Patents by Inventor Ryuji Kimura
Ryuji Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240105420Abstract: A data generation apparatus of one embodiment includes a processing unit, an evaluation unit, and a conversion unit. The processing unit designs, through optical proximity correction based on a target pattern formed on a substrate using the photomask, a mask pattern corresponding to the target pattern and including a plurality of rectangular regions. The evaluation unit evaluates the mask pattern using a cost function having, as a parameter, a jog length indicating a length of each of the rectangular regions included in the mask pattern in a first direction. The conversion unit converts mask pattern data indicating the mask pattern with an evaluation that meets a predetermined condition to drawing data corresponding to a variable shaped beam drawing process.Type: ApplicationFiled: June 9, 2023Publication date: March 28, 2024Applicant: Kioxia CorporationInventors: Katsuyoshi KODERA, Shoji MIMOTOGI, Shunko MAGOSHI, Ryuji OGAWA, Taiki KIMURA
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Publication number: 20220140762Abstract: There is provided a transport system comprising: a stator having a first magnetic force unit; a mover having a second magnetic force unit; and a control unit. The control unit controls a magnetic force acting between the first magnetic force unit and the second magnetic force unit to transport the mover in a first direction. The stator has a first regulating member row including a plurality of first regulating members and a second regulating member row including a plurality of second regulating members, the mover, in a second direction intersecting the first direction, being disposed between the first regulating member row and the second regulating member row. The control unit performs a first process of applying a rotational force to the mover such that one of the first regulating members in the first regulating member row serves as a fulcrum when the mover contacts the first regulating member row.Type: ApplicationFiled: October 11, 2021Publication date: May 5, 2022Inventors: Ryuji Kimura, Tatsuya Shinkai, Takeshi Yamamoto, Mitsuharu Ezawa, Kazushi Shimomura, Tomohiro Mizuno
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Patent number: 11204446Abstract: An antireflection film is arranged on a surface of a substrate layer. The antireflection film includes a multilayer film arranged on the surface of the substrate layer and a protective film arranged outside the multilayer film. The multilayer film is formed by stacking two or three low-reflection layers. Two protective films are successively arranged outside the multilayer film of the antireflection film. An optical component includes the antireflection film arranged on both sides or one side of an optical filter of the optical component. The high-performance antireflection film can be obtained with respect to a broadband wavelength ranging from 400 nm to 800 nm, and the antireflection film can reduce the occurrence of ghosts or flare when used in an optical system.Type: GrantFiled: January 7, 2020Date of Patent: December 21, 2021Assignees: HANGZHOU MDK OPTO ELECTRONICS CO., LTD, CORPORATION NWInventors: Wenzhi Ge, Ryuji Kimura
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Publication number: 20200264338Abstract: An antireflection film is arranged on a surface of a substrate layer. The antireflection film includes a multilayer film arranged on the surface of the substrate layer and a protective film arranged outside the multilayer film. The multilayer film is formed by stacking two or three low-reflection layers. Two protective films are successively arranged outside the multilayer film of the antireflection film. An optical component includes the antireflection film arranged on both sides or one side of an optical filter of the optical component. The high-performance antireflection film can be obtained with respect to a broadband wavelength ranging from 400 nm to 800 nm, and the antireflection film can reduce the occurrence of ghosts or flare when used in an optical system.Type: ApplicationFiled: January 7, 2020Publication date: August 20, 2020Applicants: HANGZHOU MDK OPTO ELECTRONICS CO.,LTD, Corporation N*WInventors: Wenzhi Ge, Ryuji Kimura
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Patent number: 9067303Abstract: A chamber having a water jet generation apparatus and a mesh installed inside is pushed against a surface of a peening object. A rotary vane of the water jet generation apparatus, disposed in a region in the chamber between the mesh and the chamber, is rotated to generate a water jet flowing toward the peening object in one region in the chamber, the one region is a region closer to the peening object than the mesh. A plurality of shots 4 put in the region 30A moves toward the peening object along with the water jet and collides with the surface of the peening object. After the collision, the shots move toward the mesh along with the water jet. Compression residual stress is given to the surface of the peening object with which the shots have collided. Thus, spreading of contaminants peeled off from a peening object can be prevented.Type: GrantFiled: June 25, 2013Date of Patent: June 30, 2015Assignee: Hitachi-GE Nuclear Energy, Ltd.Inventors: Hisamitu Hatou, Noboru Saito, Ren Morinaka, Fujio Yoshikubo, Masashi Fukaya, Yuji Matsui, Ryuji Kimura
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Publication number: 20150142182Abstract: An active anti-vibration apparatus is provided that supports a wide range of vibration accelerations using only one type of anti-vibration mechanism. Upon occurrence of an excessive acceleration, the active anti-vibration apparatus performs switching such that an acceleration detection gain 14b of an acceleration amplifier 14 is multiplied by a prescribed magnification, the cutoff frequency of a high-pass filter 11a of a vibration control unit 11 is increased, and an acceleration control gain 11b of the vibration control unit 11 is multiplied by the reciprocal of the prescribed magnification.Type: ApplicationFiled: July 30, 2013Publication date: May 21, 2015Inventors: Ryuji Kimura, Kosuke Suemura
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Publication number: 20150013413Abstract: A water jet peening apparatus (WJP apparatus) includes a seating member, rotating portion set to it, and first and second injection nozzles. A hoisting apparatus is attached to the rotating portion, and the first and second injection nozzles are attached to a nozzle arm. The WJP apparatus is gone down in a reactor vessel (RV) by crane operation, and the seating member is seated on a bottom mounted instrumentation nozzle welded to a bottom head of the RV. By the hoisting apparatus, the nozzle arm is gone down and the first and second injection nozzles are gone down. The first injection nozzle is inserted into the bottom mounted instrumentation nozzle and the second injection nozzle is set outside the bottom mounted instrumentation nozzle. High-pressure water is jetted from the first and second injection nozzles, and WJP is implemented for both of the inner and outer surfaces of the welding area of the bottom mounted instrumentation nozzle.Type: ApplicationFiled: July 10, 2014Publication date: January 15, 2015Inventors: Ryuji KIMURA, Fujio YOSHIKUBO, Masami ANDO
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Publication number: 20140233689Abstract: In a water jet peening apparatus, a high-pressure under-water pump is installed on an upper end of a casing and an injection nozzle drive mechanism equipped with an injection nozzle is attached to the casing. A high-pressure hose whose one end is connected to the high-pressure under-water pump is disposed in the casing and the other end of the high-pressure hose is connected to the injection nozzle. The casing is seated at an upper end of a control rod drive mechanism housing and the high-pressure under-water pump is driven. The high-pressure water pressurized by the high-pressure under-water pump is supplied to the injection nozzle through the high-pressure hose in the casing and is jetted toward the weld portion between the control rod drive mechanism housing and a stub tube. The time required for a water jet peening operation can be shortened.Type: ApplicationFiled: February 14, 2014Publication date: August 21, 2014Applicant: Hitachi-GE Nuclear Energy, Ltd.Inventors: Noboru SAITO, Hisamitsu HATOU, Koichi KUROSAWA, Fujio YOSHIKUBO, Ren MORINAKA, Ryuji KIMURA
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Patent number: 8759211Abstract: A method includes applying, between connection conductors of adjacent substrates, a junction material containing the first metal or alloy component and the second metal or alloy component having a higher melting point than said first metal or alloy component. The method further includes melting the junction material by a heat treatment.Type: GrantFiled: March 11, 2013Date of Patent: June 24, 2014Assignee: Napra Co., Ltd.Inventors: Shigenobu Sekine, Yurina Sekine, Yoshiharu Kuwana, Ryuji Kimura
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Publication number: 20140000330Abstract: A chamber having a water jet generation apparatus and a mesh installed inside is pushed against a surface of a peening object. A rotary vane of the water jet generation apparatus, disposed in a region in the chamber between the mesh and the chamber, is rotated to generate a water jet flowing toward the peening object in one region in the chamber, the one region is a region closer to the peening object than the mesh. A plurality of shots 4 put in the region 30A moves toward the peening object along with the water jet and collides with the surface of the peening object. After the collision, the shots move toward the mesh along with the water jet. Compression residual stress is given to the surface of the peening object with which the shots have collided. Thus, spreading of contaminants peeled off from a peening object can be prevented.Type: ApplicationFiled: June 25, 2013Publication date: January 2, 2014Inventors: Hisamitu HATOU, Noboru SAITO, Ren MORINAKA, Fujio YOSHIKUBO, Masashi FUKAYA, Yuji MATSUI, Ryuji KIMURA
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Publication number: 20130186943Abstract: A method includes applying, between connection conductors of adjacent substrates, a junction material containing the first metal or alloy component and the second metal or alloy component having a higher melting point than said first metal or alloy component. The method further includes melting the junction material by a heat treatment.Type: ApplicationFiled: March 11, 2013Publication date: July 25, 2013Inventors: Shigenobu SEKINE, Yurina Sekine, Yoshiharu Kuwana, Ryuji Kimura
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Patent number: 8415784Abstract: An electronic device includes a plurality of stacked substrates. Each of the substrates includes a semiconductor substrate, a columnar conductor, and a ring-shaped insulator. The columnar conductor extends along a thickness direction of the semiconductor substrate. The ring-shaped insulator includes an inorganic insulating layer mainly composed of a glass. The inorganic insulating layer fills a ring-shaped groove that is provided in the semiconductor substrate to surround the columnar conductor.Type: GrantFiled: May 28, 2010Date of Patent: April 9, 2013Assignee: Napra Co., Ltd.Inventors: Shigenobu Sekine, Yurina Sekine, Yoshiharu Kuwana, Ryuji Kimura
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Patent number: 8079131Abstract: The present invention includes a step of cooling a molten metal within a fine space present in the inside of an object and hardening it while applying a forced external force exceeding atmospheric pressure to the molten metal. The fine space is opened on the outer surface of the object in terms of one end thereof. The forced external force is given by at least one member selected among a pressing pressure, an injection pressure and a rolling compaction and applied to the molten metal from the opening surface side on which the fine space is opened, in a state that the other end side of the fine space is closed.Type: GrantFiled: February 27, 2009Date of Patent: December 20, 2011Assignee: Napra Co., Ltd.Inventors: Shigenobu Sekine, Yurina Sekine, Ryuji Kimura
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Publication number: 20100301485Abstract: An electronic device includes a plurality of stacked substrates. Each of the substrates includes a semiconductor substrate, a columnar conductor, and a ring-shaped insulator. The columnar conductor extends along a thickness direction of the semiconductor substrate. The ring-shaped insulator includes an inorganic insulating layer mainly composed of a glass. The inorganic insulating layer fills a ring-shaped groove that is provided in the semiconductor substrate to surround the columnar conductor.Type: ApplicationFiled: May 28, 2010Publication date: December 2, 2010Applicant: Napra Co., Ltd.Inventors: Shigenobu SEKINE, Yurina SEKINE, Yoshiharu KUWANA, Ryuji KIMURA
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Publication number: 20100126688Abstract: The present invention includes a step of cooling a molten metal within a fine space present in the inside of an object and hardening it while applying a forced external force exceeding atmospheric pressure to the molten metal. The fine space is opened on the outer surface of the object in terms of one end thereof. The forced external force is given by at least one member selected among a pressing pressure, an injection pressure and a rolling compaction and applied to the molten metal from the opening surface side on which the fine space is opened, in a state that the other end side of the fine space is closed.Type: ApplicationFiled: February 27, 2009Publication date: May 27, 2010Applicant: Napra Co., Ltd.Inventors: Shigenobu SEKINE, Yurina Sekine, Ryuji Kimura
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Patent number: 4427561Abstract: A lubricant composition that exhibits high wear resistance in a Flon atmosphere is disclosed. The composition comprises mineral oil, alkylbenzene, or a mixture of mineral oil and alkylbenzene as a base oil and it has added thereto an organic sulfur compound in an amount greater than a certain value.Type: GrantFiled: June 22, 1981Date of Patent: January 24, 1984Assignee: Nippon Mining Co., Ltd.Inventors: Sampo Kusayanagi, Ryuji Kimura