Abstract: A gas divided flow supplying apparatus, including a control valve 3, a pressure type flow control unit 1a connected to a process gas inlet 11, a gas supply main pipe 8 connected to the downstream side of control valve 3, a plurality of branched pipe passages 9a, 9n connected in parallel to the downstream side of main pipe 8, opening and closing valves 10a, 10n interposed in the respective branched pipe passages 9a, 9n, orifices 6a, 6n provided on the downstream sides of valves 10a, 10n, a temperature sensor 4 provided near the process gas passage between the control valve 3 and the orifices 6a, 6n, a pressure sensor 5 provided in the process gas passage between the control valve 3 and the orifices 6a, 6n, divided gas flow outlets 11a, 11n provided on the outlet sides of the orifices 6a, 6n, and an arithmetic and control unit 7.

Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.

Abstract: There is provided a leakage detection device which can be reduced in size and attached to a leakage detection target member, such as a fluid controller, all the time, and thus, can monitor leakage of fluid all the time, and a fluid controller having the same. A fluid controller is configured by a fluid controller main body and a leakage detection device which is attached to the fluid controller main body. In the fluid controller main body, a leakage port for detecting the leakage is provided. The leakage detection device includes a sensor holding body which is attached to the fluid controller main body; an ultrasonic sensor which is held by the sensor holding body to face the leakage port; an ultrasonic passage provided between a sensor surface of the ultrasonic sensor and the leakage port; and a processing circuit for processing an ultrasonic wave obtained by the ultrasonic sensor.

Abstract: To provide an opening degree detection device for an automatically operated valve which is easily assembled into an automatically operated valve, makes it easy to ensure detection accuracy at the time of assembling the opening degree detection device, and is easily applicable to an existing automatically operated valve. The opening degree detection device includes: a base plate 4 which is detachably mounted on an automatically operated valve 2; a displacement sensor 5; and a target 6 having an inclined detection surface 6a which is detected by the displacement sensor 5. The target 6 is fixed to the base plate 4. The displacement sensor 5 is supported on a valve stem 14 by way of a sensor support member 21, and the sensor support member 21 is supported on the base plate 4 by way of a guide means.

Abstract: In a variable orifice type pressure-controlled flow controller that includes a pressure control unit and a variable orifice unit, computes a flow rate of a fluid distributed through an orifice of the variable orifice unit as QP1=KP1 (P1 is an orifice upstream side pressure and K is a constant), and switches a flow control range and performs flow control in the flow control range by changing a set flow rate signal Qs for a flow rate arithmetic and control unit of the pressure control unit and an orifice opening degree setting signal Qz for an orifice opening degree arithmetic and control unit of the variable orifice unit, the variable orifice unit includes the orifice opening degree arithmetic and control unit.

Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.

Abstract: An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers.

Abstract: An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.

Abstract: A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit 7 works to successively open the respective branched pipe passage opening/closing valves 10a, 10n for a predetermined time and then close the valves, and the gas branched flow supplying apparatus performs flow control of the process gas distributed through the orifice 6 by the pressure type flow control unit 1a, and branches and supplies the process gas by opening and closing the branched pipe passage opening/closing valves 10a, 10n.

Abstract: A cam control valve includes a valve casing having a fluid passage and valve seat, a valve disc seated on the valve seat to open and close the fluid passage, a valve stem holding down the valve disc so it contacts the valve seat, a cam acting on the valve stem to hold it down, a motor rotating the cam, a motor holder holding the motor, a supporting frame fixed to the valve casing and supporting the motor holder so it moves vertically, an elastic member biasing the motor holder towards spacing from an upper side portion of the supporting frame, and height adjustable screws suspending the motor holder from the supporting frame, and adjusting a height of the motor holder with respect to the supporting frame, wherein the height adjustable screws are slidably inserted into the upper side portion of the supporting frame and screwed into the motor holder.

Abstract: A pressure type flow control system with flow monitoring includes an inlet, a control valve including a pressure flow control unit connected downstream of the inlet, a thermal flow sensor connected downstream of the control valve, an orifice installed on a fluid passage communicatively connected downstream of the thermal flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet communicatively connected to the orifice, and a control unit including a pressure type flow rate arithmetic and control unit receiving a pressure signal from the pressure sensor and a temperature signal from the temperature sensor, and a flow sensor control unit to which a flow rate signal from the thermal flow sensor is input.

Abstract: A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control.

Abstract: A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.

Abstract: A pressure type flow control system with flow monitoring includes an inlet side passage, a control valve comprising a pressure-type flow control unit connected downstream of the inlet side passage, a thermal-type flow sensor connected downstream of the control valve, an orifice installed on a fluid passage connected downstream of the thermal-type flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet side passage connected to the orifice, and a control unit comprising a pressure-type flow rate arithmetic and control unit to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, and which computes a flow rate value of fluid flowing through the orifice, and outputs a control signal to a valve drive unit of the control valve.

Abstract: The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P2 of the control pressure detector and a set value Pst for control pressure are input, wherein the controller supplies a control signal to a piezoelectric element driving unit of the pressure regulating valve using a proportional control system to perform valve opening regulation in which the proportional control system of the controller is set to control to bring about a residual deviation in control pressure by disabling an integral action.

Abstract: The purpose of the present invention is to provide an electrochemical element to which a high-concentration and high-viscosity electrolyte is supplied. The electrolyte is dispersed and supplied instantaneously to the electrochemical element in a small fixed quantity.

Abstract: A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

Abstract: A raw material vaporizing and supplying apparatus includes a carrier gas supply source, a source tank storing raw material, a flow passage supplying carrier gas to an internal upper space portion of the source tank, an automatic pressure regulating device installed on the flow passage, controlling pressure in the internal upper space portion to a set pressure, another flow passage supplying mixed gas (a mixture of raw material steam and carrier gas) from the internal upper space portion to a process chamber, a flow control system installed on this other flow passage, and automatically regulates a flow rate of the mixed gas supplied to the process chamber to a set flow rate, and a constant temperature heating unit that heats the source tank, a portion of the automatic pressure regulating device, a portion of the flow control system, the pipe passage, and the other pipe passage, to a set temperature.

Abstract: The water hammerless opening device comprises an actuator operating type valve installed on the fluid passage, an electro-pneumatic conversion device to supply the 2-step actuator operating pressure Pa to the afore-mentioned actuator operating type valve, a vibration sensor removably fixed to the pipe passage on the upstream side of the actuator operating type valve, and a tuning box to which the vibration detecting signal Pr detected by the vibration sensor is inputted, through which the control signal Sc to control the step operating pressure Ps? of the afore-mentioned 2-step actuator operating pressure Pa is outputted to the electro-pneumatic conversion device, and with which the 2-step actuator operating pressure Pa, of the step operating pressure Ps? which makes the vibration detecting signal Pr nearly zero, is outputted from the electro-pneumatic conversion by adjusting the control signal Sc.

Abstract: There is provided a solenoid valve that realizes space-saving by reducing the size of a dedicated driving power source. There is provided a solenoid valve capable of instantaneously opening and closing that includes an electric double layer capacitor having a low direct current internal resistance and a low equivalent series resistance as a motive power supply. The electric double layer capacitor has single-cell electrical properties including a capacitance of 1 to 5 F, a rated voltage of 21 to 2.7 V, a direct current internal resistance of 0.01 to 0.1?, and an equivalent series resistance at 1 KHz of 0.03 to 0.09?, and includes a polarizable electrode made of glassy carbon having a specific surface area of 1 to 500 m2/g.