Abstract: The subject invention comprises forming a plurality of positively charged ions of an ionizable coating material in an ion formation area. A deposition area is provided at a predetermined distance from the ion formation area. This deposition area is capable of being negatively charged for attracting the positively charged ions of the ionizable coating material. Next, the deposition area is negatively charged so that a uniform, substantially parallel flow path is formed for the ionizable coating material between the ion formation area and the negatively charged deposition area. A substrate is then positioned between the ion formation and deposition areas within the uniform, substantially parallel flow path, and preferably perpendicular to the flow path. The positively charged ions of the coating material are released from the ion formation area into the flow path, and are moved within the flow path by the attraction of the positively charged ions toward the negatively charged deposition area.

Abstract: The subject invention comprises forming a plurality of positively charged ions of an ionizable coating material in an ion formation area. A deposition area is provided at a predetermined distance from the ion formation area. This deposition area is capable of being negatively charged for attracting the positively charged ions of the ionizable coating material. Next, the deposition area is negatively charged so that a uniform, substantially parallel flow path is formed for the ionizable coating material between the ion formation area and the negatively charged deposition area. A substrate is then positioned between the ion formation and deposition areas within the uniform, substantially parallel flow path, and preferably perpendicular to the flow path. The positively charged ions of the coating material are released from the ion formation area into the flow path, and are moved within the flow path by the attraction of the positively charged ions toward the negatively charged deposition area.