Abstract: To provide an article with a surface layer, that is excellent in fingerprint stain removability, friction resistance, and adhesion to a protective film of the surface layer. An article with a surface layer, comprising a base material and a surface layer provided on the surface of the base material and characterized in that the surface layer contains groups having —O— between carbon-carbon atoms of a fluoroalkyl group with two or more carbon atoms, and the normalized F intensity obtained by preparing a glass containing 4.96 mass % of fluorine atoms (IGS G4 Fluoride Opal Glass manufactured by Bureau of Analysed Samples Ltd.) as a standard sample, measuring, by an X-ray fluorescence spectrometer, the fluorine atom intensity in the surface layer and the fluorine atom intensity in the standard sample, respectively, and dividing the fluorine atom intensity in the surface layer by the fluorine atom intensity in the standard sample, is from 0.38 to 0.53.

Abstract: The glass plate according to the present invention has a buffer layer containing a plurality of sulfate crystals on a bottom surface which is brought into contact with a molten metal during formation in accordance with a float method, and the plurality of sulfate crystals have a median value of equivalent circle diameters of 350 nm or smaller as observed from a thickness direction.

Abstract: A float glass for chemical strengthening, having a bottom surface to contact a molten metal during molding and a top surface facing the bottom surface. An absolute value of a difference between a normalized hydrogen concentration at a depth of 5 to 10 ?m that is a value obtained by dividing a hydrogen concentration at a depth of 5 to 10 ?m by a hydrogen concentration at a depth of 50 to 55 ?m in the top surface and the normalized hydrogen concentration at a depth of 5 to 10 ?m in the bottom surface is 0.35 or less.

Abstract: A float glass for chemical strengthening, having a bottom surface to contact a molten metal during molding and a top surface facing the bottom surface. An absolute value of a difference between a normalized hydrogen concentration at a depth of 5 to 10 ?m that is a value obtained by dividing a hydrogen concentration at a depth of 5 to 10 ?m by a hydrogen concentration at a depth of 50 to 55 ?m in the top surface and the normalized hydrogen concentration at a depth of 5 to 10 ?m in the bottom surface is 0.35 or less.

Abstract: The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 ?m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Abstract: The present invention provides a glass substrate for flat panel display in which yellowing occurring in a case of forming silver electrodes on glass substrate surface is inhibited. A glass substrate for flat panel display, which is formed by a float method, which has a composition consisting essentially of, in terms of oxide amount in mass %: SiO2 50 to 72%, Al2O3 0.15 to 15%, MgO + CaO + SrO + BaO 4 to 30%, Na2O more than 0% and at most 10%, K2O 1 to 21%, Li2O 0 to 1%, Na2O + K2O + Li2O 6 to 25%, ZrO2 0 to 10%, and Fe2O3 0.0725 to 0.15%; and wherein the average Fe2+ content in a surface layer of the glass substrate within a depth of 10 ?m from the a top surface is at most 0.0725% in terms of Fe2O3 amount.

Abstract: The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 ?m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Abstract: To provide a process for producing a reliable substrate in good yield, by suppressing bleeding of boric acid from a green sheet comprising a powder of borosilicate glass to improve printability of a conductive pattern thereby to prevent disconnection. A process for producing a substrate which comprises firing a green sheet comprising a powder of borosilicate glass, wherein the powder is one prepared by holding borosilicate glass before pulverization, at a temperature higher by at least 30° C. than the glass transition temperature and lower by at most 50° C. than the softening point of the borosilicate glass for at least 3 hours in the atmosphere, followed by pulverization.

Abstract: The present invention provides a glass substrate for flat panel display in which yellowing occurring in a case of forming silver electrodes on glass substrate surface is inhibited. A glass substrate for flat panel display, which is formed by a float method, which has a composition consisting essentially of, in terms of oxide amount in mass %: SiO2 50 to 72%, Al2O3 0.15 to 15%, MgO + CaO + SrO + BaO 4 to 30%, Na2O more than 0% and at most 10%, K2O 1 to 21%, Li2O 0 to 1%, Na2O + K2O + Li2O 6 to 25%, ZrO2 0 to 10%, and Fe2O3 0.0725 to 0.15%; and wherein the average Fe2+ content in a surface layer of the glass substrate within a depth of 10 ?m from the top surface is at most 0.0725% in terms of Fe2O3 amount.

Abstract: To provide a process for producing a reliable substrate in good yield, by suppressing bleeding of boric acid from a green sheet comprising a powder of borosilicate glass to improve printability of a conductive pattern thereby to prevent disconnection. A process for producing a substrate which comprises firing a green sheet comprising a powder of borosilicate glass, wherein the powder is one prepared by holding borosilicate glass before pulverization, at a temperature higher by at least 30° C. than the glass transition temperature and lower by at most 50° C. than the softening point of the borosilicate glass for at least 3 hours in the atmosphere, followed by pulverization.