Patents by Inventor Ryuichi Sakano

Ryuichi Sakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6355948
    Abstract: There is provided a semiconductor integrated circuit device having a macro cell structure including: a rectangular macro cell region formed on a semiconductor substrate; a first diffusion region having the minimum permissible width, formed apart at least by a minimum inter-diffusion distance from both left and right side ends in upper and lower sides of the macro cell region, and formed in the vicinity of both upper and lower ends of the macro cell region; and a second diffusion region in which a well contact is formed. The first diffusion region is electrically connected with the second diffusion region.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: March 12, 2002
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takenobu Iwao, Ryuichi Sakano
  • Publication number: 20020000578
    Abstract: There is provided with a semiconductor integrated circuit device comprises a macro cell structure including: a rectangular macro cell region formed on a semiconductor substrate; a first diffusion region having the minimum permissible width, formed apart at least by a minimum inter-diffusion distance from both left and right side ends in upper and lower sides of the macro cell region, and formed in the vicinity of both upper and lower ends of the macro cell region; and a second diffusion region in which a well contact is formed, wherein the first diffusion region is electrically connected with the second diffusion region.
    Type: Application
    Filed: October 6, 1999
    Publication date: January 3, 2002
    Inventors: TAKENOBU IWAO, RYUICHI SAKANO