Patents by Inventor Ryuichiro Kanatani

Ryuichiro Kanatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Highly heat-resistant, negative-type photosensitive resin composition
    Patent number: 7282323
    Abstract: Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated double bond, (C) a photopolymerization initiator and (D) a melamine resin.
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: October 16, 2007
    Assignee: Asahi Kasei EMD Corporation
    Inventors: Ryuichiro Kanatani, Masashi Kimura, Kimiyuki Maruyama
  • Highly heat-resistant, negative-type photosensitive resin composition
    Publication number: 20050244739
    Abstract: Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated double bond, (C) a photopolymerization initiator and (D) a melamine resin.
    Type: Application
    Filed: July 10, 2003
    Publication date: November 3, 2005
    Inventors: Ryuichiro Kanatani, Masashi Kimura, Kimiyuki Maruyama