Patents by Inventor Ryozo Arata

Ryozo Arata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8154571
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Grant
    Filed: December 25, 2008
    Date of Patent: April 10, 2012
    Assignee: Adeka Corporation
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Publication number: 20100249466
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Application
    Filed: December 25, 2008
    Publication date: September 30, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Patent number: 4888371
    Abstract: Bis(2,6-di tert butyl-4-branched propyl or butyl phenyl)-pentaerythritol spiro phosphites are provided having the formula: ##STR1## wherein R is a branched propyl or butyl group, such as isopropyl, iso-butyl, or sec-butyl, as well as synthetic resin compositions having enhanced resistance to deterioration upon exposure to the heat and light comprising such as bis(2,6-di-t-butyl-4-branched propyl or butyl phenyl)pentaerythritol spiro phosphites.
    Type: Grant
    Filed: November 13, 1987
    Date of Patent: December 19, 1989
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Kenji Tajima, Tetsuo Tsuboi, Ryozo Arata
  • Patent number: 4698381
    Abstract: N,N',N"-tris((2,2,6,6-tetramethyl-4-piperidyl)triazinyl) undecane triamines are provided having the formula: ##STR1## wherein: X is selected from the group consisting of ##STR2## in which: R is selected from the group consisting of hydrogen; oxyl O'; alkyl having from one to about eighteen carbon atoms; hydroxyalkyl having from two to about eight carbon atoms; epoxyalkyl having from three to about eight carbon atoms; alkaryl having from seven to about twelve carbon atoms; and acyl having from one to about eight carbon atoms;Y is O or NR.sub.2 ;R.sub.1 is alkyl having from one to about six carbon atoms; andR.sub.2 is hydrogen or alkyl having from one to about eighteen carbon atoms;as well as stabilizer compositions and stabilized synthetic polymer compositions containing the same having improved resistance to deterioration upon exposure to light.
    Type: Grant
    Filed: September 19, 1985
    Date of Patent: October 6, 1987
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Yutaka Nakahara, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4673701
    Abstract: Alkylidene bisphenol phosphites and phosphates having 2,2,6,6-tetramethyl piperidinyl groups are provided having the formula: ##STR1## wherein: R.sub.1 is alkyl having from one to about twelve carbon atoms;R.sub.2, R.sub.3 and R.sub.4 are each selected from the group consisting of hydrogen and alkyl having from one to about twelve carbon atoms;m is 0 or 1;n is 0 or 1;X is selected from the group consisting of ##STR2## wherein: R.sub.5 is selected from the group consisting of hydrogen, oxyl O.sup.2, alkyl having from one to about twelve carbon atoms; arylalkyl having from seven to about eighteen carbon atoms; 2,3-epoxypropyl, acyl having from one to about eight carbon atoms and ##STR3## in which R.sub.6 is selected from the group consisting of hydrogen, alkyl having from one to about twelve carbon atoms and phenyl, and Y.sub.1 is selected from the group consisting of hydrogen; acyl having from one to about twelve carbon atoms; and ##STR4## Z.sub.1 is selected from the group consisting of ##STR5## wherein R.
    Type: Grant
    Filed: December 28, 1984
    Date of Patent: June 16, 1987
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Yutaka Nakahara, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4623685
    Abstract: Thermosetting synthetic resin lacquer compositions are provided having improved resistance to deterioration when exposed to ultraviolet light, comprising a 1-phenoxycarbonyl-2,2,6,6-tetramethylpiperidyl compound.
    Type: Grant
    Filed: March 21, 1985
    Date of Patent: November 18, 1986
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Yutaka Nakahara, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4525506
    Abstract: Polyhydric alcohol ethers of 2,2,6,6-tetramethyl-4-piperidone ketals are provided, having the formula: ##STR1## wherein: R is selected from the group consisting of hydrogen, alkyl having from one to about eight carbon atoms, and alkyleneoxyalkylene, each alkylene having from two to about eight carbon atoms;R.sub.1 is selected from the group consisting of hydrogen and alkyl having from one to about four carbon atoms;R.sub.2 is selected from the group consisting of hydrogen; oxyl O; alkyl, hydroxy alkyl and epoxyalkyl having from one to about eighteen carbon atoms; acyl having from one to about eighteen carbon atoms; cycloalkyl having from three to about eighteen carbon atoms; phenyl; phenalkyl and alkylphenyl having from seven to about twenty-four carbon atoms; andn is a number from 3 to 6as well as synthetic resin compositions having an improved resistance to deterioration and containing such compounds.
    Type: Grant
    Filed: March 25, 1983
    Date of Patent: June 25, 1985
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Naohiro Kubota, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4500663
    Abstract: N,N,N-tris(2,2,6,6-tetramethyl-4-piperidone ketal)-1,3,5-triazines are provided, having the formula: ##STR1## wherein: R.sub.1 is selected from the group consisting of hydrogen and alkyl having from one to about four carbon atoms; andR.sub.2 is selected from the group consisting of hydrogen; oxyl O; alkyl, hydroxy alkyl and epoxyalkyl having from one to about eighteen carbon atoms; alkanoyl having from one to about eighteen carbon atoms; cycloalkyl having from three to about eighteen carbon atoms; phenyl; phenalkyl and alkylphenyl having from seven to about twenty-four carbon atoms; as well as synthetic resin compositions having an improved resistance to deterioration and containing such compounds.
    Type: Grant
    Filed: March 25, 1983
    Date of Patent: February 19, 1985
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Naohiro Kubota, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4468488
    Abstract: Poly(piperidylamine) alkanes represented by the Formula (I) or (II): ##STR1## and synthetic resin compositions having improved resistance to deterioration by light containing such compounds.
    Type: Grant
    Filed: February 28, 1983
    Date of Patent: August 28, 1984
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Yutaka Nakahara, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4460725
    Abstract: Polyethers containing 2,2,6,6-tetramethyl piperidinyl carboxylic acid ester or ether groups are provided, comprising polymeric units having the structure ##STR1## wherein X is selected from the group consisting of: ##STR2## R.sub.1 is selected from the group consisting of hydrogen, --O, alkyl, hydroxy alkyl and epoxyalkyl having from one to about eighteen carbon atoms, acyl having from one to about eighteen carbon atoms, cycloalkyl having from three to about eighteen carbon atoms; phenyl; phenalkyl and alkylphenyl having from seven to about twenty-four carbon atoms;R.sub.2 is hydrogen or hydroxy;n.sub.1 is 0 or 1;R.sub.3 is lower alkyl having from one to about six carbon atoms; andn is the average number of such units in the polymer; as well as stabilized synthetic resin compositions comprising such polyethers.
    Type: Grant
    Filed: March 7, 1983
    Date of Patent: July 17, 1984
    Inventors: William E. Leistner, Motonobu Minagawa, Naohiro Kubota, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4415688
    Abstract: Poly(piperidylamine) alkanes represented by the Formula (I) or (II): ##STR1## R is selected from the group consisting of: --NH.sub.2 ; ##STR2## and synthetic resin compositions having improved resistance to deterioration by light containing such compounds.
    Type: Grant
    Filed: November 22, 1982
    Date of Patent: November 15, 1983
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Motonobu Minagawa, Yutaka Nakahara, Toshihiro Shibata, Ryozo Arata
  • Patent number: 4404301
    Abstract: Polymeric light stabilizers are provided having at least one 2,2,6,6-tetraalkyl piperidyl group in the molecule and a molecular weight within the range from about 1000 to about 20,000, that are polymers of an unsaturated carboxylic acid ester selected from the group consisting of unsaturated cycloaliphatic mono-, di, and tri-carboxylic acid esters having from seven to about thirty carbon atoms; unsaturated branched-chain aliphatic di- and tri-carboxylic acid esters having from four to about thirty carbon atoms; sorbic acid ester, 3,8-nonadienyl acid ester, oleic acid ester, linolenic acid ester and ricinoleic acid ester; or copolymers of at least one thereof with another copolymerizable unsaturated monomer; and synthetic resin compositions having improved light stability comprising per 100 parts by weight of resin from 0.001 to 10 parts by weight of the polymeric light stabilizer.
    Type: Grant
    Filed: April 22, 1982
    Date of Patent: September 13, 1983
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Naohiro Kubota, Toshihiro Shibata, Ryozo Arata