Patents by Inventor Ryohei Shinya

Ryohei Shinya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11930740
    Abstract: The combine may include a threshing tank that is configured to store a threshing product obtained by the threshing device and includes a lower tapered portion formed in a bottom portion. A bottom screw is provided inside the lower tapered portion and configured to discharge the threshing product from the threshing tank. A threshing discharge device is connected to the bottom screw and configured to convey the threshing product from the bottom screw and discharge the threshing product in a body outward direction. The threshing tank includes an inspection port formed in a bottom section of the lower tapered portion, and a lid configured to open and close the inspection port, and the lid opens and closes by swinging upward and downward about a swing axis that is not parallel with a screw axis of the bottom screw.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 19, 2024
    Assignee: Kubota Corporation
    Inventors: Mamoru Shinya, Yusaku Yoshida, Tsuyoshi Kumatori, Takashi Kitahara, Yoshifumi Tango, Ryohei Higashitaki, Toshinari Nishimura, Masakazu Hino, Shota Hayashi, Nobuki Kitamura
  • Patent number: 4534312
    Abstract: A vacuum evaporation apparatus for depositing an evaporant as a thin film on a substrate comprises a sealed container including a substrate support for mounting thereon the substrate. A heat medium such as of diphenyl, for example, is filled in the substrate support. The heat medium in the substrate support is supplied with heat by a heater. When heated, the heat medium is vaporized and the vapor gas having absorbed heat of evaporation is moved quickly from a high-temperature region to a low-temperature region. The vapor gas in the low-temperature region is supersaturated and turned into the heat medium liquid. The heat energy born as latent heat by the vapor gas is given off to heat the substrate support uniformly. With this thermosiphon action, the substrate can be heated through the substrate support so as to have a uniform overall temperature distribution for forming a uniformly deposited thin film on the substrate surface.
    Type: Grant
    Filed: August 30, 1983
    Date of Patent: August 13, 1985
    Assignee: Ricoh Company, Ltd.
    Inventors: Ryohei Shinya, Shin'ichi Miura, Rikio Aozuka