Abstract: An imprint method of forming a patterned composition on a shot region of a substrate by using a mold having a concave-convex pattern includes filling a concave portion of the concave-convex pattern of the mold with a first composition by bringing the mold into contact with the first composition on a predetermined region and then separating the mold from the predetermined region in a state in which the first composition on the predetermined region is uncured. The mold having undergone the filling is brought into contact with a second composition on the shot region, thereby integrating the first composition filling the concave portion of the concave-convex pattern of the mold with the second composition on the shot region to form an integrated composition. The integrated composition is cured to form the patterned composition and separated from the mold.

Abstract: An imprint device that forms a pattern on a shot region of a substrate by using a mold is provided. The imprint device includes an irradiator configured to at least partially irradiate a pattern region of the mold with light, and a controller. The controller is configured to determine a partial region of the pattern region including a boundary between a first region including one or more recessed portions having a depth exceeding a predetermined value and a second region that is adjacent to the first region and does not include a recessed portion having a depth exceeding the predetermined value, based on unevenness information of the pattern region, and set a light irradiation amount to the partial region by the irradiator to be larger than a region other than the partial region.

Abstract: In order to realize an imprint method capable of reducing a drawback caused by protrusion of an imprint material, the imprint method includes a first pattern forming process of bringing a mold into contact with an imprint material on a first pattern forming region on a substrate; a first exposure process of exposing an imprint material on the first pattern forming region and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller; a second pattern forming process of bringing the mold into contact with an imprint material on a second pattern forming region after the first pattern forming process to form a pattern; and a second exposure process of exposing the imprint material on the second pattern forming region and the imprint material on the partial region of the first pattern forming region.

Abstract: A pattern formation method includes: forming a first inversion layer on a projecting and recessed pattern of a curable composition; forming a flattened inversion layer as a second inversion layer on the first inversion layer; performing first etching of etching an upper layer portion of an inversion layer including the first inversion layer and the flattened inversion layer to expose a top surface of a projecting portion of the projecting and recessed pattern; and performing second etching of etching the exposed pattern of the curable composition using the inversion layer remaining in a recessed portion of the projecting and recessed pattern as a mask, and in the first etching, the first inversion layer and the flattened inversion layer are etched using mixed gas obtained by a plurality of kinds of etching gas.

Abstract: The present invention provides an imprint method of forming a pattern of a composition on a shot region of a substrate by using a mold having a concave-convex pattern, the method comprising: filling a concave portion of the concave-convex pattern of the mold with a composition by bringing the mold into contact with a composition on a predetermined region and then separating the mold from the predetermined region in a state in which the composition on the predetermined region is uncured; bringing the mold having undergone the filling into contact with a composition on the shot region, thereby integrating the composition filling the concave portion of the concave-convex pattern of the mold with the composition on the shot region; curing an integrated composition obtained in the bringing; and separating the mold from the cured composition obtained in the curing.

Abstract: An imprint device that forms a pattern on a shot region of a substrate by using a mold is provided. The imprint device includes an irradiator configured to at least partially irradiate a pattern region of the mold with light, and a controller. The controller is configured to determine a partial region of the pattern region including a boundary between a first region including one or more recessed portions having a depth exceeding a predetermined value and a second region that is adjacent to the first region and does not include a recessed portion having a depth exceeding the predetermined value, based on unevenness information of the pattern region, and set a light irradiation amount to the partial region by the irradiator to be larger than a region other than the partial region.

Abstract: In order to realize an imprint method capable of reducing a drawback caused by protrusion of an imprint material, the imprint method includes a first pattern forming process of bringing a mold into contact with an imprint material on a first pattern forming region on a substrate; a first exposure process of exposing an imprint material on the first pattern forming region and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller; a second pattern forming process of bringing the mold into contact with an imprint material on a second pattern forming region after the first pattern forming process to form a pattern; and a second exposure process of exposing the imprint material on the second pattern forming region and the imprint material on the partial region of the first pattern forming region.

Abstract: An image forming apparatus includes a detection unit configured to obtain information with regard to the life of a secondary transfer member based on the variation in an electric resistance value of a secondary transfer portion, wherein the detection unit performs a process of reducing the effect of variation in the electric resistance value of an intermediate transfer member contained in the variation in the electric resistance value of the secondary transfer portion, based on a detection result of information with regard to the electric resistance value of the secondary transfer portion by a second detection unit, and on a detection result of information with regard to an electric resistance value of a primary transfer portion by a first detection unit, and obtains the information with regard to the life of the secondary transfer member.

Abstract: A posture corrective brace including a device for correcting asymmetry of the pelvis so as to surround the circumference of the pelvis, and/or a device for correcting asymmetry of the lower part of the thorax attached so as to surround the circumference of the lower part of the thorax, including: the innominate front compression part capable of abutting the abdominal part near the front side of the right or left innominate, and the innominate rear compression part capable of abutting the pelvis near the rear side of the right or left innominate; and/or the thorax front compression part capable of abutting the vicinity of the front side of the lower part of the right or left thorax, and the thorax rear compression part capable of abutting the vicinity of the rear side of the lower part of the right or left thorax.

Abstract: The image forming apparatus includes a detection unit configured to obtain information with regard to the life of a secondary transfer member based on the variation in the electric resistance value of a secondary transfer portion, wherein the detection unit performs a process of reducing the effect of variation in the electric resistance value of the intermediate transfer member contained in the variation in the electric resistance value of the secondary transfer portion, based on the detection result of information with regard to the electric resistance value of the secondary transfer portion by the second detection unit, and on the detection result of information with regard to the electric resistance value of a primary transfer portion by the first detection unit, and obtains the information with regard to the life of the secondary transfer member.

Abstract: A posture corrective brace including a device for correcting asymmetry of the pelvis so as to surround the circumference of the pelvis, and/or a device for correcting asymmetry of the lower part of the thorax attached so as to surround the circumference of the lower part of the thorax, including: the innominate front compression part capable of abutting the abdominal part near the front side of the right or left innominate, and the innominate rear compression part capable of abutting the pelvis near the rear side of the right or left innominate; and/or the thorax front compression part capable of abutting the vicinity of the front side of the lower part of the right or left thorax, and the thorax rear compression part capable of abutting the vicinity of the rear side of the lower part of the right or left thorax.