Patents by Inventor Ryusei Nishimura

Ryusei Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260159935
    Abstract: A sprayed film including a film surface in which a value of an area ratio S/A obtained by dividing a surface area S (?m2) of a portion of the measurement surface (S-L surface) of the film surface within one evaluation region by an area A (?m2) of a portion of a reference surface forming a plane located at an arithmetic average height of the measurement surface (S-L surface), which is within the evaluation region is 1.75 or more and 3 or less, and a surface roughness Sa of a portion of the measurement surface (S-L surface) within the evaluation region is 0.4 ?m or more and 8 ?m or less. Generation of particles which is caused by cracks of the sprayed film can be reduced when dry etching using gas plasma is performed with a semiconductor manufacturing apparatus or the like using the sprayed film as a corrosion-resistant film.
    Type: Application
    Filed: December 2, 2025
    Publication date: June 11, 2026
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryo IWASAKI, Ryusei NISHIMURA, Noboru YAMAMOTO, Yugo TANIGUCHI, Yukimi IWAMOTO, Toshihiko TSUKATANI, Yuji KIMURA, Shigeyuki NAKAMURA, Kouhei MARUKO
  • Publication number: 20260023323
    Abstract: A developing fluid supply apparatus comprises a supply path connected to a developing part configured to develop a substrate on which a metal-containing resist film has been formed and which has been subjected to exposure processing, with a developing fluid containing at least one of gas and mist of a weak acid, a developing fluid generator configured to generate the developing fluid from a developing liquid; and a heating part configured to heat the developing fluid to be supplied to the developing part via the supply path.
    Type: Application
    Filed: July 14, 2025
    Publication date: January 22, 2026
    Inventors: Kenji IIZUKA, Kouichi MIZUNAGA, Koji USHIMARU, Kazuhiko OOSHIMA, Keigo NAKANO, Yuma TABATA, Masashi TSUCHIYAMA, Ryusei NISHIMURA, Shinsuke TAKAKI
  • Publication number: 20240035140
    Abstract: Provided is a rare earth oxide thermal spraying material which has a granular form having a volume-based average particle diameter D50 of 10 ?m to 18 ?m inclusive as measured by a laser diffraction scattering method, a compression degree of 13 or less and a BET specific surface area of 0.1 m2/g to 2 m2/g inclusive. The rare earth oxide thermal spraying material according to the present invention can form a dense thermally sprayed film having a small porosity even by atmospheric plasma spraying in which a thermal spraying material is supplied in a solid (particle) form. When a thermally sprayed film is formed by atmospheric plasma spraying using the rare earth oxide thermal spraying material according to the present invention, it becomes possible to form the thermally sprayed film in a curved shape easily and to form the thermally sprayed film in a large thickness.
    Type: Application
    Filed: December 16, 2021
    Publication date: February 1, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryusei Nishimura, Yasushi Takai, Hajime Nakano, Kouhei Miyamoto