Patents by Inventor Ryusuke YAMASHITA

Ryusuke YAMASHITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230333177
    Abstract: A magneto-impedance sensor element includes a magneto-sensitive body having electromagnetic properties that vary by a magnetic field externally acting thereon; and a detection coil wound around the magneto-sensitive body, in which a voltage corresponding to the intensity of the magnetic field acting on the magneto-sensitive body is output from the detection coil by applying a pulse current or a high-frequency current to the magneto-sensitive body. The magneto-sensitive body includes a first magneto-sensitive section and a second magneto-sensitive section that are configured to carry a pulse current or a high-frequency current in opposite directions to each other.
    Type: Application
    Filed: September 10, 2021
    Publication date: October 19, 2023
    Applicant: AICHI STEEL CORPORATION
    Inventors: Michiharu YAMAMOTO, Ryusuke YAMASHITA, Shiori ITABUCHI, Shunichi TATEMATSU
  • Patent number: 10620276
    Abstract: A magnetic detection device that is reduced in size and thickness, but also accurate, includes a substrate and an element disposed on the substrate and including a magneto-sensitive wire sensing an external magnetic field component in an extending direction and a detection coil looping around the magneto-sensitive wire. The magnetic detection device further includes a magnetic field deflector deflecting an external magnetic field around the magneto-sensitive wire, and having a nonmagnetic material core part and a soft magnetic material shell part covering an outer side of at least part of the core part. The magnetic field deflector has a hollow, rather than solid, structure of soft magnetic material. The soft magnetic material volume is therefore significantly smaller, and the hysteresis caused in the magnetic field deflector is remarkably reduced. With the magnetic detection device, the magnetic field component orthogonal to the substrate is also detected with higher accuracy.
    Type: Grant
    Filed: June 21, 2016
    Date of Patent: April 14, 2020
    Assignee: AICHI STEEL CORPORATION
    Inventors: Takashi Shimoto, Jun Nakamura, Ryusuke Yamashita, Tomohiko Nagao, Michiharu Yamamoto
  • Publication number: 20180210040
    Abstract: A magnetic detection device that is reduced in size and thickness, but also accurate, includes a substrate and an element disposed on the substrate and including a magneto-sensitive wire sensing an external magnetic field component in an extending direction and a detection coil looping around the magneto-sensitive wire. The magnetic detection device further includes a magnetic field deflector deflecting an external magnetic field around the magneto-sensitive wire, and having a nonmagnetic material core part and a soft magnetic material shell part covering an outer side of at least part of the core part. The magnetic field deflector has a hollow, rather than solid, structure of soft magnetic material. The soft magnetic material volume is therefore significantly smaller, and the hysteresis caused in the magnetic field deflector is remarkably reduced. With the magnetic detection device, the magnetic field component orthogonal to the substrate is also detected with higher accuracy.
    Type: Application
    Filed: June 21, 2016
    Publication date: July 26, 2018
    Applicant: AICHI STEEL CORPORATION
    Inventors: Takashi SHIMOTO, Jun NAKAMURA, Ryusuke YAMASHITA, Tomohiko NAGAO, Michiharu YAMAMOTO
  • Patent number: 9376748
    Abstract: A method for etching an organic film 1 having a surface selectively protected by a hard mask layer 2, includes a partial etching process of etching the organic film 1 partly in a thickness direction of the organic film 1 by using a mixed gas containing a gas that anisotropically etches a silicon oxide film and a gas that isotropically etches the organic film without etching the silicon oxide film; and a deposition process of depositing a protective film 3 made of the silicon oxide film on side surfaces 12 and a bottom surface 11 of a recess 10 formed in the organic film in the partial etching process. The partial etching process and the deposition process is alternately performed multiple times.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 28, 2016
    Assignee: AICHI STEEL CORPORATION
    Inventors: Michiharu Yamamoto, Shunichi Tatematsu, Ryusuke Yamashita, Norihiko Hamada, Koei Gemba
  • Publication number: 20150232984
    Abstract: A method for etching an organic film 1 having a surface selectively protected by a hard mask layer 2, includes a partial etching process of etching the organic film 1 partly in a thickness direction of the organic film 1 by using a mixed gas containing a gas that anisotropically etches a silicon oxide film and a gas that isotropically etches the organic film without etching the silicon oxide film; and a deposition process of depositing a protective film 3 made of the silicon oxide film on side surfaces 12 and a bottom surface 11 of a recess 10 formed in the organic film in the partial etching process. The partial etching process and the deposition process is alternately performed multiple times.
    Type: Application
    Filed: February 18, 2015
    Publication date: August 20, 2015
    Applicant: AICHI STEEL CORPORATION
    Inventors: Michiharu YAMAMOTO, Shunichi TATEMATSU, Ryusuke YAMASHITA, Norihiko HAMADA, Koei GEMBA