Abstract: A light absorption anisotropic layer which has a high S/N ratio for generating polarized light with respect to rays in an infrared wavelength region, is lightweight, and has excellent handleability, a laminate, and a sensor system including the light absorption anisotropic layer or the laminate. The light absorption anisotropic layer contains a dichroic coloring agent having a maximal absorption at a wavelength of 700 to 1500 nm, in which an average absorbance at a wavelength of 850 nm is 0.24 to 0.50 and a thickness is 5 ?m or less.

Abstract: A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14.

Abstract: An electric field sensor includes an electric field sensor head (13) for varying an intensity of a propagating light beam from a light source (19) in response to an electric field intensity of an input signal received by a reception antenna (11). A photo-electric converter (21) converts the propagating light beam into an output signal. A correcting device (27) compares the output signal with a reference signal to produce and supply a control signal to the photo-electric converter.

Abstract: A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14.