Abstract: A hydrogen production system that achieves highly-efficient hydrogen production even when hydrogen is produced by using the plurality of cell stacks is provided. A hydrogen production system includes a plurality of cell stacks provided within a reaction containment, the cell stacks generating hydrogen by high temperature steam electrolysis by supplying steam to the plurality of cell stacks, a first flow path guiding the steam to each of the cell stacks, a second flow path causing a carrier gas containing air as a main component to flow into the reaction containment, and a flow regulation device provided at an inlet of the steam in each of the cell stacks, the flow regulation device regulating a flow rate of the steam caused to flow into each of the cell stacks to be uniform.

Abstract: A hydrogen production system that achieves highly-efficient hydrogen production even when hydrogen is produced by using the plurality of cell stacks is provided. A hydrogen production system includes a plurality of cell stacks provided within a reaction containment, the cell stacks generating hydrogen by high temperature steam electrolysis by supplying steam to the plurality of cell stacks, a first flow path guiding the steam to each of the cell stacks, a second flow path causing a carrier gas containing air as a main component to flow into the reaction containment, and a flow regulation device provided at an inlet of the steam in each of the cell stacks, the flow regulation device regulating a flow rate of the steam caused to flow into each of the cell stacks to be uniform.

Abstract: The surface to be sputtered of a sputtering target is blasted with a blasting material in the form of a finely divided powder having particle diameters falling within the range of 10 to 500 .mu.m to remove impurities staining the surface to be sputtered. This blasting treatment is suitable especially for a sputtering surface having a raised portion thereon. Preferably the blasting treatment is effected in two stages: in the first stage, a blasting material powder with particle diameters of 50 to 500 .mu.m is used and, in the second stage, a blasting material powder with particle diameters of 10 to 110 .mu.m is used. The blast-treated surface has a uniform, isotropic and reduced surface roughness.

Abstract: An ITO sintered body according to the present invention has a density thereof of between 90 and 100% and a sintering particle size of between 1 and 20 .mu.m. A proportion of (In.sub.0.6 Sn.sub.0.4).sub.2 O.sub.3 in the ITO sintered body is 10% or below. Such an ITO sintered body is manufactured by mixing an indium oxide powder, whose BET surface area is between 15 and 30 m.sup.2 /g, a BET size/a crystallite size is 2 or below, and an average primary particle size is between 0.03 and 0.1 .mu.m, with tin oxide whose BET surface area is 3 m.sup.2 /g or below, and then by sintering the mixture.

Abstract: First chucks feed material sheets of glass to a heating device and a drawing device. Third chucks hold the first material sheet of glass after it is lowered and the first chucks then release the first material sheet of glass. The first chucks then return to pick up the second material sheet of glass and are then lowered to catch up with the first material sheet of glass. Both material sheets of glass are then heated, softened, fused and bonded. After fusing and bonding, the feed of the second material sheet of glass is continued by the first chucks, which are replaced by the third chucks on the way. Thereafter the same action is repeated for subsequent material sheets of glass, and thin sheet glass is continuously manufactured from the material sheets of glass by a redrawing process.