Patents by Inventor Ryosuke NIWA

Ryosuke NIWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11692893
    Abstract: A pressure sensor includes a base substrate, a first insulating layer at the base substrate, a stationary electrode at the first insulating layer, a side-wall portion around the stationary electrode at the first insulating layer, and a membrane having electrical conductivity, facing the stationary electrode across a space, and supported by the side-wall portion. The side-wall portion includes a shield electrode on the first insulating layer and a second insulating layer on the shield electrode. A distance between the stationary electrode and the membrane is less than a distance between the shield electrode and the membrane.
    Type: Grant
    Filed: August 11, 2021
    Date of Patent: July 4, 2023
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Ryosuke Niwa, Koichi Yoshida
  • Publication number: 20210372876
    Abstract: A pressure sensor includes a base substrate, a first insulating layer at the base substrate, a stationary electrode at the first insulating layer, a side-wall portion around the stationary electrode at the first insulating layer, and a membrane having electrical conductivity, facing the stationary electrode across a space, and supported by the side-wall portion. The side-wall portion includes a shield electrode on the first insulating layer and a second insulating layer on the shield electrode. A distance between the stationary electrode and the membrane is less than a distance between the shield electrode and the membrane.
    Type: Application
    Filed: August 11, 2021
    Publication date: December 2, 2021
    Inventors: Ryosuke NIWA, Koichi YOSHIDA
  • Publication number: 20210292928
    Abstract: According to one embodiment, a anodization apparatus includes: a first process tank used for an anodization process on a first portion of a substrate; a second process tank provided inside of the first process tank and used for the anodization process on a second portion of the substrate; a first electrolyte supply unit configured to supply a first electrolyte to the first process tank; a second electrolyte supply unit configured to supply a second electrolyte to the second process tank; a retainer configured to retain the substrate; a first electrode provided above the first process tank and/or the second process tank; and a second electrode provided below the first process tank and the second process tank.
    Type: Application
    Filed: September 11, 2020
    Publication date: September 23, 2021
    Applicant: KIOXIA CORPORATION
    Inventors: Ryosuke NIWA, Hisashi OOKUCHI