Patents by Inventor Ryou Hashimoto

Ryou Hashimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist stripping composition and process for stripping resist
    Patent number: 6815150
    Abstract: The invention provides a photoresist stripping composition including (a) an alkanolamine other than those alkanolamines falling under the definition of the below-described component (b); (b) an alkanolamine having in the molecule thereof at least one moiety represented by the following formula (1): (wherein each of R1 and R2 represents hydrogen or a methyl group, and R4 represents a C1-C5 alkyl group); (c) an amide solvent or a sulfoxide solvent; (d) a phosphorus-containing compound; (e) an oxycarboxylic acid; and (f) water. The photoresist stripping composition of the present invention can easily remove photoresist film formed on an inorganic substrate, photoresist residues, and dust or similar matter generated during an etching process in the production of liquid crystal display elements or semiconductor elements, and is highly anticorrosive to various materials such as semiconductor layer materials, conductive materials, and insulating materials.
    Type: Grant
    Filed: December 10, 2002
    Date of Patent: November 9, 2004
    Assignees: Sharp Kabushiki Kaisha, Mitsubishi Gas Chemical Co., Inc.
    Inventors: Hijiri Nakahara, Yukihiko Takeuchi, Ryou Hashimoto, Taketo Maruyama, Hisaki Abe
  • Cleaning agent and cleaning process using the same
    Patent number: 6686322
    Abstract: A cleaning agent which comprises 0.1 to 60% by weight of an oxidizing agent and 0.0001 to 5% by weight of a chelating agent. In the process for producing semiconductor integrated circuits, a pattern layer of a photoresist used as an etching mask and residues formed from the photoresist by dry etching can be easily removed with the cleaning agent. In the process for producing substrates for liquid crystal display panels, residues derived from a conductive thin film formed by dry etching can also be easily removed. In the cleaning processes using the cleaning agent, wiring materials or insulating materials in thin film circuit devices or other materials used for producing substrates of semiconductor integrated circuits and liquid crystal panels are not corroded.
    Type: Grant
    Filed: August 28, 2000
    Date of Patent: February 3, 2004
    Assignees: Sharp Kabushiki Kaisha, Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masahiro Nohara, Ryou Hashimoto, Taimi Oketani, Hisaki Abe, Taketo Maruyama, Tetsuo Aoyama
  • Photoresist stripping composition and process for stripping resist
    Publication number: 20030152874
    Abstract: The invention provides a photoresist stripping composition including (a) an alkanolamine other than those alkanolamines falling under the definition of the below-described component (b); (b) an alkanolamine having in the molecule thereof at least one moiety represented by the following formula (1): 1
    Type: Application
    Filed: December 10, 2002
    Publication date: August 14, 2003
    Inventors: Hijiri Nakahara, Yukihiko Takeuchi, Ryou Hashimoto, Taketo Maruyama, Hisaki Abe