Patents by Inventor Ryuichiro Takasaki

Ryuichiro Takasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive composition, image-forming material and image-forming method employing it
    Patent number: 6544720
    Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: April 8, 2003
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ryuichiro Takasaki, Toshiyuki Urano
  • Photosensitive composition, image-forming material and image -forming method employing it
    Publication number: 20010007736
    Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.
    Type: Application
    Filed: December 19, 2000
    Publication date: July 12, 2001
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Ryuichiro Takasaki, Toshiyuki Urano
  • Photosensitive composition, image-forming material and image-forming method employing it
    Patent number: 6232038
    Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: May 15, 2001
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ryuichiro Takasaki, Toshiyuki Urano
  • Polymerizable composition for a color filter
    Patent number: 6048653
    Abstract: The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: April 11, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika
  • Polymerizable composition for a color filter
    Patent number: 5916713
    Abstract: The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: June 29, 1999
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika
  • Color filter and black resist composition
    Patent number: 5914206
    Abstract: A color filter having a resin black matrix on a transparent substrate, wherein the resin black matrix has a 20.degree. specular glossiness of from 100 to 200.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: June 22, 1999
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ryuichiro Takasaki, Shingo Ikeda, Fumiyuki Matsuo, Shin Kawana, Yasuyuki Taniguchi
  • Photosensitive composition and lithographic printing plate
    Patent number: 5814431
    Abstract: A photosensitive composition comprising(a) a resin selected from the group consisting of novolak resins and polyvinylphenol resins;(b) an amino compound derivative capable of curing the resin;(c) at least one member selected from the group consisting of cyanine compounds of the following formula (I) and polymethine compounds of the following formula (II), as a compound showing absorption in a near infrared wavelength region: ##STR1## (d) a photosensitive acid-forming agent.
    Type: Grant
    Filed: January 6, 1997
    Date of Patent: September 29, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hideki Nagasaka, Akihisa Murata, Toshiyuki Urano, Ryuichiro Takasaki
  • Photopolymerizable composition for a color filter, color filter and liquid display device
    Patent number: 5800952
    Abstract: A photopolymerizable composition for a color filter, which comprises a photopolymerization initiator system, a compound having at least one ethylenically unsaturated double bond, a colorant, and a phosphoric (meth)acrylate compound and/or an organic carboxylic anhydride having a molecular weight of at most 800, wherein the content of the colorant is from 20 to 90 wt % based on the total solid content.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: September 1, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Toshiyuki Urano, Ryuichiro Takasaki, Jiro Kamimura, Shingo Ikeda, Noriko Endo, Yuzuru Chika, Tameichi Ochiai
  • Negative photosensitive composition and method for forming patterns using the composition
    Patent number: 5529885
    Abstract: Disclosed are a negative photosensitive composition comprising an alkali-soluble resin, a photo acid generating system, and a crosslinking agent for the alkali-soluble resin which acts on the resin under acidic conditions, in which the crosslinking agent is a highly-alkylated alkoxymethylmelamine resin having a monomer content of from 5 to 40% by weight, and a method for forming a negative photo-resist pattern using the composition. The resist composition is stable during storage and gives good pattern profiles having high aspect ratios even though the resist film is made thick.
    Type: Grant
    Filed: June 3, 1994
    Date of Patent: June 25, 1996
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Yasuhiro Kameyama, Shichiro Takahashi
  • Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from .alpha.-naphthol and p-cresol
    Patent number: 4725523
    Abstract: Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.
    Type: Grant
    Filed: October 6, 1986
    Date of Patent: February 16, 1988
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Konoe Miura, Hideki Nagasaka, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki
  • Positive photosensitive composition of cocondensed .beta.-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide
    Patent number: 4650741
    Abstract: Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.
    Type: Grant
    Filed: October 18, 1985
    Date of Patent: March 17, 1987
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Konoe Miura, Hideki Nagasaka, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki