Patents by Inventor Ryujiro Namba

Ryujiro Namba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5738783
    Abstract: A liquid chromatograph includes pumps for supplying solvents, a mixer for mixing the solvents, a controller for controlling a mixing ratio of the solvents in the mixer, a chromatograph column for separating a sample carried with the solvents, a flow path control valve for supplying the sample together with the solvents to the chromatograph column, and a detector for detecting the sample supplied thereto, wherein the mixer includes a mixing chamber and a porous medium accommodated in the mixing chamber, the porous medium having a size and shape in conformity with a size and shape of said mixing chamber such that no substantial gap is formed between an outer surface of the porous medium and an inner surface of the mixing chamber.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: April 14, 1998
    Assignee: Shiseido Company, Ltd.
    Inventors: Osamu Shirota, Taketoshi Kanda, Ayako Suzuki, Yutaka Ohtsu, Michihiro Yamaguchi, Hisao Tsuruta, Ryujiro Namba
  • Patent number: 4882225
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)Wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: April 26, 1988
    Date of Patent: November 21, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tommita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Patent number: 4818614
    Abstract: A modified powder or particulate material coated on substantially the entire surface thereof with a film of a silicone polymer carrying a pendant group thereon, this powder or particulate material being produced by a process comprising the steps of(a) coating the powder or particulate material with a film of a silicone polymer having at least one Si-H moiety, and(b) carrying out an addition reaction of a compound capable of reacting with an Si--H moiety to the Si--H moiety in the silicone polymer of step (a), whereby the pendant group derived from said compound is bonded to the silicone polymer.
    Type: Grant
    Filed: July 25, 1986
    Date of Patent: April 4, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Patent number: 4801445
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: June 17, 1986
    Date of Patent: January 31, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu