Patents by Inventor Ryo Tsujimura

Ryo Tsujimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for efficiently verifying optical proximity correction
    Patent number: 7303845
    Abstract: A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: December 4, 2007
    Assignee: Fujitsu Limited
    Inventors: Tomoyuki Okada, Masahiko Minemura, Mitsuo Sakurai, Ryo Tsujimura
  • Method and system for efficiently verifying optical proximity correction
    Publication number: 20050166112
    Abstract: A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.
    Type: Application
    Filed: March 9, 2005
    Publication date: July 28, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Tomoyuki Okada, Masahiko Minemura, Mitsuo Sakurai, Ryo Tsujimura
  • Method and apparatus of producing partial-area mask data files
    Patent number: 6444483
    Abstract: A full area of a semiconductor integrated circuit is divided into unit areas, a mask data file for use in a beam exposure system or an inspection apparatus is produced based on CAD data of the full area, full-area header information in which a starting address of a mask data of each unit area relates to positional information on said unit area, partial-area header information corresponding to each of partial areas obtained by division of the full area is produced based on the full-area header information and mask data of the partial areas are extracted from a mask data of the full area based on the partial area header information to produce the mask data files corresponding to the partial area header information.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: September 3, 2002
    Assignee: Fujitsu Limited
    Inventors: Masahiko Minemura, Tomoyuki Okada, Ryo Tsujimura, Kenji Kikuchi, Yoshimasa Iiduka