Patents by Inventor Ryu Iwasaki

Ryu Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6828015
    Abstract: There are provided a composite which is formed of a component (a) or a component (b) and a component (c), or the component (a) or the component (b) and a component (d), and is suitable for various uses such as an electrically-conductive material, (a) oxidized form thin film particles which are obtained by oxidizing graphite, have a carbon skeleton, have a thickness of 0.4 nm to 10 nm and a planar-direction size of at least 20 nm and have lyophilic to a liquid having a relative dielectric constant of at least 15, (b) reduced form thin film particles obtained by partially or completely reducing the above thin film particles so as to have an oxygen content of 0 to 35 wt %, (c) a macromolecule as a matrix component, and (d) low molecular-weight parts which bond a plurality of the thin film particles by a covalent bond, a process for the production of the composite, and a method for reducing oxidized form thin film particles.
    Type: Grant
    Filed: February 7, 2003
    Date of Patent: December 7, 2004
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masukazu Hirata, Takuya Goto, Kouji Takenaka, Ryu Iwasaki, Shigeo Horiuchi
  • Publication number: 20030187124
    Abstract: There are provided a composite which is formed of a component (a) or a component (b) and a component (c), or the component (a) or the component (b) and a component (d), and is suitable for various uses such as an electrically-conductive material, (a) oxidized form thin film particles which are obtained by oxidizing graphite, have a carbon skeleton, have a thickness of 0.4 nm to 10 nm and a planar-direction size of at least 20 nm and have lyophilic to a liquid having a relative dielectric constant of at least 15, (b) reduced form thin film particles obtained by partially or completely reducing the above thin film particles so as to have an oxygen content of 0 to 35 wt %, (c) a macromolecule as a matrix component, and (d) low molecular-weight parts which bond a plurality of the thin film particles by a covalent bond, a process for the production of the composite, and a method for reducing oxidized form thin film particles.
    Type: Application
    Filed: February 7, 2003
    Publication date: October 2, 2003
    Inventors: Masukazu Hirata, Takuya Gotou, Kouji Takenaka, Ryu Iwasaki, Shigeo Horiuchi
  • Patent number: 5418291
    Abstract: A resin composition comprising(a) a polyphenylene ether resin or a mixture of it and a polystyrene resin,(b) a co-oligomer of ethylene and an alpha-olefin,(c) optionally an elastomeric hydrogenated A-B-A block copolymer, and(d) optionally an elastomeric hydrogenated A-B block copolymer.The chemical resistance of the polyphenylene ether is improved.
    Type: Grant
    Filed: January 18, 1994
    Date of Patent: May 23, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hideo Uno, Hiroshi Murayama, Yasumasa Norisue, Ryu Iwasaki