Patents by Inventor Ryuichi Nemoto
Ryuichi Nemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11966160Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1?); a resin including a structural unit having an acid-dissociable group; and a solvent. EA is a substituted or unsubstituted (?+?)-valent organic group having 1 to 40 carbon atoms; Z+ is a monovalent radiation-sensitive onium cation; and ? and ? are each independently 1 or 2.Type: GrantFiled: June 23, 2022Date of Patent: April 23, 2024Assignee: JSR CORPORATIONInventor: Ryuichi Nemoto
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Publication number: 20230400765Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1). R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; R2 and R3 are each independently a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R2 and R3 taken together represent a cyclic structure having 3 to 20 ring atoms; R4 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms and L1 is a divalent linking group having 1 to 40 carbon atoms, or R4 and L1 taken together represent a group including a heterocyclic structure having 3 to 20 ring atoms; Rf1 and Rf2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms.Type: ApplicationFiled: May 18, 2023Publication date: December 14, 2023Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Nozomi SAKANO
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Publication number: 20230393469Abstract: A radiation-sensitive resin composition includes a resin including a structural unit represented by formula (1), a radiation-sensitive acid generator, and a solvent. R1 is a hydrogen atom, a fluorine atom, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R4 is a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R5 and R6 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R7 and R8 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R9 and R10 each independently represent a monovalent organic group having 1 to 10 carbon atoms, or the like.Type: ApplicationFiled: August 18, 2023Publication date: December 7, 2023Applicant: JSR CORPORATIONInventors: Nozomi SAKANO, Ryuichi NEMOTO
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Publication number: 20230340266Abstract: A silicon-containing composition includes: a polysiloxane including a first structural unit represented by formula (1); and a solvent. X is an alkali-dissociable group; a is an integer of 1 to 3; and when a is 2 or more, a plurality of Xs are the same or different from each other. R1 is a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, or a halogen atom; b is an integer of 0 to 2; and when b is 2, two R1s are the same or different from each other. a + b is 3 or less.Type: ApplicationFiled: May 18, 2023Publication date: October 26, 2023Applicant: JSR CORPORATIONInventors: Tomoaki SEKO, Yusuke ANNO, Akitaka NII, Ryuichi NEMOTO, Souta NISHIMURA
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Publication number: 20230106095Abstract: A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). Rf1 and Rf2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R2, R3, R4, R5, R6, and R7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n1+n2 is an integer of 2 to 8. n3 represents an integer of 0 to 5. X1 and X2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z+ represents a monovalent radiation-sensitive onium cation.Type: ApplicationFiled: November 28, 2022Publication date: April 6, 2023Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Kensuke MIYAO
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Publication number: 20220342307Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; La1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and RP is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.Type: ApplicationFiled: June 30, 2022Publication date: October 27, 2022Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Kota FURUICH, Hajime INAMI
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Publication number: 20220334479Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1?); a resin including a structural unit having an acid-dissociable group; and a solvent. EA is a substituted or unsubstituted (?+?)-valent organic group having 1 to 40 carbon atoms; Z+ is a monovalent radiation-sensitive onium cation; and ? and ? are each independently 1 or 2.Type: ApplicationFiled: June 23, 2022Publication date: October 20, 2022Applicant: JSR CORPORATIONInventor: Ryuichi NEMOTO
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Publication number: 20220299873Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and R1 represents a monovalent organic group including a fluorine atom.Type: ApplicationFiled: June 1, 2022Publication date: September 22, 2022Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Ryotaro TANAKA, Taiichi FURUKAWA, Katsuaki NISHIKORI, Hiromitsu NAKASHIMA
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Patent number: 11429024Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.Type: GrantFiled: June 5, 2020Date of Patent: August 30, 2022Assignee: JSR CORPORATIONInventors: Ryuichi Nemoto, Tsuyoshi Furukawa
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Publication number: 20220229367Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R1 represents a monovalent organic group having 1 to 20 carbon atoms; R2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R2, or both has a fluorine atom.Type: ApplicationFiled: April 5, 2022Publication date: July 21, 2022Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Satoshi OKAZAKI, Taiichi FURUKAWA
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Publication number: 20220177424Abstract: A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NR?—. R? is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.Type: ApplicationFiled: February 24, 2022Publication date: June 9, 2022Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Katsuaki Nishikori, Ryosuke Nakamura, Takuhiro Taniguchi
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Publication number: 20220043350Abstract: A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded; R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at ?-, ?- and ?-positions of the carbon atom to which R1 and R2 are bonded; and No fluorine atom is bonded to carbon atoms located at ?- and ?-positions of the carbon atom to which R3 is bonded.Type: ApplicationFiled: October 22, 2021Publication date: February 10, 2022Applicant: JSR CORPORATIONInventors: Kazuya Kiriyama, Katsuaki Nishikori, Takuhiro Taniguchi, Ryuichi Nemoto, Ken Maruyama
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Publication number: 20200393755Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.Type: ApplicationFiled: June 5, 2020Publication date: December 17, 2020Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Tsuyoshi FURUKAWA
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Patent number: 5675360Abstract: An information processing apparatus includes a main case body having installed thereon a key group at a key installation region thereof, a track ball and a selection switch (including a right switch and a left switch) are separately provided, respectively, at a right side region and a left side region of an operator side of the key installation region. The track ball, the right switch and the left switch are provided in such a manner so as an installation region of a wiring substrate. The track ball, the right switch, and the left switch can be easily operated under a key operation feeling by using both hands in a manner similar to operation of the key group. By the foregoing configuration, an increase in an occupied area of a keyboard can be reduced, and increase in a thickness of the keyboard can be restrained, thereby allowing the information processing apparatus to have superior operation characteristics, insofar as its pointing device is concerned.Type: GrantFiled: August 10, 1995Date of Patent: October 7, 1997Assignee: Hitachi, Ltd.Inventors: Tetsuji Takegoshi, Ryuichi Nemoto, Atsuhiko Urushihara, Kouichi Saito, Hidetika Kigoshi, Takayuki Sutou, Minoru Funahashi, Seiji Nogami
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Patent number: D341616Type: GrantFiled: December 11, 1991Date of Patent: November 23, 1993Assignee: Hitachi, Ltd.Inventors: Hiroto Takita, Atsuhiko Urushihara, Ryuichi Nemoto, Toru Kiyota, Yuji Ishikawa
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Patent number: D356807Type: GrantFiled: August 4, 1993Date of Patent: March 28, 1995Assignee: Hitachi, Ltd.Inventors: Atsutoshi Sato, Touru Ebihara, Ryuichi Nemoto, Atsuhiko Urushihara, Makoto Fukatsu, Tomiyoshi Koseki
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Patent number: D360425Type: GrantFiled: July 26, 1994Date of Patent: July 18, 1995Assignee: Hitachi, Ltd.Inventors: Atsutoshi Sato, Yukinobu Maruyama, Shinichi Ishikuro, Atsuhiko Urushihara, Koji Suso, Takanori Nishiyama, Ryuichi Nemoto, Tadashi Anzai
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Patent number: D387367Type: GrantFiled: July 29, 1996Date of Patent: December 9, 1997Assignee: Hitachi, Ltd.Inventors: Atsutoshi Sato, Yukinobu Maruyama, Ryuichi Nemoto, Makoto Fukatsu, Nariaki Shigyo