Patents by Inventor Ryusaku Fujimoto

Ryusaku Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TRIMELLITIC ACID TRIESTER PLASTICIZER AND VINYL CHLORIDE RESIN COMPOSITION CONTAINING SAME
    Publication number: 20180044504
    Abstract: An object of the present invention is to provide a plasticizer having excellent press coloration resistance and cold resistance, and a vinyl chloride resin composition containing the plasticizer. The plasticizer is a trimellitic acid triester plasticizer containing a triester compound of a saturated aliphatic alcohol and trimellitic acid, wherein the saturated aliphatic alcohol contains a linear alcohol having 8 to 10 carbon atoms and a branched alcohol having 8 to 10 carbon atoms, and the ratio (mass ratio) of the linear alcohol and the branched alcohol is 78/22 to 50/50.
    Type: Application
    Filed: March 8, 2016
    Publication date: February 15, 2018
    Applicant: ADEKA CORPORATION
    Inventors: Ryusaku FUJIMOTO, Masaru NAGAHAMA, Yuki TANAKA
  • Metal alkoxide compound, material for forming thin film, and method for producing thin film
    Patent number: 8003814
    Abstract: A metal alkoxide compound represented by the following general formula (1), wherein each of R1 to R8 is independently a hydrogen atom or a methyl group; M is a titanium, a zirconium or a hafnium atom.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: August 23, 2011
    Assignee: Adeka Corporation
    Inventors: Senji Wada, Tetsuji Abe, Atsushi Sakurai, Takashi Higashino, Ryusaku Fujimoto, Masako Shimizu
  • METAL ALKOXIDE COMPOUND, MATERIAL FOR FORMING THIN FILM,AND METHOD FOR PRODUCING THIN FILM
    Publication number: 20080187662
    Abstract: A metal alkoxide compound represented by the following general formula (1), wherein each of R1 to R8 is independently a hydrogen atom or a methyl group; M is a titanium, a zirconium or a hafnium atom.
    Type: Application
    Filed: September 12, 2007
    Publication date: August 7, 2008
    Applicant: ADEKA CORPORATION
    Inventors: Senji Wada, Tetsuji Abe, Atsushi Sakurai, Takashi Higashino, Ryusaku Fujimoto, Masako Shimizu
  • Rare earth metal complex material for thin film formation and process of forming thin film
    Publication number: 20060275545
    Abstract: A tris(sec-butylcyclopentadienyl) complex of a rare earth metal represented by general formula (I). The complex is excellent in heat resistance and volatility and is liquid, which is advantageous for use as a thin film forming material. wherein M is a rare earth metal atom.
    Type: Application
    Filed: August 2, 2004
    Publication date: December 7, 2006
    Applicant: Asahi Denka Co., Ltd.
    Inventors: Atsuya YOSHINAKA, Hiroki Sato, Ryusaku Fujimoto