Patents by Inventor Ryuji Nagadome

Ryuji Nagadome has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9775301
    Abstract: A cultivation system moves containers between a growing area and a monitoring area. The containers hold cultivation beds for cultivating plants, and the cultivation system includes: a grow light emitting unit emitting grow light for growing the cultivated plants in the containers located in the growing area; an imaging unit capturing the cultivated plants in the containers located in the monitoring area; and a control unit causing the grow light emitting unit to stop emitting the grow light when the imaging unit captures the plants.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: October 3, 2017
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Ryuji Nagadome, Hiroshi Haji
  • Patent number: 9433158
    Abstract: An irrigation device includes: a nozzle discharging liquid; a cover preventing the liquid discharged from the nozzle from splattering around the container; and a moving mechanism moving the cover between a first position and a second position. When moved to the first position, the cover covers space above the container. When moved to the second position, the cover is removed from the space above the container and the space is uncovered. The moving mechanism moves the cover (i) to the first position when the liquid is supplied to a plant, and (ii) to the second position when the supplying of the liquid to the plant ends.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: September 6, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Ryuji Nagadome, Hiroshi Haji
  • Publication number: 20150014440
    Abstract: An irrigation device includes: a nozzle discharging liquid; a cover preventing the liquid discharged from the nozzle from splattering around the container; and a moving mechanism moving the cover between a first position and a second position. When moved to the first position, the cover covers space above the container. When moved to the second position, the cover is removed from the space above the container and the space is uncovered. The moving mechanism moves the cover (i) to the first position when the liquid is supplied to a plant, and (ii) to the second position when the supplying of the liquid to the plant ends.
    Type: Application
    Filed: December 7, 2012
    Publication date: January 15, 2015
    Inventors: Ryuji Nagadome, Hiroshi Haji
  • Publication number: 20150000191
    Abstract: A cultivation system moves containers between a growing area and a monitoring area. The containers hold cultivation beds for cultivating plants, and the cultivation system includes: a grow light emitting unit emitting grow light for growing the cultivated plants in the containers located in the growing area; an imaging unit capturing the cultivated plants in the containers located in the monitoring area; and a control unit causing the grow light emitting unit to stop emitting the grow light when the imaging unit captures the plants.
    Type: Application
    Filed: December 7, 2012
    Publication date: January 1, 2015
    Applicant: Panasonic Corproation
    Inventors: Ryuji Nagadome, Hiroshi Haji
  • Patent number: 8016974
    Abstract: In a plasma treatment apparatus for performing plasma treatment by accommodating a substrate in a treatment chamber, a fixed guide 12 and a movable guide 13 made of a ceramic are arrayed in an X direction (in a substrate transporting direction) for guiding both side end portions of the substrate held on a ceramic-made mounting plate 10, and both end portions of the movable guide 13 are supported by supporting members. In this construction, these supporting members are fitted to fixed members 15A and 15B arranged in a Y direction with the mounting plate 10 placed therebetween, such that an interval in the Y direction is adjustable. Consequently, the ceramic-made guide member 13 can be mounted and demounted without directly bolting it, and it is possible to prevent the generation of an abnormal discharge by using as objects multiple product thin-type substrates with different widthwise dimensions.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: September 13, 2011
    Assignee: Panasonic Corporation
    Inventors: Tetsuo Korenaga, Ryuji Nagadome
  • Publication number: 20080251208
    Abstract: In a plasma treatment apparatus for performing plasma treatment by accommodating a substrate (11) in a treatment chamber (6), a fixed guide (12) and a movable guide (13) made of a ceramic are arrayed in an X direction (in a substrate transporting direction) for guiding both side end portions of the substrate held on a ceramic-made mounting plate (10), and both end portions of the movable guide (13) are supported by supporting members (18). In this construction, these supporting members (18) are fitted to fixed members (15A) and (15B) arranged in a Y direction with the mounting plate (10) placed therebetween, such that an interval in the Y direction is adjustable. Consequently, the ceramic-made guide member (13) can be mounted and demounted without directly bolting it, and it is possible to prevent the generation of an abnormal discharge by using as objects multiple product thin-type substrates (11) with different widthwise dimensions.
    Type: Application
    Filed: February 10, 2006
    Publication date: October 16, 2008
    Inventors: Tetsuo Korenaga, Ryuji Nagadome
  • Patent number: 6576500
    Abstract: A plasma-processing apparatus providing a resin mold domed enough to allow no bonding wires to be exposed is presented. The plasma-processing apparatus cleans a board including a chip mounted thereon and a disposing area for a pad formed around the chip. The apparatus includes a chamber for accommodating the board; an electrode mounted to the chamber for generating plasma in the chamber with a voltage applied thereto, a table for supporting the board in the chamber, and a masking member which is provided above the board. The masking member has an opening for exposing the chip and the disposing area to the plasma.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: June 10, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Ryota Furukawa, Ryuji Nagadome
  • Publication number: 20020034840
    Abstract: A plasma-processing apparatus providing a resin mold domed enough to allow no bonding wires to be exposed is presented. The plasma-processing apparatus cleans a board including a chip mounted thereon and a disposing area for a pad formed around the chip. The apparatus includes a chamber for accommodating the board; an electrode mounted to the chamber for generating plasma in the chamber with a voltage applied thereto, a table for supporting the board in the chamber, and a masking member which is provided above the board. The masking member has an opening for exposing the chip and the disposing area to the plasma.
    Type: Application
    Filed: September 7, 2001
    Publication date: March 21, 2002
    Inventors: Ryota Furukawa, Ryuji Nagadome