Patents by Inventor Ryuji Hatsuki

Ryuji Hatsuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for etching metal or metal oxide by ozone water, method for smoothing surface of metal or metal oxide by ozone water, and patterning method using ozone water
    Patent number: 9797046
    Abstract: Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: October 24, 2017
    Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Takatoki Yamamoto, Ryuji Hatsuki
  • METHOD FOR ETCHING METAL OR METAL OXIDE BY OZONE WATER, METHOD FOR SMOOTHING SURFACE OF METAL OR METAL OXIDE BY OZONE WATER, AND PATTERNING METHOD USING OZONE WATER
    Publication number: 20150129543
    Abstract: Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.
    Type: Application
    Filed: April 25, 2013
    Publication date: May 14, 2015
    Applicant: Japan Science and Technology Agency
    Inventors: Takatoki Yamamoto, Ryuji Hatsuki