Abstract: A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restrict a formation of a through hole due to corrosion. The film can be restricted from being damaged at a delivery or assembling time, because the film formation step is provided after the assembly step. An occurrence of clogging can be restricted at a minute portion inside of the heat exchanger in the film formation step, because the film is formed using the chemical vapor deposition method.

Abstract: A coating structure includes a base made of metal, a foundation layer provided on the base, and an insulation film provided on the foundation layer. The insulation film includes a plurality of layers, each layer of the plurality of layers being different in material, the plurality of layers being layered alternately with each other. The foundation layer is provided by a method other than a coating method using a surface chemical reaction occurring on the base, and a part of the foundation layer in contact with the base is amorphous. According to this, when a foreign material adheres on the base, the foreign material can be covered by the foundation layer. Since the insulation film is provided on the foundation layer, forming defects of the insulation film caused by the foreign material can be limited.

Abstract: A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restrict a formation of a through hole due to corrosion. The film can be restricted from being damaged at a delivery or assembling time, because the film formation step is provided after the assembly step. An occurrence of clogging can be restricted at a minute portion inside of the heat exchanger in the film formation step, because the film is formed using the chemical vapor deposition method.

Abstract: A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N-1) timing generating circuits which are connected between the oscillator and at least (N-1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.

Abstract: A color organic EL display includes: a substrate; a color filter layer disposed on the substrate; a gas barrier layer disposed on the color filter layer; and an organic EL structural body disposed on the gas barrier layer. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The underlayer is a degassed underlayer. The gas barrier layer is provided by an atomic layer deposition method at a temperature equal to or lower than a decomposition starting temperature of the color filter layer.

Abstract: A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N?1) timing generating circuits which are connected between the oscillator and at least (N?1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.

Abstract: An organic EL display includes an organic material, a gas barrier layer on the member, and an organic EL unit on the gas barrier layer. The gas barrier layer comprises AlxTiyOz, wherein Al represents aluminum, Ti represents titanium, O represents oxygen, x represents the ratio of atoms of Al, y represents the ratio of atoms of Ti, and z represents the ratio of atoms of O. A Ti-atom ratio of the gas barrier layer is given in the units of atom % and defined by the following equation: Ti-atom ratio={y/(x+y)}·100. The gas barrier layer has a first portion at an interface with the member and a second portion at an interface with the organic EL unit. The Ti-atom ratio of the first portion is 0 atom %. The Ti-atom ratio of the second portion is greater than or equal to 10 atom %.

Abstract: A method of formation of a thermal spray coating which forms a thermal spray coating on a coating-forming surface, characterized by comprising a thermal spraying step of thermally spraying feedstock powder on the coating-forming surface and a deposition and coating forming step of having the thermally sprayed feedstock powder deposit on the coating-forming surface and solidify to form a coating, in the deposition and coating forming step, when deposited on the coating-forming surface by thermal spraying, the feedstock powder deposits in the solid phase state in 50 to 90%, preferably 70 to 80%, of the whole so as to raise the ratio of the crystallite remaining in the feedstock powder and secure a high heat conductivity.

Abstract: The TMR device has a structure including a lower electrode layer, a pinned layer, a tunnel barrier layer, a free layer, and an upper electrode layer which are successively formed on a substrate. The tunnel barrier layer has substantially a stoichiometric composition. The tunnel barrier layer may be a thin film of an oxide of AL formed by ALD method.

Abstract: A color organic EL display includes: a substrate; a color filter layer disposed on the substrate; a gas barrier layer disposed on the color filter layer; and an organic EL structural body disposed on the gas barrier layer. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The underlayer is a degassed underlayer. The gas barrier layer is provided by an atomic layer deposition method at a temperature equal to or lower than a decomposition starting temperature of the color filter layer.

Abstract: An ultrasonic sensor for detecting an object includes a sending element for sending an ultrasonic wave to the object, a receiving portion for receiving the wave reflected by the object, a first transmitting portion for transmitting a vibration of the wave received by the receiving portion, a second transmitting portion and an oscillating portion which is oscillated by the vibration. The receiving portion is exposed to a space where the object exists. The second transmitting portion is coupled between the first transmitting portion and the oscillating portion so as to transmit the vibration from the first transmitting portion to the oscillating portion.

Abstract: An organic EL display includes an organic material, a gas barrier layer on the member, and an organic EL unit on the gas barrier layer. The gas barrier layer comprises AlxTiyOz, wherein Al represents aluminum, Ti represents titanium, O represents oxygen, x represents the ratio of atoms of Al, y represents the ratio of atoms of Ti, and z represents the ratio of atoms of O. A Ti-atom ratio of the gas barrier layer is given in the units of atom % and defined by the following equation: Ti-atom ratio={y/(x+y)}·100. The gas barrier layer has a first portion at an interface with the member and a second portion at an interface with the organic EL unit. The Ti-atom ratio of the first portion is 0 atom %. The Ti-atom ratio of the second portion is greater than or equal to 10 atom %.

Abstract: An ultrasonic sensor includes a sending element for sending an ultrasonic wave to an object to be detected, a receiving portion for receiving the ultrasonic wave reflected by the object, an oscillating portion that oscillates by the ultrasonic wave transmitted thereto, and a supporting portion for holding an end part of the oscillating portion. The receiving portion is exposed to a space where the object exists. The receiving portion and the oscillating portion are connected through the supporting portion such that the ultrasonic wave received by the receiving portion is transmitted to the oscillating portion through the supporting portion. The oscillating portion is separate from the receiving portion by the supporting portion.

Abstract: An ultrasonic wave generating device includes a substrate, a heat insulation layer on the substrate, a membrane heating portion on the heat insulation layer, and a membrane oscillator on the heating portion. The heating portion is electrically driven with a predetermined period, and produces heat for thermally displacing a surface of the oscillator. The oscillator receives a temperature variation with the predetermined period from the heating portion, and oscillates so as to generate ultrasonic waves.

Abstract: An ultrasonic wave generating device includes a substrate, a heat insulation layer on the substrate, a membrane heating portion on the heat insulation layer, and a membrane oscillator on the heating portion. The heating portion is electrically driven with a predetermined period, and produces heat for thermally displacing a surface of the oscillator. The oscillator receives a temperature variation with the predetermined period from the heating portion, and oscillates so as to generate ultrasonic waves.

Abstract: An ultrasonic sensor for detecting an object includes a sending element for sending an ultrasonic wave to the object, a receiving portion for receiving the wave reflected by the object, a first transmitting portion for transmitting a vibration of the wave received by the receiving portion, a second transmitting portion and an oscillating portion which is oscillated by the vibration. The receiving portion is exposed to a space where the object exists. The second transmitting portion is coupled between the first transmitting portion and the oscillating portion so as to transmit the vibration from the first transmitting portion to the oscillating portion.

Abstract: An ultrasonic sensor includes a sending element for sending an ultrasonic wave to an object to be detected, a receiving portion for receiving the ultrasonic wave reflected by the object, an oscillating portion that oscillates by the ultrasonic wave transmitted thereto, and a supporting portion for holding an end part of the oscillating portion. The receiving portion is exposed to a space where the object exists. The receiving portion and the oscillating portion are connected through the supporting portion such that the ultrasonic wave received by the receiving portion is transmitted to the oscillating portion through the supporting portion. The oscillating portion is separate from the receiving portion by the supporting portion.

Abstract: A color organic EL display includes: a substrate; a color filter layer disposed on the substrate; a gas barrier layer disposed on the color filter layer; and an organic EL structural body disposed on the gas barrier layer. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The underlayer is a degassed underlayer. The gas barrier layer is provided by an atomic layer deposition method at a temperature equal to or lower than a decomposition starting temperature of the color filter layer.

Abstract: The TMR device has a structure including a lower electrode layer, a pinned layer, a tunnel barrier layer, a free layer, and an upper electrode layer which are successively formed on a substrate. The tunnel barrier layer has substantially a stoichiometric composition. The tunnel barrier layer may be a thin film of an oxide of AL formed by ALD method.

Abstract: An organic EL device has a structure in which an anode, a hole transporting layer, an organic luminescent layer, and a cathode are disposed on a glass substrate in this order. The organic EL device further has a protective layer covering an outer surface of the structure to protect it from an external environment. The protective layer is formed by an ALE method at a temperature lower than glass transition temperatures materials constituting the hole transporting layer and the organic luminescent layer.