Abstract: A planar light source includes a light guide member including light-emitting units separated by a groove and one or more light sources disposed in one or more of the light-emitting units. The light-emitting units include outer portions and at least one inner portion located in a region surrounded by the outer portions in a plan view. In the plan view, at least one of the outer portions is adjacent to a smaller number of light-emitting units than a number of light-emitting units to which one of the at least one inner portion is adjacent. In a state in which the same power is supplied and one of the outer portions and one of the at least one inner portion are allowed to individually emit light, brightness of the one of the outer portions is higher than brightness of the one of the at least one inner portion.

Abstract: A solid-state imaging device includes: photoelectric conversion units disposed in the form of matrix in an imaging region and a peripheral region around the imaging region; transfer electrodes provided on a side of the photoelectric conversion units arranged in the vertical direction of the matrix; and first-layer wirings and second-layer wirings in a multi-layer wiring structure disposed to connect the transfer electrodes in the horizontal direction of the matrix, wherein the first-layer wirings and the second-layer wirings are provided as light-shielding patterns for covering the photoelectric conversion units in the peripheral region.

Abstract: A solid-state imaging device includes: photoelectric conversion units disposed in the form of matrix in an imaging region and a peripheral region around the imaging region; transfer electrodes provided on a side of the photoelectric conversion units arranged in the vertical direction of the matrix; and first-layer wirings and second-layer wirings in a multi-layer wiring structure disposed to connect the transfer electrodes in the horizontal direction of the matrix, wherein the first-layer wirings and the second-layer wirings are provided as light-shielding patterns for covering the photoelectric conversion units in the peripheral region.