Abstract: A semiconductor memory device has a memory cell array with memory cells, each including first and second conduction type transistors, column-side peripheral circuits disposed with the same row-direction interval as the memory cells, a first conduction type well region formed within the memory cell array, a second conduction type well region formed within the first conduction type well region and is disposed separately in the row direction, a second conduction type well contact region disposed extending in the row direction among the memory cells, a first conduction type well contact region disposed extending in the column direction among the memory cells, a column-side peripheral contact region, a first conduction type back gate voltage line connecting to the first conduction type well region; and a second conduction type back gate voltage line connecting to the second conduction type well.

Abstract: A semiconductor memory device has a memory cell array having memory cells, each including first and second conduction type transistors, a peripheral circuit having the first and second conduction type transistors, a first conduction type memory cell array well region within the memory cell array region, a second conduction type memory cell array well region within the first conduction type memory cell array well region, a first conduction type peripheral circuit well region within the peripheral circuit region, a second conduction type peripheral circuit well region within the first conduction type peripheral circuit well region, and a second conduction type isolation region between the first conduction type memory cell array well region and the first conduction type peripheral circuit well region. At least a portion of first conduction type transistors of first conduction type transistors of the peripheral circuit is formed in the second conduction type isolation region.

Abstract: The semiconductor memory device includes a memory cell, a pair of bit lines and a cell power line connected to the memory cell, a first switch connected to the bit lines and a power voltage line, a second switch connected to the cell power line and a write assist cell power line, and a write control circuit configured to control the bit lines, the first switch and the second switch, wherein the write control circuit applies a first voltage of a high level to one bit line and a second voltage of a low level to the other bit line, connects one bit line to the power voltage line and disconnects the other bit line from the power voltage line by the first switch, and then connects the cell power line to the write assist cell power line lower which is than the first voltage by the second switch.

Abstract: A semiconductor memory device including a memory cell of static type; a word line connected to the memory cell; a word driver driving the word line; and a compensating circuit including a first transistor of N-channel type having a drain connected to the word line and a source to be connected to a ground potential, and a control circuit connected to the first transistor and changing the first transistor from an OFF state to an ON state based on a rise of an ambient temperature or a rise of a power source voltage to thereby lower a voltage of the word line.

Abstract: In a second direction, in a plan view, an n-channel MOS transistor and an expanding film are adjacent. Therefore, the n-channel MOS transistor receives a positive stress in the direction in which a channel length is extended from the expanding film. As a result, a positive tensile strain in an electron moving direction is generated in a channel of the n-channel MOS transistor. On the other hand, in the second direction, in a plan view, a p-channel MOS transistor and the expanding film are shifted from each other. Therefore, the p-channel MOS transistor receives a positive stress in the direction in which a channel length is narrowed from the expanding film. As a result, a positive compressive strain in a hole moving direction is generated in a channel of the p-channel MOS transistor. Thus, both on-currents of the n-channel MOS transistor and the p-channel MOS transistor can be improved.

Abstract: In a second direction, in a plan view, an n-channel MOS transistor and an expanding film are adjacent. Therefore, the n-channel MOS transistor receives a positive stress in the direction in which a channel length is extended from the expanding film. As a result, a positive tensile strain in an electron moving direction is generated in a channel of the n-channel MOS transistor. On the other hand, in the second direction, in a plan view, a p-channel MOS transistor and the expanding film are shifted from each other. Therefore, the p-channel MOS transistor receives a positive stress in the direction in which a channel length is narrowed from the expanding film. As a result, a positive compressive strain in a hole moving direction is generated in a channel of the p-channel MOS transistor. Thus, both on-currents of the n-channel MOS transistor and the p-channel MOS transistor can be improved.

Abstract: In a second direction, in a plan view, an n-channel MOS transistor and an expanding film are adjacent. Therefore, the n-channel MOS transistor receives a positive stress in the direction in which a channel length is extended from the expanding film. As a result, a positive tensile strain in an electron moving direction is generated in a channel of the n-channel MOS transistor. On the other hand, in the second direction, in a plan view, a p-channel MOS transistor and the expanding film are shifted from each other. Therefore, the p-channel MOS transistor receives a positive stress in the direction in which a channel length is narrowed from the expanding film. As a result, a positive compressive strain in a hole moving direction is generated in a channel of the p-channel MOS transistor. Thus, both on-currents of the n-channel MOS transistor and the p-channel MOS transistor can be improved.

Abstract: A battery module includes a plurality of battery supports each having a face orthogonal to the stacking direction, and a side face, the battery supports each containing a plurality of cells and being made of an insulating material, a coupling part that is located between the face of one battery support and the face of another adjacent battery support, and contracts in the stacking direction upon stacking the battery supports to bring the faces of the battery supports into intimate contact, a group of cells including the battery supports stacked with the coupling part being placed between the battery supports, a base plate, and first and second regulating plates placed facing each other in a standing position on the base plate, the first and second regulating plates sandwiching the group of cells arranged between the first and second regulating plates and stacked with the coupling part being contracted.

Abstract: A battery unit includes a box-shaped case in which a plurality of secondary batteries are stored and that includes a front face, a back face, a first lateral face, a second lateral face, a first main face, and a second main face, a first heat-transfer face that is provided on one faces of the first and second main faces of the case, a second heat-transfer face that is formed on at least one faces of the first and second lateral faces and is continued to the first heat-transfer face, and an insulating face that is formed on the front face, the back face, the other faces of the first and second main faces, and an inner face of the second heat-transfer face. In the battery unit, a battery element of the secondary batteries is stored in an outer package member and positive and negative electrode tabs are led out.

Abstract: A battery unit includes a battery cell that charges and discharges electric power; and a bracket that has an outer peripheral wall portion surrounding an outer peripheral side of the battery cell, and a support body which is provided inside the outer peripheral wall portion and supports the battery cell, wherein two battery cells are inserted from a front surface side and a back surface side of the bracket into the outer peripheral wall portion and are mounted on both side surfaces of the support body.

Abstract: A trench is formed in a surface layer of a semiconductor substrate, the trench surrounding an active region. A lower insulating film made of insulating material is deposited over the semiconductor device, the lower insulating film filling a lower region of the trench and leaving an empty space in an upper region. An upper insulating film made of insulating material having therein a tensile stress is deposited on the lower insulating film, the upper insulating film filling the empty space left in the upper space. The upper insulating film and the lower insulating film deposited over the semiconductor substrate other than in the trench are removed.

Abstract: Each of channel regions 2a and 3b is covered by a gate electrode 6 via a gate insulation film 5 and side wall spacers 9 from its top face to both side faces along an x-direction. In other words, there is no insulation material of an STI element isolation structure 4 on both side faces along the x-direction of each of the channel regions 2b and 3b (in a non-contact state), thereby preventing stress in a z-direction from being applied by the STI element isolation structure 4 to each of the channel region 2b and 3b.

Abstract: A trench is formed in a surface layer of a semiconductor substrate, the trench surrounding an active region. A lower insulating film made of insulating material is deposited over the semiconductor device, the lower insulating film filling a lower region of the trench and leaving an empty space in an upper region. An upper insulating film made of insulating material having therein a tensile stress is deposited on the lower insulating film, the upper insulating film filling the empty space left in the upper space. The upper insulating film and the lower insulating film deposited over the semiconductor substrate other than in the trench are removed.

Abstract: A trench is formed in the surface layer of a semiconductor substrate, surrounding an active region. A lower insulating film made of insulating material fills a lower region of the trench. An upper insulating film fills a region of the trench above the lower insulating film. The upper insulating film has therein a stress generating tensile strain in a surface layer of the active region.

Abstract: In a second direction, in a plan view, an n-channel MOS transistor and an expanding film are adjacent. Therefore, the n-channel MOS transistor receives a positive stress in the direction in which a channel length is extended from the expanding film. As a result, a positive tensile strain in an electron moving direction is generated in a channel of the n-channel MOS transistor. On the other hand, in the second direction, in a plan view, a p-channel MOS transistor and the expanding film are shifted from each other. Therefore, the p-channel MOS transistor receives a positive stress in the direction in which a channel length is narrowed from the expanding film. As a result, a positive compressive strain in a hole moving direction is generated in a channel of the p-channel MOS transistor. Thus, both on-currents of the n-channel MOS transistor and the p-channel MOS transistor can be improved.

Abstract: Each of channel regions 2a and 3b is covered by a gate electrode 6 via a gate insulation film 5 and side wall spacers 9 from its top face to both side faces along an x-direction. In other words, there is no insulation material of an STI element isolation structure 4 on both side faces along the x-direction of each of the channel regions 2b and 3b (in a non-contact state), thereby preventing stress in a z-direction from being applied by the STI element isolation structure 4 to each of the channel region 2b and 3b.

Abstract: Each of channel regions 2a and 3b is covered by a gate electrode 6 via a gate insulation film 5 and side wall spacers 9 from its top face to both side faces along an x-direction. In other words, there is no insulation material of an STI element isolation structure 4 on both side faces along the x-direction of each of the channel regions 2b and 3b (in a non-contact state), thereby preventing stress in a z-direction from being applied by the STI element isolation structure 4 to each of the channel region 2b and 2b.

Abstract: A trench is formed in the surface layer of a semiconductor substrate, surrounding an active region. A lower insulating film made of insulating material fills a lower region of the trench. An upper insulating film fills a region of the trench above the lower insulating film. The upper insulating film has therein a stress generating tensile strain in a surface layer of the active region.

Abstract: Each of channel regions 2a and 3b is covered by a gate electrode 6 via a gate insulation film 5 and side wall spacers 9 from its top face to both side faces along an x-direction. In other words, there is no insulation material of an STI element isolation structure 4 on both side faces along the x-direction of each of the channel regions 2b and 3b (in a non-contact state), thereby preventing stress in a z-direction from being applied by the STI element isolation structure 4 to each of the channel region 2b and 2b.