Patents by Inventor Ryuichi Iwasaki

Ryuichi Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9655987
    Abstract: The sterilization system includes a plurality of spaces to be sterilized by a sterilization process; a gas supply source generating nitrogen dioxide gas; a piping system and a valve device; a nitrogen dioxide gas sensor; and a control device. The control device performs a gas filling process in which each of the plurality of spaces to be sterilized is connected to the gas supply source one by one for a first predetermined length of time and successively filled with the nitrogen dioxide gas by controlling the valve device, and when the concentration of the nitrogen dioxide gas in a space to be sterilized that is being filled with gas is detected by the sensor to have reached a predetermined level, the control device performs control such that the subsequent gas filling process is performed with this space to be sterilized being excluded from the gas filling process.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: May 23, 2017
    Assignee: NOXILIZER INC.
    Inventors: Hirofumi Hayashi, Ryuichi Iwasaki
  • Patent number: 8968651
    Abstract: By focusing on the fact that nitrogen dioxide exhibits an increased sterilizing effect among other sterilant gases including nitrogen oxide, the present invention is made to provide a sterilization method which may be suitably used for sterilizing items to be sterilized such as medical instruments which require increased reliability by using a high concentration NO2 gas of 5,000 ppm or above, for example. An inside of a sterilizing chamber containing an item to be sterilized is humidified, and a concentration of NO2 in the sterilizing chamber is made to be from 9 to 100 mg/L by filling a high concentration NO2 gas.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: March 3, 2015
    Assignee: Noxilizer, Inc.
    Inventors: Hirofumi Hayashi, Tomoyuki Hirose, Kazuhiro Kimura, Masaaki Mike, Ryuichi Iwasaki, Shigeru Masuda, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Publication number: 20140119989
    Abstract: The sterilization system includes a plurality of spaces to be sterilized by a sterilization process; a gas supply source generating nitrogen dioxide gas; a piping system and a valve device; a nitrogen dioxide gas sensor; and a control device. The control device performs a gas filling process in which each of the plurality of spaces to be sterilized is connected to the gas supply source one by one for a first predetermined length of time and successively filled with the nitrogen dioxide gas by controlling the valve device, and when the concentration of the nitrogen dioxide gas in a space to be sterilized that is being filled with gas is detected by the sensor to have reached a predetermined level, the control device performs control such that the subsequent gas filling process is performed with this space to be sterilized being excluded from the gas filling process.
    Type: Application
    Filed: June 20, 2012
    Publication date: May 1, 2014
    Inventors: Hirofumi Hayashi, Ryuichi Iwasaki
  • Patent number: 8580086
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: November 12, 2013
    Assignee: Noxilizer, Inc.
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Publication number: 20130220793
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 29, 2013
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8425852
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: April 23, 2013
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8128783
    Abstract: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: March 6, 2012
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Masaaki Mike, Sang Hun Lee
  • Publication number: 20110286908
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 3, 2010
    Publication date: November 24, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Publication number: 20110280765
    Abstract: An exhaust system is provided for exhausting an exhaust gas used for sterilizing an item to be sterilized by using a high concentration NO2 gas, including an ozone generator, a gas treatment means for adsorbing ozone generated by the ozone generator and NO2 in the exhaust gas and accelerating generation of dinitrogen pentoxide or nitric acid by a reaction of the ozone and NO2 to retain the resultant, and an exhaust apparatus for exhausting the exhaust gas. The exhaust system can effectively and ably purify a high concentration NO2 exhaust gas having a concentration beyond the normal level.
    Type: Application
    Filed: March 4, 2010
    Publication date: November 17, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Tomoyuki Hirose, Ryuichi Iwasaki, Kazuhiro Kimura, Shigeki Okumura, Kiyotaka Arai
  • Publication number: 20110274583
    Abstract: By focusing on the fact that nitrogen dioxide exhibits an increased sterilizing effect among other sterilant gases including nitrogen oxide, the present invention is made to provide a sterilization method which may be suitably used for sterilizing items to be sterilized such as medical instruments which require increased reliability by using a high concentration NO2 gas of 5,000 ppm or above, for example. An inside of a sterilizing chamber containing an item to be sterilized is humidified, and a concentration of NO2 in the sterilizing chamber is made to be from 9 to 100 mg/L by filling a high concentration NO2 gas.
    Type: Application
    Filed: March 10, 2010
    Publication date: November 10, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Hirofumi Hayashi, Tomoyuki Hirose, Kazuhiro Kimura, Masaaki Mike, Ryuichi Iwasaki, Shigeru Masuda, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 7976672
    Abstract: A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: July 12, 2011
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Publication number: 20110008207
    Abstract: A sterilizer includes: a supply source for a sterilizing agent; a first sterilization chamber and a second sterilization chamber each adapted to be filled with the sterilizing agent while placing an object therein so as to subject the object to a sterilization treatment; a first pipe line connecting the supply source and each of the first sterilization chamber and the second sterilization chamber; a second pipe line connecting the first sterilization chamber and the second sterilization chamber; and a supply mechanism adapted to allow a residual part of the sterilizing agent used for the sterilization treatment in the first sterilization chamber to be introduced into the second sterilization chamber via the second pipe line.
    Type: Application
    Filed: March 24, 2009
    Publication date: January 13, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Kiyotaka Arai, Tomoyuki Hirose, Masaaki Mike, Ryuichi Iwasaki
  • Patent number: 7682482
    Abstract: A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.
    Type: Grant
    Filed: February 6, 2007
    Date of Patent: March 23, 2010
    Assignee: Noritsu Koki Co., Ltd.
    Inventors: Kazuhiro Yoshida, Ryuichi Iwasaki, Hirofumi Mankawa
  • Publication number: 20090200910
    Abstract: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
    Type: Application
    Filed: September 12, 2007
    Publication date: August 13, 2009
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Masaaki Mike, Sang Hun Lee
  • Publication number: 20080289577
    Abstract: A workpiece processing apparatus S, which comprises: a plasma generator unit 6 including a plasma generation section 18 operable to plasmatize a given gas supplied thereto, and emit the plasmatized gas therefrom; and a transport mechanism 2 adapted to support a target workpiece W in a position beneath the plasma generation section 18, wherein the plasmatized gas is emitted onto the workpiece W to carry out a given processing. The workpiece processing apparatus S further includes a setup frame 4 adapted to set up the plasma generator unit 6 to allow the plasma generation section 18 to be located over the workpiece. The plasma generator unit 6 is mounted to the setup frame 4 in a manner capable of being drawn out of a setup position where the plasma generation section 18 is positioned over the workpiece W, in a horizontal direction.
    Type: Application
    Filed: May 12, 2008
    Publication date: November 27, 2008
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Publication number: 20080053988
    Abstract: Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle.
    Type: Application
    Filed: August 27, 2007
    Publication date: March 6, 2008
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Kiyotaka Arai, Hirofumi Mankawa, Hidetaka Matsuuchi, Ryuichi Iwasaki, Kazuhiro Yoshida, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Publication number: 20070193516
    Abstract: A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.
    Type: Application
    Filed: February 6, 2007
    Publication date: August 23, 2007
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Kazuhiro Yoshida, Ryuichi Iwasaki, Hirofumi Mankawa
  • Publication number: 20070193517
    Abstract: A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
    Type: Application
    Filed: February 13, 2007
    Publication date: August 23, 2007
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Patent number: 5860579
    Abstract: As a negative film having a multiplicity of perforations provided therein at equal intervals is being transferred, its perforations are detected to produce a corresponding pulse signal. The pulse signal is then fed to a controller which in turn calculates the number of clock pulses for each forty pulses of the pulse signal and determines a transfer distance per clock pulse. Meanwhile, the reference transfer distance is obtained from an interval between the perforations multiplied by forty. A difference between the actual transfer distance and the reference transfer distance is calculated and used for controlling the rotating movement of drive rollers.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: January 19, 1999
    Assignee: Noritsu Koki Co., Ltd.
    Inventors: Toshiro Akira, Ryuichi Iwasaki
  • Patent number: 5847811
    Abstract: A photographic film processing apparatus has a data reader for reading magnetic data stored in a row of magnetic recorded tracks on a photographic film. The apparatus determines whether a reading error has occurred during film processing. If no error has occurred, then the film is processed in accordance with the magnetic data from the film. If an error has occurred, then the apparatus determines whether the data is eligible for replacement with reference data. If the erroneous data is eligible, then the film is processed in accordance with the reference data. If the erroneous data is not eligible, then the film is processed in accordance with external substitute data which is entered by an operator. Furthermore, the apparatus produces a maintenance demand signal based on the number of reading errors or the total length of photographic film processed.
    Type: Grant
    Filed: March 23, 1995
    Date of Patent: December 8, 1998
    Assignee: Noritsu Koki Co., Ltd.
    Inventors: Yoshihiro Tsujimoto, Ryuichi Iwasaki, Kazuyoshi Yamamoto