in the second space.
    Type: Application
    Filed: December 13, 2016
    Publication date: June 29, 2017
    Inventor: Ryo Takai
  • Patent number: 9217937
    Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: December 22, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Zenichi Hamaya, Keiji Emoto, Ryo Takai, Shinichiro Hirai
  • Publication number: 20140198307
    Abstract: Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.
    Type: Application
    Filed: January 13, 2014
    Publication date: July 17, 2014
    Inventors: Zenichi Hamaya, Ryo Takai, Shinichiro Hirai, Takeshi Rokukawa, Takashi Miura
  • Publication number: 20140125962
    Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
    Type: Application
    Filed: October 29, 2013
    Publication date: May 8, 2014
    Applicant: Canon Kabushiki Kaisha
    Inventors: Zenichi Hamaya, Keiji Emoto, Ryo Takai, Shinichiro Hirai
  • Publication number: 20110051109
    Abstract: A measurement apparatus which includes a plurality of sensors arranged on a movable member, and a plurality of scales attached to a structure, and measures a position of the movable member by detecting a displacement of the movable member using a sensor and a scale that face each other, the plurality of scales including two first scales configured to detect displacements of the movable member in a first direction, and two second scales configured to detect displacements of the movable member in a second direction different from the first direction, and the apparatus comprising a controller configured to reduce a measurement error resulting from a geometrical error between the two first scales.
    Type: Application
    Filed: August 31, 2010
    Publication date: March 3, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Keiji EMOTO, Ryo TAKAI
  • Patent number: 6819433
    Abstract: To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).
    Type: Grant
    Filed: February 12, 2002
    Date of Patent: November 16, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryo Takai, Kazunori Iwamoto
  • Publication number: 20020109850
    Abstract: To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).
    Type: Application
    Filed: February 12, 2002
    Publication date: August 15, 2002
    Applicant: Canon Kabushiki Kaisha
    Inventors: Ryo Takai, Kazunori Iwamoto