Abstract: A compressor (100) comprises a compressor body (10), a pipe (20) connected to the compressor body (10), and an acoustic cover disposed so as to surround the compressor body (10). The acoustic cover (30) has an insertion hole (31) through which the pipe (20) is inserted while being in close contact with the pipe (20), and an inner surface (30A) of the acoustic cover has a shape that traces an outer surface (10A) of the compressor body (10). Due to this configuration, it is possible to reduce the size and the weight of the acoustic cover (30), and by using the acoustic cover (30) with a simpler structure, it is possible to reduce the noise of the compressor (100) of this automobile air conditioning device.

Abstract: An image sensor element includes: a first pixel having a first photoelectric conversion part, a first accumulation part which accumulates electric charge generated by the first photoelectric conversion part, and a first output part based on a voltage of the first accumulation part; a second pixel having a second photoelectric conversion part, a second accumulation part wherein electric charge generated by the second photoelectric conversion part, and a second output part which a second signal based on a voltage of the second accumulation part; an output line to which the first and the second output parts are connected and from which the first and second signals are output; and a control unit which is able to control the voltage of the first accumulation part to be a first voltage and ability to control the voltage of the second accumulation part to be a second voltage different from the first voltage.

Abstract: A battery pack includes: a charging voltage detector for detecting charging voltage applied to a charging path; a charging first transistor disposed in series on the charging path for controlling charging current flowing through the charging path; a charging second transistor for controlling operation of the charging first transistor; and a controller for controlling operation of the charging first transistor and the charging second transistor. Based on the charging current detected by a charging current detector and the charging voltage detected by the charging voltage detector, the controller can adjust the charging current for charging the battery block, by controlling second ON resistance that is ON resistance of the charging second transistor in a linear region of the charging second transistor, and by controlling first ON resistance that is ON resistance of the charging first transistor in a linear region of the charging first transistor using the second ON resistance.

Abstract: A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.

Abstract: A battery pack includes: a charging voltage detector for detecting charging voltage applied to charging path; a charging first transistor disposed in series on the charging path for controlling charging current flowing through the charging path; a charging second transistor for controlling operation of the charging first transistor; and a controller for controlling operation of the charging first transistor and the charging second transistor. Based on the charging current detected by a charging current detector and the charging voltage detected by the charging voltage detector, the controller can adjust the charging current for charging the battery block, by controlling second ON resistance that is ON resistance of the charging second transistor in a linear region of the charging second transistor, and by controlling first ON resistance that is ON resistance of the charging first transistor in a linear region of the charging first transistor using the second ON resistance.

Abstract: A method for forming a resist pattern including forming a first contact hole pattern including a hole portion and a hole-unformed portion, which includes alkali developing the exposed positive-type resist film; preparing a structure including the first contact hole pattern and a first layer which covers the first contact hole pattern, which includes forming a first layer by applying a solution including an acid or a thermal acid generator onto a support on which the first contact hole pattern is formed; forming organic solvent-soluble and organic solvent-insoluble regions on the hole-unformed portion, which includes heating the structure; and forming a second contact hole pattern on the hole-unformed portion, which includes developing the heated structure with an organic solvent.

Abstract: The present invention relates to a vehicular control device including a plurality of ECUs connected to each other through an in-vehicle network. The vehicular control device includes a first control device that controls an electrical component and a second control device connected to the first control device through an in-vehicle network. In a case where an operation switch of the electrical component in the first control device is fixed in an on-state and an ignition key is off, data transmission from the first control device to the second control device is stopped, or the first control device is set to a reception-only mode, and thus the second control device is prevented from operating due to a wake-up function.

Abstract: A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.

Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, a quaternary carbon-atom-containing compound, and a solvent, the quaternary carbon-atom-containing compound having an aliphatic hydrocarbon group having 1 to 8 carbon atoms and a group having a specific structure having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Abstract: A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass: in which R1 to R4 each independently represent a linear or branched alkyl group, and the total number of carbon atoms contained in each of the alkyl groups represented by R1 to R4 is 4 to 15.

Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, a quaternary carbon-atom-containing compound, and a solvent, the quaternary carbon-atom-containing compound having an aliphatic hydrocarbon group having 1 to 8 carbon atoms and a group having a specific structure having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Abstract: The present invention relates to a vehicular control device including a plurality of ECUs connected to each other through an in-vehicle network. The vehicular control device includes a first control device that controls an electrical component and a second control device connected to the first control device through an in-vehicle network. In a case where an operation switch of the electrical component in the first control device is fixed in an on-state and an ignition key is off, data transmission from the first control device to the second control device is stopped, or the first control device is set to a reception-only mode, and thus the second control device is prevented from operating due to a wake-up function.

Abstract: A method for forming a resist pattern including forming a first contact hole pattern including a hole portion and a hole-unformed portion, which includes alkali developing the exposed positive-type resist film; preparing a structure including the first contact hole pattern and a first layer which covers the first contact hole pattern, which includes forming a first layer by applying a solution including an acid or a thermal acid generator onto a support on which the first contact hole pattern is formed; forming organic solvent-soluble and organic solvent-insoluble regions on the hole-unformed portion, which includes heating the structure; and forming a second contact hole pattern on the hole-unformed portion, which includes developing the heated structure with an organic solvent.

Abstract: To provide a resin-coated metal pipe which is excellent in corrosion resistance and impact resistance, wherein adhesion between a plating layer and a resin coating layer is good even without a primer layer, and whereby the number of steps at the time of production is small, and the environmental burden is low. A resin-coated metal pipe (10) comprises a metal pipe (12), a plating layer (14) formed by hot dipping plating on the outer peripheral surface of the metal pipe (12), and a resin coating layer (16) formed by melt molding on the surface of the plating layer (14), wherein the resin coating layer (16) is made of a resin material comprising a melt-moldable fluororesin (A) having at least one type of reactive functional group selected from the group consisting of a carbonyl group-containing group, a hydroxy group, an epoxy group and an isocyanate group.

Abstract: A method of forming a resist pattern, including: a step A in which a positive resist composition is applied to a substrate to form a positive resist film, the positive resist film is exposed and the positive resist film is subjected to an alkali development to form a first resist pattern; a step B in which a solution containing an acid or a thermoacid generator is applied to the substrate whereon the first resist pattern is formed, so as to cover the first resist pattern, to form a structure having the first resist pattern and a first layer covering the first resist pattern; a step C in which the structure is heated and the solubility of the first resist pattern in an organic solvent is changed under action of the acid or under action of acid generated from the thermoacid generator; and a step D in which the structure after heating is developed with the organic solvent to remove a region of the first resist pattern other than the region of the first resist pattern where the solubility in the organic solvent i

Abstract: A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass: in which R1 to R4 each independently represent a linear or branched alkyl group, and the total number of carbon atoms contained in each of the alkyl groups represented by R1 to R4 is 4 to 15.

Abstract: A method of trimming a resist pattern, including forming a positive resist film on a substrate, the positive resist film is exposed and the positive resist film is subjected to an alkali development to form a first resist pattern having an alkali-insoluble region on the surface thereof; applying a resist trimming composition including an acid to the substrate on which the first resist pattern is formed; a heating the first resist pattern coated with the resist trimming composition, and the solubility of the first resist pattern in a developing solution is changed under action of the acid included in the resist trimming composition; and developing the first resist pattern after heating with an organic solvent to remove the alkali-insoluble region of the first resist pattern, the resist trimming composition including the acid and a solvent which does not dissolve the first resist pattern.

Abstract: A method of trimming a resist pattern, including forming a positive resist film on a substrate, the positive resist film is exposed and the positive resist film is subjected to an alkali development to form a first resist pattern having an alkali-insoluble region on the surface thereof; applying a resist trimming composition including an acid to the substrate on which the first resist pattern is formed; a heating the first resist pattern coated with the resist trimming composition, and the solubility of the first resist pattern in a developing solution is changed under action of the acid included in the resist trimming composition; and developing the first resist pattern after heating with an organic solvent to remove the alkali-insoluble region of the first resist pattern, the resist trimming composition including the acid and a solvent which does not dissolve the first resist pattern.