Abstract: A surface modifying method of modifying a bonding surface of a substrate to be bonded to another substrate by plasma of a processing gas includes an adjusting process and a modifying process. In the adjusting process, an amount of moisture in a processing vessel is adjusted by supplying a humidified gas into the processing vessel allowed to accommodate the substrate therein. In the modifying process, the bonding surface of the substrate is modified by forming the plasma of the processing gas in the processing vessel in a state that the amount of moisture in the processing vessel is adjusted.

Abstract: The present technology is mainly directed to providing a technology that enables smooth setting of sheath liquid. Provided is a fluid control device including at least a support portion that supports a sheath liquid storage unit and a sealed portion that houses the support portion. The support portion is detachable from the sealed portion, and the sealed portion is controlled by pressurization in order to feed sheath liquid stored in the sheath liquid storage unit to a microparticle measurement device.

Abstract: The present technology is mainly directed to providing a technology that enables smooth setting of sheath liquid. To achieve the object, in the present technology, provided is a fluid control device including at least: a support portion that supports a sheath liquid storage unit; and a sealed portion that houses the support portion, in which the support portion is detachable from the sealed portion, and the sealed portion is controlled by pressurization in order to feed sheath liquid stored in the sheath liquid storage unit to a microparticle measurement device.

Abstract: There is provided a connecting member to be attached to a substrate that includes at least a sample introduction section to introduce a sample, a sheath liquid introduction section to introduce a sheath liquid, and a jetting section to jet droplets, the connecting member including at least: a sample introduction linking section to be linked to the sample introduction section; a sheath liquid introduction linking section to be linked to the sheath liquid introduction section; and a charging electrode section that provides charges to at least part of the droplets. The sample introduction linking section and the sheath liquid introduction linking section are positioned so as to be linked to corresponding positions of the substrate.

Abstract: The invention relates to a flat knitting machine capable of obtaining a high quality knit fabric excellent in knitting property (ease of knitting), by variably adjusting the knock-over timing when knitting, depending on the characteristics of knitting threads and knitted texture of the knit fabric. The characteristics of the knit fabric depends upon the sinkers which have at least one aperture near a tip end of the sinkers. A knitting thread stopping wire rod is passed through one aperture near the tip end of the sinker. The knit fabric depends upon which aperture near the tip end that the knitting thread stopping wire rod is passed.