Patents by Inventor Ryuuichi YAMASHITA

Ryuuichi YAMASHITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for controlling amount of hot dip galvanization adhesion
    Patent number: 9896755
    Abstract: The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1?) of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23); a first valve aperture setter (13) that sets the valve aperture of the first valve (17); a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1?) matches a set gas pressure (P1), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: February 20, 2018
    Assignees: PRIMETALS TECHNOLOGIES JAPAN, LTD., NISSHIN STEEL CO., LTD.
    Inventors: Hideaki Suemori, Masayoshi Tanaka, Norikatsu Kakemizu, Takashi Yamamoto, Hisao Morishita, Ryuuichi Yamashita
  • METHOD AND DEVICE FOR CONTROLLING AMOUNT OF HOT DIP GALVANIZATION ADHESION
    Publication number: 20160355919
    Abstract: The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1?) of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23); a first valve aperture setter (13) that sets the valve aperture of the first valve (17); a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1?) matches a set gas pressure (P1), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.
    Type: Application
    Filed: February 10, 2015
    Publication date: December 8, 2016
    Applicants: PRIMETALS TECHNOLOGIES JAPAN, LTD., NISSHIN STEEL CO., LTD.
    Inventors: Hideaki SUEMORI, Masayoshi TANAKA, Norikatsu KAKEMIZU, Takashi YAMAMOTO, Hisao MORISHITA, Ryuuichi YAMASHITA