Patents by Inventor Ryuta Takashita

Ryuta Takashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11773216
    Abstract: A fluorinated ether compound and a composition capable of forming a light resistant surface layer and an article are provided. The fluorinated ether compound of the present invention has a poly(oxyfluoroalkylene) chain, a reactive silyl group and a group (A) represented by —NR—C(O)— (wherein R is a hydrogen atom or an alkyl group), wherein the carbonyl carbon in the group (A) is bonded to a carbon atom, and the poly(oxyfluoroalkyiene) chain is located at the nitrogen end of the group (A).
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: October 3, 2023
    Assignee: AGC Inc.
    Inventors: Keigo Matsuura, Eiichiro Anraku, Ryuta Takashita, Koki Watanabe, Makoto Uno, Koichi Murata, Takafumi Kawakami
  • Publication number: 20230256469
    Abstract: A substrate with a water and oil repellent layer having excellent abrasion resistance and a method for producing the substrate are provided. The substrate with a water and oil repellent layer contains a substrate, an undercoat layer formed on the surface of the substrate, and a water and oil repellent layer formed on the surface of the undercoat layer. The undercoat layer contains an oxide containing silicon and a specific element. The water and oil repellent layer is made of a hydrolytic condensation compound of a fluorinated ether compound, which is a compound represented by the formula (A1) or a compound represented by the formula (A2): Rf—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(—R3)3-a]b??(A1) [(T-R2—)a(R3—)3-aC—R1—]bRf2—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(—R3)3-a]b??(A2).
    Type: Application
    Filed: February 2, 2023
    Publication date: August 17, 2023
    Applicant: AGC INC.
    Inventors: Ryuta TAKASHITA, Toyokazu ENTA
  • Publication number: 20230220236
    Abstract: The object is to provide a composition capable of forming a surface layer with excellent abrasion resistance, a substrate with a surface layer, and a method for producing a substrate with a surface layer. It is also an object to provide new compounds and their production methods. The composition of the invention comprises a first component made of a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and at least one type of second component selected from compound (A) (Rfa—(OXa)m1-La-CZa1?CH2) and compound (B) (CH2?CZb2-Lb2-(OXb)m2-Lb1-CZb1?CH2), where Rfa is a fluoroalkyl group, Xa and Xb are fluoroalkylene groups, La is a single bond or a divalent linking group (but excluding (OXa)na), Lb1 and Lb2 are single bonds or divalent linking groups (but excluding (OXb)nb), Za1, Zb1 and Zb2 are fluorine atoms or trifluoromethyl groups, and m1 and m2 are integers of 2 or more.
    Type: Application
    Filed: March 8, 2023
    Publication date: July 13, 2023
    Applicant: AGC INC.
    Inventor: Ryuta TAKASHITA
  • Publication number: 20230120739
    Abstract: Provided are a fluorine-containing ether compound that can form a surface layer that excels in durability and a method of manufacturing the same, a fluorine-containing ether composition and a coating liquid, and an article having a surface layer that excels in durability and a method of manufacturing the same. A fluorine-containing ether compound is expressed by the following formula (A1) or (A2): {RfO—(Rf1O)m1—(R1)m2—(CHF)m3—O—(CHF)m4}n1-Q1(-T1)n2?? Formula (A1) (T2)n3-Q2-(CHF)m5—O—(CHF)m6—(R2)m7—O—(Rf2O)m8—(R3)m9—(CHF)m10—O—(CHF)m11-Q3(-T3)n4??Formula (A2), in the above, the symbols in the formulas are as described in the specification.
    Type: Application
    Filed: December 8, 2022
    Publication date: April 20, 2023
    Applicant: AGC INC.
    Inventors: Koki WATANABE, Ryuta Takashita
  • Publication number: 20230024292
    Abstract: Provided are: a fluorine-containing ether compound, a fluorine-containing ether composition, and a coating liquid that are capable of forming a surface layer having excellent durability; and an article that has a surface layer having excellent durability. The present invention provides a fluorine-containing ether compound represented by formula (A1) or formula (A2) below. RfO—(Rf1O)m—R1-L1-R2-Q1(-T)n??formula (A1) (T-)nQ1-R2-L1-R1—O—(Rf1O)m—R1-L1-R2-Q1(-T)n??formula (A2) In the formulae, symbols are as defined in the description.
    Type: Application
    Filed: September 6, 2022
    Publication date: January 26, 2023
    Applicant: AGC Inc.
    Inventors: Ryuta TAKASHITA, Koki WATANABE
  • Publication number: 20220298180
    Abstract: Provided are a fluorine-containing ether compound, a fluorine-containing ether composition, and a coating liquid, which can form a surface layer having excellent durability, and an article and production method thereof having a surface layer that has excellent durability and that can maintain water and oil repellency, lubricity, and fingerprint stain removability for a long time. The fluorine-containing ether compound includes a polyfluoropolyether chain, a reactive silyl group, and a linking group that includes a group represented by *—O—C(?O)—**, in which the linking group links the polyfluoropolyether chain arranged on the * side and the reactive silyl group arranged on the ** side.
    Type: Application
    Filed: June 6, 2022
    Publication date: September 22, 2022
    Applicant: AGC Inc.
    Inventors: Hikaru ONO, Koki WATANABE, Motoshi AOYAMA, Ryuta TAKASHITA
  • Publication number: 20220213345
    Abstract: Provided are a fluorine-containing ether compound, fluorine-containing ether composition and coating liquid that can form a surface layer having excellent durability, an article having a surface layer that has excellent durability, and a compound that is useful as a raw material of a fluorine-containing ether compound. The fluorine-containing ether compound is represented by the following formula (A1) or formula (A2): Rf—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(—R3)3-a]b??Formula (A1) [(T-R2—)a(R3—)3-aC—R1—]bRf2—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(-R3)3-a]b?? Formula (A2) wherein each of the reference signs in the formulas are as described in the specification.
    Type: Application
    Filed: March 17, 2022
    Publication date: July 7, 2022
    Applicant: AGC Inc.
    Inventor: Ryuta TAKASHITA
  • Publication number: 20220204444
    Abstract: The present invention is directed to providing a method of manufacturing a fluorine-containing compound according to which a fluorine-containing compound is manufactured under a relatively moderate reaction condition by use of a readily available compound. A method of manufacturing a fluorine-containing compound includes reacting a compound having a partial structure expressed by a formula (a) below with a Grignard reagent in the presence of a transition metal compound, —CF2—CH2—L??(a) wherein L is a sulfonate group.
    Type: Application
    Filed: March 18, 2022
    Publication date: June 30, 2022
    Applicant: AGC Inc.
    Inventor: Ryuta TAKASHITA
  • Publication number: 20210269591
    Abstract: A fluorinated ether compound and a composition capable of forming a light resistant surface layer and an article are provided. The fluorinated ether compound of the present invention has a poly(oxyfluoroalkylene) chain, a reactive silyl group and a group (A) represented by —NR—C(O)— (wherein R is a hydrogen atom or an alkyl group), wherein the carbonyl carbon in the group (A) is bonded to a carbon atom, and the poly(oxyfluoroalkylene) chain is located at the nitrogen end of the group (A).
    Type: Application
    Filed: May 17, 2021
    Publication date: September 2, 2021
    Applicant: AGC Inc.
    Inventors: Keigo MATSUURA, Eiichiro ANRAKU, Ryuta TAKASHITA, Koki WATANABE, Makoto UNO, Koichi MURATA, Takafumi KAWAKAMI
  • Publication number: 20180230122
    Abstract: Compounds of formula (VI), which are useful as therapeutic drugs for diabetes, may be produced by reacting a compound of formula (II) with an acid halogenating agent to give an acid halide; reacting the acid halide with a compound of formula (IV) in the presence of a base, and crystallizing compound (V) or a salt thereof from the reaction system; and subjecting the compound of formula (V) to reductive deprotection in the presence of a metal catalyst, and crystallizing the compound of (VI) or a salt thereof from the reaction system:
    Type: Application
    Filed: April 16, 2018
    Publication date: August 16, 2018
    Applicant: EA PHARMA CO., LTD.
    Inventors: Tatsuhiro Yamada, Akinori Tatara, Ryuta Takashita, Riho Kodama, Kazutaka Ookuma
  • Patent number: 9533985
    Abstract: Sulfonamide compounds of a specific chemical structure in which a sulfonamide group having, as a substituent, a phenyl group or a heterocyclic group having a hetero atom(s) as a constituent element(s) is present at its terminal, and pharmaceutically acceptable salts thereof. These compounds are novel compounds having excellent ?4 integrin-inhibitory action.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: January 3, 2017
    Assignee: EA Pharma Co., Ltd.
    Inventors: Hirokazu Ueno, Takashi Yamamoto, Ryuta Takashita, Ryohei Yokoyama, Toshihiko Sugiura, Shunsuke Kageyama, Ayatoshi Ando, Hiroyuki Eda, Agung Eviryanti, Tomoko Miyazawa, Aya Kirihara, Itsuya Tanabe, Tarou Nakamura, Misato Noguchi, Manami Shuto, Masayuki Sugiki, Mizuki Dohi
  • Publication number: 20160376248
    Abstract: Compounds of formula (9), which are useful as therapeutic drugs for diabetes, may be produced by the following reaction sequence: (a) diester (3) is synthesized by the reaction of compound (1) and compound (2); (b) ester (4) is synthesized by deprotection of diester (3) (or ester (4) is synthesized by the reaction of compound (5) and compound (2)); (c) ester (4) is converted to acid halide; (d) the acid halide is reacted with an amidinophenol derivative; and (e) the obtained diester derivative is deprotected under acidic conditions, and converted to compound (9): wherein R1 is a halogen atom, R4 is a lower alkyl group, R5 is a lower alkyl group, and R12 is a hydrogen atom or a halogen atom.
    Type: Application
    Filed: September 9, 2016
    Publication date: December 29, 2016
    Applicant: EA PHARMA CO., LTD.
    Inventor: Ryuta Takashita
  • Publication number: 20160376249
    Abstract: Compounds of formula (VI), which are useful as therapeutic drugs for diabetes, may be produced by reacting a compound of formula (II) with an acid halogenating agent to give an acid halide; reacting the acid halide with a compound of formula (IV) in the presence of a base, and crystallizing compound (V) or a salt thereof from the reaction system; and subjecting the compound of formula (V) to reductive deprotection in the presence of a metal catalyst, and crystallizing the compound of (VI) or a salt thereof from the reaction system:
    Type: Application
    Filed: September 9, 2016
    Publication date: December 29, 2016
    Applicant: EA PHARMA CO., LTD.
    Inventors: Tatsuhiro YAMADA, Akinori TATARA, Ryuta TAKASHITA, Riho KODAMA, Kazutaka OOKUMA
  • Publication number: 20150051395
    Abstract: Provided are sulfonamide derivatives of a specific chemical structure in which a sulfonamide group having, as a substituent, a phenyl group or a heterocyclic group having a hetero atom(s) as a constituent element(s) is present at its terminal, and pharmaceutically acceptable salts thereof. These compounds are novel compounds having excellent ?4 integrin-inhibitory action.
    Type: Application
    Filed: April 24, 2013
    Publication date: February 19, 2015
    Applicant: AJINOMOTO CO., LTD.
    Inventors: Hirokazu Ueno, Takashi Yamamoto, Ryuta Takashita, Ryohei Yokoyama, Toshihiko Sugiura, Shunsuke Kageyama, Ayatoshi Ando, Hiroyuki Eda, Agung Eviryanti, Tomoko Miyazawa, Aya Kirihara, Itsuya Tanabe, Tarou Nakamura, Misato Noguchi, Manami Shuto, Masayuki Sugiki, Mizuki Dohi
  • Publication number: 20120088737
    Abstract: The present invention provides a pharmaceutical which possesses an excellent inhibitory effect on NHE3 (Na+/H+ exchanger type 3) and effectively improves diseases or conditions of organs in which NHE3 is expressed.
    Type: Application
    Filed: October 1, 2010
    Publication date: April 12, 2012
    Applicant: AJINOMOTO CO., INC
    Inventors: Wataru MIYANAGA, Yoichiro SHIMA, Misato NOGUCHI, Akiko OONUKI, Yayoi KAWATO, Hiroshi IWATA, Eri HARADA, Ryuta TAKASHITA, Hirokazu UENO, Tadakiyo NAKAGAWA
  • Publication number: 20110082109
    Abstract: The present invention provides a pharmaceutical which possesses an excellent inhibitory effect on NHE3 (Na+/H+ exchanger type 3) and effectively improves diseases or conditions of organs in which NHE3 is expressed.
    Type: Application
    Filed: October 1, 2010
    Publication date: April 7, 2011
    Applicant: AJINOMOTO CO., INC.
    Inventors: Wataru MIYANAGA, Yoichiro Shima, Misato Noguchi, Akiko Oonuki, Yayoi Kawato, Hiroshi Iwata, Eri Harada, Ryuta Takashita, Hirokazu Ueno, Tadakiyo Nakagawa