Patents by Inventor Ryouta Mineo

Ryouta Mineo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alkali soluble polymer and positive working photosensitive resin composition using the same
    Patent number: 7670745
    Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: March 2, 2010
    Assignee: Chisso Corporation
    Inventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo
  • Alkali soluble polymer and positive working photosensitive resin composition using the same
    Publication number: 20080131813
    Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
    Type: Application
    Filed: November 2, 2007
    Publication date: June 5, 2008
    Inventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo