Patents by Inventor Ryuki TAKAGI

Ryuki TAKAGI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SAMPLE ANALYSIS SYSTEM, CLEANING LIQUID PREPARATION APPARATUS, SAMPLE ANALYZER, AND CLEANING LIQUID SUPPLY METHOD
    Publication number: 20210018526
    Abstract: Disclosed is a sample analysis system comprising a cleaning liquid preparation apparatus that prepares a cleaning liquid, and a sample analyzer that comprises a measurement unit that measures a sample and a reservoir that stores the cleaning liquid prepared by the cleaning liquid preparation apparatus. The sample analyzer cleans at least a part of the measurement unit with the cleaning liquid. The cleaning liquid preparation apparatus selectively executes a first supply mode to supply the cleaning liquid to the reservoir when a liquid amount in the reservoir reaches a first amount, and a second supply mode to supply the cleaning liquid to the reservoir when the liquid amount in the reservoir reaches a second amount less than the first amount.
    Type: Application
    Filed: October 2, 2020
    Publication date: January 21, 2021
    Applicant: SYSMEX CORPORATION
    Inventors: Ryuki TAKAGI, Yuji WAKAMIYA
  • Sample analysis system, cleaning liquid preparation apparatus, sample analyzer, and cleaning liquid supply method
    Patent number: 10830783
    Abstract: Disclosed is a sample analysis system comprising a cleaning liquid preparation apparatus that prepares a cleaning liquid, and a sample analyzer that comprises a measurement unit that measures a sample and a reservoir that stores the cleaning liquid prepared by the cleaning liquid preparation apparatus. The sample analyzer cleans at least a part of the measurement unit with the cleaning liquid. The cleaning liquid preparation apparatus selectively executes a first supply mode to supply the cleaning liquid to the reservoir when a liquid amount in the reservoir reaches a first amount, and a second supply mode to supply the cleaning liquid to the reservoir when the liquid amount in the reservoir reaches a second amount less than the first amount.
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: November 10, 2020
    Assignee: SYSMEX CORPORATION
    Inventors: Ryuki Takagi, Yuji Wakamiya
  • SAMPLE ANALYSIS SYSTEM, CLEANING LIQUID PREPARATION APPARATUS, SAMPLE ANALYZER, AND CLEANING LIQUID SUPPLY METHOD
    Publication number: 20170108524
    Abstract: Disclosed is a sample analysis system comprising a cleaning liquid preparation apparatus that prepares a cleaning liquid, and a sample analyzer that comprises a measurement unit that measures a sample and a reservoir that stores the cleaning liquid prepared by the cleaning liquid preparation apparatus. The sample analyzer cleans at least a part of the measurement unit with the cleaning liquid. The cleaning liquid preparation apparatus selectively executes a first supply mode to supply the cleaning liquid to the reservoir when a liquid amount in the reservoir reaches a first amount, and a second supply mode to supply the cleaning liquid to the reservoir when the liquid amount in the reservoir reaches a second amount less than the first amount.
    Type: Application
    Filed: October 13, 2016
    Publication date: April 20, 2017
    Applicant: SYSMEX CORPORATION
    Inventors: Ryuki TAKAGI, Yuji WAKAMIYA