Patents by Inventor Ryuji Maeda

Ryuji Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5876884
    Abstract: An exposure process of a pattern on a transparent substrate of a plasma display panel is conducted on a flat principal surface of stage in which a depression is formed for accommodating an alignment optical source, wherein a movable shutter is provided on the stage so as to be movable in a plane substantially flush to the principal surface of the stage.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: March 2, 1999
    Assignee: Fujitsu Limited
    Inventors: Ryuji Maeda, Mitsugu Uemura, Masahiro Uraguchi