Patents by Inventor Ryosuke Tokutomi

Ryosuke Tokutomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemically amplified resist composition and process for forming resist pattern using same
    Patent number: 5506088
    Abstract: Improved chemically amplified resist is provided that comprises 100 parts by weight of a copolymer produced from a first monomer unit having a recurrent acid labile pendant group that changes the polarity of the polymer and a second monomer unit having an alkali-soluble group and 1 to 20 parts by weight of a photo acid generator.
    Type: Grant
    Filed: November 3, 1994
    Date of Patent: April 9, 1996
    Assignee: Fujitsu Limited
    Inventors: Koji Nozaki, Ryosuke Tokutomi, Yuko Kaimoto, Satoshi Takechi