Abstract: Disclosed is a semiconductor device having a large number of basic cells, wherein a plurality of basic cells arranged along rows of a semiconductor substrate form a basic cell array and a plurality of the basic cell arrays are arranged along columns of the substrate, and further including spaces formed between each adjoining column. Each basic cell is comprised of first and second P-channel MIS transistors and first and second N-channel MIS transistors. The gates of both the first P-channel and the first N-channel MIS transistors form a first single common gate, and the gates of both the second P-channel and the second N-channel MIS transistors form a second single common gate. The sources or the drains of both the first P-channel and the second P-channel MIS transistors form a first single common source or drain, and the sources or the drains of both the first N-channel and the second N-channel MIS transistors form a second single common source or drain.