Patents by Inventor Ryuichi Hoshika

Ryuichi Hoshika has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus, exposure method, method for producing device, and optical part
    Publication number: 20070115450
    Abstract: An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
    Type: Application
    Filed: December 15, 2006
    Publication date: May 24, 2007
    Applicant: Nikon Corporation
    Inventors: Hiroyuki Nagasaka, Hiroaki Takaiwa, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa