Abstract: A soil improving agent containing (A) a lignocellulosic biomass with a lignin content of more than 60 mass % and 80 mass % or less.

Abstract: An exposure method for color filter substrate is provided. As shown in FIG. 7(a), exposure is performed while a substrate 20 to which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 (regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate 20. Next, as shown in (b), the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52 (regions indicated by hatching sloping upward to the right). Thus, dummy PSs 71 and dummy PSs 72 arranged with desired pitches and having desired shapes can be formed in the first non-display regions 51 and the second non-display regions 52, respectively.

Abstract: An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.

Abstract: A color filter having excellent display quality is provided by a continuous exposure method using a compact photomask. The color filter includes: a substrate; a black matrix formed on the substrate, for dividing the substrate into rectangular display regions in which the plurality of pixels are arrayed, and non-display regions surrounding the display regions; a stripe pattern; a plurality of columnar spacers disposed in the display regions; and a plurality of dummy columnar spacers. The stripe pattern includes a plurality of colored layers extending in one direction. Each colored layer intersects with a pair of sides of the display region in a direction perpendicular to the direction in which the colored layers extend. The thickness of both end portions of each colored layer disposed on the non-display region is not uniform. The dummy columnar spacers are disposed in portions of the non-display regions, where the colored layers are absent.

Abstract: A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 ?m or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 ?m or less.

Abstract: An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.

Abstract: A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 ?m to 1000 ?m from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 ?m or less from a side which is closest to the frame area extending in the Y-axis direction.

Abstract: A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposure mask used for producing the color filter are provided. A color filter 1 includes: a substrate 2; black matrixes 3 provided on the substrate 2; and a plurality of colored layers 4 which partially overlap the black matrixes 3 in at least a first direction. The widths of overlap portions 5 in which the black matrixes 3 and the colored layers 4 overlap each other in the first direction are varied over the entirety of a display area, and the degree of the variation is uniformly distributed over the entirety of the display area.

Abstract: An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.

Abstract: A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 ?m or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 ?m or less.

Abstract: An exposure method for color filter substrate is provided. As shown in FIG. 7(a), exposure is performed while a substrate 20 to which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 (regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate 20. Next, as shown in (b), the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52 (regions indicated by hatching sloping upward to the right). Thus, dummy PSs 71 and dummy PSs 72 arranged with desired pitches and having desired shapes can be formed in the first non-display regions 51 and the second non-display regions 52, respectively.

Abstract: A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposure mask used for producing the color filter are provided. A color filter 1 includes: a substrate 2; black matrixes 3 provided on the substrate 2; and a plurality of colored layers 4 which partially overlap the black matrixes 3 in at least a first direction. The widths of overlap portions 5 in which the black matrixes 3 and the colored layers 4 overlap each other in the first direction are varied over the entirety of a display area, and the degree of the variation is uniformly distributed over the entirety of the display area.

Abstract: A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 ?m to 1000 ?m from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 ?m or less from a side which is closest to the frame area extending in the Y-axis direction.

Abstract: A color filter having excellent display quality is provided by a continuous exposure method using a compact photomask. The color filter includes: a substrate; a black matrix formed on the substrate, for dividing the substrate into rectangular display regions in which the plurality of pixels are arrayed, and non-display regions surrounding the display regions; a stripe pattern; a plurality of columnar spacers disposed in the display regions; and a plurality of dummy columnar spacers. The stripe pattern includes a plurality of colored layers extending in one direction. Each colored layer intersects with a pair of sides of the display region in a direction perpendicular to the direction in which the colored layers extend. The thickness of both end portions of each colored layer disposed on the non-display region is not uniform. The dummy columnar spacers are disposed in portions of the non-display regions, where the colored layers are absent.

Abstract: An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.