Patents by Inventor Ryong HWANG
Ryong HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11974433Abstract: A semiconductor memory device includes a third insulating pattern and a first insulating pattern on a substrate, the third insulating pattern and the first insulating pattern being spaced apart from each other in a first direction that is perpendicular to the substrate such that a bottom surface of the third insulating pattern and a top surface of the first insulating pattern face each other, a gate electrode between the bottom surface of the third insulating pattern and the top surface of the first insulating pattern, and including a first side extending between the bottom surface of the third insulating pattern and the top surface of the first insulating pattern, and a second insulating pattern that protrudes from the first side of the gate electrode by a second width in a second direction, the second direction being different from the first direction.Type: GrantFiled: January 14, 2022Date of Patent: April 30, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Joo-Heon Kang, Tae Hun Kim, Jae Ryong Sim, Kwang Young Jung, Gi Yong Chung, Jee Hoon Han, Doo Hee Hwang
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Publication number: 20230411203Abstract: In accordance with an exemplary embodiment of the present invention, provided is an apparatus for processing substrate, the apparatus comprising: a chamber providing a process space formed therein; a susceptor on which a substrate is placed, the susceptor being installed in the process space; a gas supply port formed in the central portion of the ceiling of the chamber to supply a source gas to the process space; an exhaust port formed on a side wall of the chamber to be positioned outside and below the susceptor, the exhaust port exhausting a gas in the process space in the direction from a center of the susceptor toward an edge of the susceptor; and an antenna positioned above the susceptor and installed outside the chamber to generate plasma from the source gas, an upper surface of the susceptor comprises a seating surface on which the substrate is placed during the process and a control surface which is located on the periphery of the seating surface and faces the process space to be exposed to the plasmaType: ApplicationFiled: August 28, 2023Publication date: December 21, 2023Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Ryong HWANG, Se Jong SUNG, Woong Joo JANG, Yang Sik SHIN, Woo Duck JUNG
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Publication number: 20230245867Abstract: According to an embodiment of the present invention, an apparatus for processing substrate comprising: a susceptor; and a cover unit installed on an upper part of the susceptor, the substrate is placed on the cover unit, wherein the cover unit comprises: a cover frame having one or more air gaps; and one or more covers having a shape corresponding to each of the air gaps and mountable in each of the air gaps, wherein a depth of the air gap is at least three times the thickness of the substrate.Type: ApplicationFiled: January 27, 2023Publication date: August 3, 2023Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Woo Duck JUNG, Jeong Hee JO, Ryong HWANG, Se Jong SUNG, Woong Joo JANG, Sang Soon JUNG
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Publication number: 20220093445Abstract: In accordance with an exemplary embodiment of the present invention, provided is an apparatus for processing substrate, the apparatus comprising: a chamber providing a process space formed therein; a susceptor on which a substrate is placed, the susceptor being installed in the process space; a gas supply port formed in the central portion of the ceiling of the chamber to supply a source gas to the process space; an exhaust port formed on a side wall of the chamber to be positioned outside and below the susceptor, the exhaust port exhausting a gas in the process space in the direction from a center of the susceptor toward an edge of the susceptor; and an antenna positioned above the susceptor and installed outside the chamber to generate plasma from the source gas, an upper surface of the susceptor comprises a seating surface on which the substrate is placed during the process and a control surface which is located on the periphery of the seating surface and faces the process space to be exposed to the plasmaType: ApplicationFiled: January 20, 2020Publication date: March 24, 2022Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Ryong HWANG, Se Jong SUNG, Woong Joo JANG, Yang Sik SHIN, Woo Duck JUNG
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Publication number: 20200113500Abstract: The present invention relates to a menstrual cup having a blood test cartridge. A menstrual cup according to one embodiment of the present invention comprises a body part having an opening formed at one side of the body part, a storage part configured to receive menstrual blood therein, and a cartridge receiving part connected to the storage part at a side opposite the opening, and a cartridge for blood test removably mounted in the cartridge receiving part.Type: ApplicationFiled: March 21, 2018Publication date: April 16, 2020Applicant: LOON LAB INC.Inventor: Ryong HWANG
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Publication number: 20200060865Abstract: The present invention relates to an easily inserted menstrual cup. The menstrual cup according to an embodiment of the present invention includes: a main body having an opening formed at one side and a storage part for accommodating menstrual blood therein formed at an inner side; a rim formed at the opening of the main body and configured to prevent leakage of the menstrual blood by closely contacting with the wall of the vagina when the menstrual cup is inserted into the vagina; and a frame formed inside a wall of the main body, wherein the frame is formed of a shape memory material.Type: ApplicationFiled: November 4, 2019Publication date: February 27, 2020Applicant: LOON LAB INC.Inventor: Ryong HWANG
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Publication number: 20200046572Abstract: Provided herein is an easily removed menstrual cup which includes a main body in which an opening is formed at one side, a storage configured to accommodate menstrual blood therein is formed, and an air inlet is formed at an upper end; an air flow path formed between an outer wall and an inner wall of the main body and configured to connect the air inlet to the outside of the main body; and an air inflow controller installed on the air flow path and configured to control an inflow of external air into the air inlet through the air flow path.Type: ApplicationFiled: October 17, 2019Publication date: February 13, 2020Applicant: LOON LAB INC.Inventor: Ryong HWANG
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Publication number: 20180199874Abstract: An embodiment of the present invention provides a smart menstrual cup comprising: a storage unit, a side of which is open so as to receive menstrual blood in at least one inner space thereof; a measuring unit for measuring menstrual blood received in the storage unit; and a control unit for generating a signal on the basis of measurement information from the measuring unit or processing information obtained on the basis of the measurement information.Type: ApplicationFiled: July 13, 2016Publication date: July 19, 2018Inventor: Ryong HWANG
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Patent number: 9346195Abstract: A method of manufacturing a flexible substrate includes providing a support, forming an auxiliary layer including a silicon-containing material and a gold (Au) particle on the support, forming a polymer thin film on the auxiliary layer, and removing the support after forming the polymer thin film.Type: GrantFiled: April 8, 2014Date of Patent: May 24, 2016Assignee: SAMSUNG DISPLAY CO., LTD.Inventor: Che Ryong Hwang
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Publication number: 20150024220Abstract: A method of manufacturing a flexible substrate includes providing a support, forming an auxiliary layer including a silicon-containing material and a gold (Au) particle on the support, forming a polymer thin film on the auxiliary layer, and removing the support after forming the polymer thin film.Type: ApplicationFiled: April 8, 2014Publication date: January 22, 2015Applicant: SAMSUNG DISPLAY CO., LTD.Inventor: Che Ryong HWANG
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Publication number: 20140061338Abstract: A solar cell manufacturing method includes forming a first electrode on a substrate, forming a mixed metal layer on the first electrode, forming a light absorbing layer by injecting hydrogen selenide on the entire surface of the mixed metal layer using a gas injection device, and forming a second electrode on the light absorbing layer. Further, the gas injection device includes a gas pipeline, an inner gas pipe positioned in the gas pipeline and having an opening, and a plurality of injection nozzles disposed below the gas pipeline.Type: ApplicationFiled: November 11, 2013Publication date: March 6, 2014Applicants: Samsung Display Co., Ltd., Samsung SDI Co., Ltd.Inventors: Seoung-Jin Seo, Jung-Gyu Nam, Sang-Cheol Park, Woo-Su Lee, Seong-Ryong Hwang, In-Ki Kim
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Publication number: 20140001951Abstract: A flexible display apparatus and a method of manufacturing the same are disclosed. The flexible display apparatus includes a substrate; a light-emitting display unit formed on a first surface of the substrate; an encapsulation layer formed on the light-emitting display unit; and a conductive layer formed on a second surface of the substrate, the second surface of the substrate being opposite to the first surface of the substrate, wherein the conductive layer includes a conductor, and the conductor includes at least one selected from a carbon nanotube (CNT), fullerene, and a nanowire. Changes in characteristics of the light-emitting display unit due to static electricity are prevented in this configuration.Type: ApplicationFiled: November 29, 2012Publication date: January 2, 2014Inventors: Che-Ryong Hwang, Jae-Wook Kang, Moo-Jin Kim, In-Cheol Ko, Jun-Hyuk Cheon
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Patent number: 8586401Abstract: A solar cell manufacturing method includes forming a first electrode on a substrate, forming a mixed metal layer on the first electrode, forming a light absorbing layer by injecting hydrogen selenide on the entire surface of the mixed metal layer using a gas injection device, and forming a second electrode on the light absorbing layer. Further, the gas injection device includes a gas pipeline, an inner gas pipe positioned in the gas pipeline and having an opening, and a plurality of injection nozzles disposed below the gas pipeline.Type: GrantFiled: October 12, 2011Date of Patent: November 19, 2013Assignees: Samsung SDI Co., Ltd., Samsung Display Co., Ltd.Inventors: Seoung-Jin Seo, Jung-Gyu Nam, Sang-Cheol Park, Woo-Su Lee, Seong-Ryong Hwang, In-Ki Kim
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Patent number: 8563846Abstract: A thin film type solar cell and a method for manufacturing the same is disclosed, the thin film type solar cell comprising a substrate; a plurality of front electrodes on the substrate at fixed intervals by each first separating part interposed in-between; a plurality of semiconductor layers on the front electrodes at fixed intervals by each contact part interposed in-between; and a plurality of rear electrodes connected with the front electrodes through the contact part, provided at fixed intervals by each second separating part interposed in-between, wherein a main isolating part is formed in the outermost front electrode, the outermost semiconductor layer, and the outermost rear electrode, wherein an auxiliary isolating part is formed in at least one of the outermost front electrode and the outermost rear electrode, wherein the auxiliary isolating part is positioned on the inside of the main isolating part.Type: GrantFiled: December 29, 2008Date of Patent: October 22, 2013Assignee: Jusung Engineering Co., Ltd.Inventors: Won Seok Park, Yong Woo Shin, Seong Ryong Hwang
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Patent number: 8476108Abstract: A method and apparatus for manufacturing a semiconductor device is disclosed, which is capable of realizing an extension of a cleaning cycle for a processing chamber, the method comprising preheating a substrate; placing the preheated substrate onto a substrate-supporting unit provided in a susceptor while the preheated substrate is maintained at a predetermined height from an upper surface of the susceptor provided in a processing chamber; and forming a thin film on the preheated substrate, wherein a temperature of the preheated substrate is higher than a processing temperature for forming the thin film in the processing chamber.Type: GrantFiled: January 4, 2012Date of Patent: July 2, 2013Assignee: Jusung Engineering Co., LtdInventors: Sang Ki Park, Seong Ryong Hwang, Geun Tae Cho
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Patent number: 8398769Abstract: A chemical vapor deposition apparatus is disclosed, which is capable of improving the yield by an extension of a cleaning cycle, the chemical vapor deposition apparatus comprising a chamber with a substrate-supporting member for supporting a substrate; a chamber lid with plural first source supplying holes, the chamber lid installed over the chamber; plural source supplying pipes for supplying a process source to the plural first source supplying holes; a spraying-pipe supporting member with plural second source supplying holes corresponding to the plural first source supplying holes, the spraying-pipe supporting member detachably installed in the chamber lid; and plural source spraying pipes with plural third source supplying holes and plural source spraying holes, the plural source spraying pipes supported by the spraying-pipe supporting member, wherein the plural third source supplying holes are supplied with the process source through the plural second source supplying holes, and the plural source sprayinType: GrantFiled: May 27, 2010Date of Patent: March 19, 2013Assignee: Jusung Engineering Co., Ltd.Inventors: Sang Ki Park, Jung Min Ha, Seong Ryong Hwang
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Patent number: 8198609Abstract: The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.Type: GrantFiled: July 23, 2008Date of Patent: June 12, 2012Assignee: Samsung LED Co., LtdInventors: Moo Youn Park, Jin Ha Kim, Soo Ryong Hwang, Il Hyung Jung, Jong Ho Lee
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Publication number: 20120100710Abstract: A method and apparatus for manufacturing a semiconductor device is disclosed, which is capable of realizing an extension of a cleaning cycle for a processing chamber, the method comprising preheating a substrate; placing the preheated substrate onto a substrate-supporting unit provided in a susceptor while the preheated substrate is maintained at a predetermined height from an upper surface of the susceptor provided in a processing chamber; and forming a thin film on the preheated substrate, wherein a temperature of the preheated substrate is higher than a processing temperature for forming the thin film in the processing chamber.Type: ApplicationFiled: January 4, 2012Publication date: April 26, 2012Applicant: JUSUNG ENGINEERING CO., LTD.Inventors: Sang Ki PARK, Seong Ryong HWANG, Geun Tae CHO
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Publication number: 20120094424Abstract: A solar cell manufacturing method includes forming a first electrode on a substrate, forming a mixed metal layer on the first electrode, forming a light absorbing layer by injecting hydrogen selenide on the entire surface of the mixed metal layer using a gas injection device, and forming a second electrode on the light absorbing layer. Further, the gas injection device includes a gas pipeline, an inner gas pipe positioned in the gas pipeline and having an opening, and a plurality of injection nozzles disposed below the gas pipeline.Type: ApplicationFiled: October 12, 2011Publication date: April 19, 2012Applicants: SAMSUNG SDI CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Seoung-Jin SEO, Jung-Gyu NAM, Sang-Cheol PARK, Woo-Su LEE, Seong-Ryong HWANG, In-Ki KIM
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Patent number: 8110435Abstract: A method and apparatus for manufacturing a semiconductor device is disclosed, which is capable of realizing an extension of a cleaning cycle for a processing chamber, the method comprising preheating a substrate; placing the preheated substrate onto a substrate-supporting unit provided in a susceptor while the preheated substrate is maintained at a predetermined height from an upper surface of the susceptor provided in a processing chamber; and forming a thin film on the preheated substrate, wherein a temperature of the preheated substrate is higher than a processing temperature for forming the thin film in the processing chamber.Type: GrantFiled: December 10, 2009Date of Patent: February 7, 2012Assignee: Jusung Engineering Co., Ltd.Inventors: Sang Ki Park, Seong Ryong Hwang, Geun Tae Cho