Abstract: A Raman amplifier includes: a Raman amplification optical fiber configured to Raman amplify incoherent light in which relative intensity noise (RIN) is suppressed while transmitting the incoherent light; and a pumping light source configured to supply pumping light to the Raman amplification optical fiber. A corner frequency fc [Hz] at which the suppression of the RIN starts in the Raman-amplified incoherent light is estimated by using the following Equation (1): fc = 1 / ( D · ?? · L ) ( 1 ) in which a full width at half maximum of a wavelength spectrum of the incoherent light is ?? [nm], a length of the Raman amplification optical fiber is L [km], and a chromatic dispersion of the Raman amplification optical fiber at a center wavelength of the incoherent light is D [ps/nm/km].

Abstract: A defect sample for surface inspection includes: a substrate that is flexible and has at least one protruded and/or recessed pseudo defect formed on a surface thereof.

Abstract: A reference sample (1) for coating defects, including a substrate (10)(20) that has a surface on which one or a plurality of pseudo defective portions (11)(21) having a convex and/or concave shape are formed; and a coating film layer (12)(22) that is formed to cover at least the pseudo defective portion (11)(21) and a peripheral portion of the pseudo defective portion (11)(21).

Abstract: Disclosed is a substrate treating apparatus that performs a heat treatment to a substrate. The apparatus includes the following elements: a heat treating plate; a casing that produces a heat treatment atmosphere by the heat treating plate; a movable top board that is movable between a ceiling surface of the casing and the heat treating plate; and a controller that causes the movable top board to be moved to a raised position when the substrate is loaded/unloaded, and causes the movable top board to be moved to a lowered position when the substrate is placed on the heat treating plate for performing the heat treatment, thereby controlling the lowered position for every substrate.

Abstract: A workpiece surface defect detection device or the like that is capable of stably detecting a small surface defect with high accuracy is provided. A plurality of images indicating a portion to be measured of a workpiece serving as a target of detection of a surface defect is obtained in a state where a bright-and-dark pattern of an illumination device is moved relative to the workpiece, and a tentative defect candidate is extracted. When among a plurality of images from which the tentative defect candidate has been extracted, the number of images including the tentative defect candidate is greater than or equal to a threshold that has been set in advance, the tentative defect candidate is determined as a defect candidate. A plurality of images including the determined defect candidate is combined to generate a composite image, and a defect is detected on the basis of the generated composite image.

Abstract: A synthetic image is created by calculating a statistical variation value in a plurality of images using the plurality of images obtained by an image-capturing means (8) continuously capturing a workpiece (1) in a state where the workpiece is illuminated by a lighting device (6) that causes a periodic luminance change at a same position of the workpiece that is a detection target of a surface defect, the plurality of images being obtained in one period of the periodic luminance change, and a defect is detected based on a synthetic image created by the image synthesis means.

Abstract: An integrated control system for an automatic guided vehicle in a vehicle production line includes: a plurality of the automatic guided vehicles each conveying a conveyance object which is a vehicle; a map construction unit that acquires a map of the vehicle production line; a position information acquisition unit that acquires position information of the plurality of the automatic guided vehicles on the map; a production instruction acquisition unit that acquires vehicle information of each of the vehicles conveyed by the plurality of the automatic guided vehicles; and an operation control unit that controls movement of each of the plurality of the automatic guided vehicles on the map based on the position information and the vehicle information.

Abstract: In a substrate cleaning device, with a polishing head in contact with one surface of a substrate rotated by a spin chuck, the polishing head is moved at least between a center and an outer periphery of the substrate. Thus, the one surface of the substrate is polished by the polishing head, and contaminants present on the one surface of the substrate are removed. At this time, capacity for removing contaminants by the polishing head is changed according to a position in a radial direction of the substrate. The capacity for removing contaminants refers to capacity for scraping contaminants adhering to the one surface of the substrate, and suction marks, contact marks and the like remaining on the one surface of the substrate by polishing. It is possible to change the capacity for removing contaminants by adjusting a pushing force exerted on the one surface of the substrate from the polishing head, for example.

Abstract: A coating method of coating a substrate with a chemical includes a solvent supplying step and a chemical supplying step. In the solvent supplying step, a solvent is supplied to the substrate. After the solvent supplying step, the chemical is supplied to the substrate in the chemical supplying step. The solvent supplying step includes a first step. The first step causes the substrate to rotate at a first rotation speed, causes a solvent nozzle to move between a central position above a center portion of the substrate and a peripheral position above a peripheral portion of the substrate, and causes the solvent nozzle to dispense the solvent.

Abstract: In a substrate cleaning device, with a polishing head in contact with one surface of a substrate rotated by a spin chuck, the polishing head is moved at least between a center and an outer periphery of the substrate. Thus, the one surface of the substrate is polished by the polishing head, and contaminants present on the one surface of the substrate are removed. At this time, capacity for removing contaminants by the polishing head is changed according to a position in a radial direction of the substrate. The capacity for removing contaminants refers to capacity for scraping contaminants adhering to the one surface of the substrate, and suction marks, contact marks and the like remaining on the one surface of the substrate by polishing. It is possible to change the capacity for removing contaminants by adjusting a pushing force exerted on the one surface of the substrate from the polishing head, for example.

Abstract: An example system is provided that controls a standby time for performing contactless communication based on whether the device performing the communication is a stationary or portable device.

Abstract: A coating method of coating a substrate with a chemical includes a solvent supplying step and a chemical supplying step. In the solvent supplying step, a solvent is supplied to the substrate. After the solvent supplying step, the chemical is supplied to the substrate in the chemical supplying step. The solvent supplying step includes a first step. The first step causes the substrate to rotate at a first rotation speed, causes a solvent nozzle to move between a central position above a center portion of the substrate and a peripheral position above a peripheral portion of the substrate, and causes the solvent nozzle to dispense the solvent.

Abstract: A rotating substrate is cleaned by a polishing head and a cleaning brush. A first trajectory is formed by movement of the polishing head along a first path. A second trajectory is formed by movement of the cleaning brush along a second path. A region in which the first and second paths overlap with each other is defined as an interference region. The polishing head moves from a center towards an outer peripheral end of the substrate, and it is determined whether the polishing head has moved out of the interference region. At a time point at which it is determined that the polishing head has moved out of the interference region, the cleaning brush starts moving from the outer peripheral end towards the center of the substrate.

Abstract: A coating method of coating a substrate with a chemical includes a solvent supplying step and a chemical supplying step. In the solvent supplying step, a solvent is supplied to the substrate. After the solvent supplying step, the chemical is supplied to the substrate in the chemical supplying step. The solvent supplying step includes a first step. The first step causes the substrate to rotate at a first rotation speed, causes a solvent nozzle to move between a central position above a center portion of the substrate and a peripheral position above a peripheral portion of the substrate, and causes the solvent nozzle to dispense the solvent.

Abstract: Disclosed is a substrate treating apparatus that performs a heat treatment to a substrate. The apparatus includes the following elements: a heat treating plate; a casing that produces a heat treatment atmosphere by the heat treating plate; a movable top board that is movable between a ceiling surface of the casing and the heat treating plate; and a controller that causes the movable top board to be moved to a raised position when the substrate is loaded/unloaded, and causes the movable top board to be moved to a lowered position when the substrate is placed on the heat treating plate for performing the heat treatment, thereby controlling the lowered position for every substrate.

Abstract: A substrate cleaning device includes a cleaning brush having a circular upper end surface, and cleans a lower surface of a substrate by bringing the upper end surface of the cleaning brush into contact with the lower surface of the substrate rotated by a spin chuck. A space forming member is provided for cleaning of the cleaning brush. The space forming member has a lower end surface. Further, the space forming member has a circular opening in a lower end surface and forms an inner space. A cleaning liquid is supplied to the inner space of the space forming member with the circular opening closed by the upper end surface of the cleaning brush, whereby the cleaning liquid is allowed to flow out from the inner space through the circular opening and a gap between the upper end surface of the cleaning brush and the lower end surface of the space forming member.

Abstract: An example of information processing system includes a storage device; and an information processing device for performing near field communication with the storage device. The storage device includes a storage unit storing application data usable in a predetermined application program and shared data usable in an application program regardless of whether the application program is the predetermined application program. The information processing system receives an instruction regarding data read and/or data write from/to the storage device from an application program to be executed by the information processing device. Under the condition that the instruction is from the predetermined application program, the application data is passed to the predetermined application program. Regardless of whether the instruction is from the predetermined application program, the shared data is passed to the application program that issued the instruction.

Abstract: A coating method of coating a substrate with a chemical includes a solvent supplying step and a chemical supplying step. In the solvent supplying step, a solvent is supplied to the substrate. After the solvent supplying step, the chemical is supplied to the substrate in the chemical supplying step. The solvent supplying step includes a first step. The first step causes the substrate to rotate at a first rotation speed, causes a solvent nozzle to move between a central position above a center portion of the substrate and a peripheral position above a peripheral portion of the substrate, and causes the solvent nozzle to dispense the solvent.

Abstract: In a cable connection structure in which a roughly spherical cable end disposed at the tip of an inner wire is connected to a movable member, the movable member is provided with a pair of wing pieces that hold the inner wire, a cable insertion opening that guides the cable end to a space between the wing pieces, and a roughly elliptical cable end passage part that displaceably supports the cable end. The long axis of the roughly elliptical shape of the cable end passage part roughly coincides with the direction of insertion of the cable.

Abstract: A rotating substrate is cleaned by a polishing head and a cleaning brush. A first trajectory is formed by movement of the polishing head along a first path. A second trajectory is formed by movement of the cleaning brush along a second path. A region in which the first and second paths overlap with each other is defined as an interference region. The polishing head moves from a center towards an outer peripheral end of the substrate, and it is determined whether the polishing head has moved out of the interference region. At a time point at which it is determined that the polishing head has moved out of the interference region, the cleaning brush starts moving from the outer peripheral end towards the center of the substrate.