Patents by Inventor Ryoko Zhang

Ryoko Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR DEPOSITION OF SILICON NITRIDE LAYER USING PRETREATMENT, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR PERFORMING THE METHOD
    Publication number: 20210225643
    Abstract: Methods and systems for pretreating a surface prior to depositing silicon nitride on the surface are disclosed. Exemplary methods include pretreating the surface by exposing the surface to activated species formed from one or more gases comprising nitrogen and hydrogen. The step of pretreating can additionally include a step of exposing the surface to a gas comprising silicon.
    Type: Application
    Filed: January 19, 2021
    Publication date: July 22, 2021
    Inventors: Aurélie Kuroda, Ryoko Zhang, Masaki Tokunaga, Ling-Chi Hwang, Makoto Igarashi