Patents by Inventor Ryotaro Hanawa
Ryotaro Hanawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6383708Abstract: A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.Type: GrantFiled: December 2, 1993Date of Patent: May 7, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa
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Patent number: 5792585Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: March 25, 1994Date of Patent: August 11, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5783355Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: June 14, 1995Date of Patent: July 21, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5736292Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: June 14, 1995Date of Patent: April 7, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5714620Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: August 27, 1996Date of Patent: February 3, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5587492Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: April 18, 1995Date of Patent: December 24, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5436107Abstract: A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.Type: GrantFiled: March 18, 1992Date of Patent: July 25, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5362598Abstract: A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.Type: GrantFiled: October 6, 1993Date of Patent: November 8, 1994Assignee: Sumitomo Chemical Co., Ltd.Inventors: Naoki Takeyama, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa
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Patent number: 5354644Abstract: A photoresist composition which includes a sensitizing compound, a resin and, as a light absorber, a styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15.Type: GrantFiled: September 1, 1992Date of Patent: October 11, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Takeshi Hioki, Jun Tomioka
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Patent number: 5336583Abstract: A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.Type: GrantFiled: December 6, 1993Date of Patent: August 9, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa
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Patent number: 5283324Abstract: A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.Type: GrantFiled: April 17, 1992Date of Patent: February 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5218136Abstract: A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.Type: GrantFiled: December 27, 1988Date of Patent: June 8, 1993Assignee: Sumitomo Chemical Company, LimitedInventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka
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Patent number: 5198323Abstract: A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): ##STR1## wherein Z is an oxygen or sulfur atom or a group of the formula: >N--R.sub.4 in which R.sub.4 is a hydrogen atom or an alkyl group; R.sub.1, R.sub.2 and R.sub.3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: --OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: ##STR2## --COOR or --CONHR' in R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.Type: GrantFiled: April 30, 1991Date of Patent: March 30, 1993Assignee: Sumitomo Chemical Co., Ltd.Inventors: Teijiro Kitao, Masaru Matsuoka, Ryotaro Hanawa, Yasunori Uetani, Naoki Takeyama, Takeshi Hioki, Hiroshi Takagaki